Micromachined structures
    31.
    发明授权
    Micromachined structures 有权
    微加工结构

    公开(公告)号:US09070699B2

    公开(公告)日:2015-06-30

    申请号:US13343187

    申请日:2012-01-04

    IPC分类号: H01L21/00 H01L49/02 H01L29/84

    摘要: A micromachined structure includes a substrate and a suspended structure. The substrate has a cavity formed thereon. The suspended structure is formed on the cavity of the substrate. The suspended structure includes a first metal layer, a second metal layer, and a first dielectric layer positioned between the first and second metal layers, wherein the first dielectric layer has a first opening in communication with the cavity through an opening formed in the first metal layer.

    摘要翻译: 微加工结构包括基底和悬挂结构。 基板具有形成在其上的空腔。 悬浮结构形成在基板的空腔上。 悬浮结构包括第一金属层,第二金属层和位于第一和第二金属层之间的第一介电层,其中第一介电层具有通过形成在第一金属中的开口与空腔连通的第一开口 层。

    MICRO-ELECTRO-MECHANICAL SYSTEM DEVICE WITH ENHANCED STRUCTURAL STRENGTH
    32.
    发明申请
    MICRO-ELECTRO-MECHANICAL SYSTEM DEVICE WITH ENHANCED STRUCTURAL STRENGTH 有权
    具有增强结构强度的微电子机械系统装置

    公开(公告)号:US20150102701A1

    公开(公告)日:2015-04-16

    申请号:US14505022

    申请日:2014-10-02

    IPC分类号: H02K1/06

    摘要: The invention provides a MEMS device with enhanced structural strength. The MEMS device includes a plurality of metal layers, including a top metal layer with a plurality of metal segments. The metal segments are individually connected to an adjacent metal layer immediately under the top metal layer through at least one supporting pillar, and there is no dielectric layer between the metal segments and the adjacent metal layer immediately under the top metal layer. The metal layers except the top metal layer are respectively connected to their adjacent metal layers through at least one supporting pillar and a dielectric layer filling in between.

    摘要翻译: 本发明提供了具有增强的结构强度的MEMS器件。 MEMS器件包括多个金属层,包括具有多个金属段的顶部金属层。 金属段通过至少一个支撑柱分别连接到顶部金属层正下方的相邻金属层,并且金属片段和紧邻在顶部金属层下面的相邻金属层之间没有电介质层。 除了顶部金属层之外的金属层通过填充在其中的至少一个支撑柱和介电层分别连接到其相邻的金属层。

    MICRO-ELECTRO-MECHANICAL SYSTEM DEVICE AND MICRO-ELECTRO- MECHANICAL SYSTEM COMPENSATION STRUCTURE
    33.
    发明申请
    MICRO-ELECTRO-MECHANICAL SYSTEM DEVICE AND MICRO-ELECTRO- MECHANICAL SYSTEM COMPENSATION STRUCTURE 有权
    微电子机械系统装置和微机电系统补偿结构

    公开(公告)号:US20150097586A1

    公开(公告)日:2015-04-09

    申请号:US14499200

    申请日:2014-09-28

    IPC分类号: B81B7/02 B81B3/00 G01R27/26

    CPC分类号: B81B3/0086

    摘要: This invention provides a MEMS device, including: a mass structure having at least one anchor; at least one flexible structure connected with the mass structure at the at least one anchor; a plurality of top electrodes located above the mass structure and forming a top capacitor circuit with the mass structure; and a plurality of bottom electrodes located under the mass structure and forming a bottom capacitor circuit with the mass structure. The projections of the plural top electrodes on the mass structure along a normal direction of the mass structure are located at opposite sides of the anchor, and the projections of the plural bottom electrodes on the mass structure along a normal direction of the mass structure are located at opposite sides of the anchor. This invention also provides a MEMS compensation structure.

    摘要翻译: 本发明提供了一种MEMS装置,包括:具有至少一个锚的质量结构; 至少一个柔性结构,与所述质量结构在所述至少一个锚固件处连接; 多个顶部电极位于质量结构之上并形成具有质量结构的顶部电容器电路; 以及位于质量结构下方的多个底部电极,并形成具有质量结构的底部电容器电路。 沿着质量结构的法线方向的质量结构上的多个顶部电极的突起位于锚固体的相对侧,沿着质量结构的法线方向在质量结构上的多个底部电极的突起位于 在锚的相对侧。 本发明还提供一种MEMS补偿结构。

    MICRO-ELECTRO-MECHANICAL SYSTEM DEVICE HAVING DIFFERENTIAL CAPACITORS OF CORRESPONDING SIZES
    34.
    发明申请
    MICRO-ELECTRO-MECHANICAL SYSTEM DEVICE HAVING DIFFERENTIAL CAPACITORS OF CORRESPONDING SIZES 有权
    具有相应尺寸差分电容器的微机电系统装置

    公开(公告)号:US20150069538A1

    公开(公告)日:2015-03-12

    申请号:US14450074

    申请日:2014-08-01

    申请人: Ming-Han Tsai

    发明人: Ming-Han Tsai

    IPC分类号: B81B3/00

    CPC分类号: B81B3/0086 B81B3/0021

    摘要: The invention provides a micro-electro-mechanical device having differential capacitor of corresponding sizes, which includes a substrate; a top fixed electrode; a bottom fixed electrode; a mass, having a top electrode and a bottom electrode, wherein the top electrodes form a top capacitor with the top fixed electrode and the bottom electrodes form a bottom capacitor with the bottom fixed electrode; a top fixed electrode extension wall having an upper end connected to the top fixed electrode and a lower end connected to the substrate; and a bottom fixed electrode extension wall having a lower end connected to the substrate through the bottom electrode, wherein the bottom fixed electrode extension wall has no upper end connected to the top fixed electrode, and total areas of the top fixed electrode extension wall and the top fixed electrode facing the mass are substantially equal to total areas of the bottom fixed electrode extension wall and the bottom fixed electrode facing the mass.

    摘要翻译: 本发明提供一种具有对应尺寸的差分电容器的微机电装置,其包括基板; 顶部固定电极; 底部固定电极; 具有顶部电极和底部电极的质量,其中顶部电极形成顶部电容器,顶部固定电极和底部电极与底部固定电极形成底部电容器; 顶部固定电极延伸壁,其上端连接到顶部固定电极,下端连接到基板; 以及底部固定电极延伸壁,其下端通过底部电极连接到基板,其中底部固定电极延伸壁没有连接到顶部固定电极的上端,并且顶部固定电极延伸壁和 面向质量的顶部固定电极基本上等于底部固定电极延伸壁和面向质量的底部固定电极的总面积。

    MEMS sensing device and method for the same
    35.
    发明授权
    MEMS sensing device and method for the same 有权
    MEMS感测装置及其方法相同

    公开(公告)号:US08772885B2

    公开(公告)日:2014-07-08

    申请号:US13948128

    申请日:2013-07-22

    IPC分类号: H01L29/84

    摘要: The present invention discloses a MEMS sensing device which comprises a substrate, a MEMS device region, a film, an adhesive layer, a cover, at least one opening, and a plurality of leads. The substrate has a first surface and a second surface opposite the first surface. The MEMS device region is on the first surface, and includes a chamber. The film is overlaid on the MEMS device region to seal the chamber as a sealed space. The cover is mounted on the MEMS device region and adhered by the adhesive layer. The opening is on the cover or the adhesive layer, allowing the pressure of the air outside the device to pressure the film. The leads are electrically connected to the MEMS device region, and extend to the second surface.

    摘要翻译: 本发明公开了一种MEMS感测装置,其包括衬底,MEMS器件区域,膜,粘合剂层,盖,至少一个开口和多个引线。 衬底具有与第一表面相对的第一表面和第二表面。 MEMS器件区域在第一表面上,并且包括腔室。 膜被覆盖在MEMS器件区域上,以密封腔室作为密封空间。 盖安装在MEMS器件区域上,并通过粘合剂层粘合。 开口在盖子或粘合剂层上,允许装置外的空气的压力对膜施加压力。 引线电连接到MEMS器件区域,并延伸到第二表面。

    Display panel with shift register having reserve pull-up transistor
    36.
    发明授权
    Display panel with shift register having reserve pull-up transistor 有权
    具有移位寄存器的显示面板具有保留上拉晶体管

    公开(公告)号:US08384705B2

    公开(公告)日:2013-02-26

    申请号:US12861826

    申请日:2010-08-23

    IPC分类号: G06F3/033 G09G5/00 G11C19/00

    摘要: A display panel includes a substrate, a pixel array, and a plurality of shift registers. The pixel array is disposed on the substrate. The shift registers are disposed on the substrate for sequentially outputting a plurality of scanning signals to drive the pixel array. Each of the shift registers includes a pull-up transistor and a first reserve transistor. The pull-up transistor raises the voltage level of the corresponding scanning signal. A control terminal of the first reserve transistor is coupled to a control terminal of the pull-up transistor, and a second terminal of the first reserve transistor is coupled to a second terminal of the pull-up transistor. When the pull-up transistor in each of the shift registers has insufficient output ability, a first terminal of the first reserve transistor is coupled to a first terminal of the pull-up transistor.

    摘要翻译: 显示面板包括基板,像素阵列和多个移位寄存器。 像素阵列设置在基板上。 移位寄存器设置在基板上,用于顺序输出多个扫描信号以驱动像素阵列。 每个移位寄存器包括上拉晶体管和第一保留晶体管。 上拉晶体管提高相应扫描信号的电压电平。 第一保留晶体管的控制端子耦合到上拉晶体管的控制端,第一保留晶体管的第二端耦合到上拉晶体管的第二端。 当每个移位寄存器中的上拉晶体管具有不足的输出能力时,第一保留晶体管的第一端耦合到上拉晶体管的第一端。

    Method for fabricating variable parallel plate capacitors
    37.
    发明授权
    Method for fabricating variable parallel plate capacitors 有权
    可变平行板电容器的制造方法

    公开(公告)号:US08105498B2

    公开(公告)日:2012-01-31

    申请号:US11944317

    申请日:2007-11-21

    IPC分类号: B44C1/22

    摘要: A method for fabricating micromachined structures is provided. A structure including a dielectric layer, a metal layer and a passivation layer is formed, wherein the dielectric layer has a via thereon. An etching window is formed on the passivation layer. An etching solution is poured into the via through the etching window to perform a process of etching. After etching, the etching solution is removed and the passivation layer is removed. Finally, the structure is etched again to form the micromachined structure.

    摘要翻译: 提供了一种制造微加工结构的方法。 形成包括电介质层,金属层和钝化层的结构,其中介电层在其上具有通孔。 在钝化层上形成蚀刻窗口。 将蚀刻溶液通过蚀刻窗口注入到通孔中以进行蚀刻处理。 蚀刻后,除去蚀刻溶液,除去钝化层。 最后,再次蚀刻结构以形成微加工结构。

    MICROMACHINED STRUCTURES
    40.
    发明申请
    MICROMACHINED STRUCTURES 有权
    MICROMACHINED结构

    公开(公告)号:US20120107545A1

    公开(公告)日:2012-05-03

    申请号:US13343187

    申请日:2012-01-04

    IPC分类号: B32B3/08 B32B3/10

    摘要: A micromachined structure includes a substrate and a suspended structure. The substrate has a cavity formed thereon. The suspended structure is formed on the cavity of the substrate. The suspended structure includes a first metal layer, a second metal layer, and a first dielectric layer positioned between the first and second metal layers, wherein the first dielectric layer has a first opening in communication with the cavity through an opening formed in the first metal layer.

    摘要翻译: 微加工结构包括基底和悬挂结构。 基板具有形成在其上的空腔。 悬浮结构形成在基板的空腔上。 悬浮结构包括第一金属层,第二金属层和位于第一和第二金属层之间的第一介电层,其中第一介电层具有通过形成在第一金属中的开口与空腔连通的第一开口 层。