公开(公告)号：US10705431B2

公开(公告)日：2020-07-07

申请号：US16509675

申请日：2019-07-12

Applicant: Applied Materials, Inc.

Inventor： Christopher Dennis Bencher ,  Joseph R. Johnson ,  David Markle ,  Mehdi Vaez-Iravani

IPC: G03F7/20 ,  G02B27/28 ,  G02B26/08 ,  G02B5/30 ,  G02F1/13

Abstract: Embodiments of the present disclosure provide methods for producing images on substrates. The method includes providing a p-polarization beam to a first mirror cube having a first digital micromirror device (DMD), providing an s-polarization beam to a second mirror cube having a second DMD, and reflecting the p-polarization beam off the first DMD and reflecting the s-polarization beam off the second DMD such that the p-polarization beam and the s-polarization beam are reflected towards a light altering device configured to produce a plurality of superimposed images on the substrate.

公开(公告)号：US10394130B2

公开(公告)日：2019-08-27

申请号：US15207991

申请日：2016-07-12

Applicant: Applied Materials, Inc.

Inventor： Christopher Dennis Bencher ,  Joseph R. Johnson ,  Dave Markle ,  Mehdi Vaez-Iravani

IPC: G03F7/20 ,  G02B27/28 ,  G02B26/08 ,  G02B5/30 ,  G02F1/13

Abstract: The present disclosure provides a method for producing an image on a substrate. The method includes providing a single beam of light to a multiple DMD assembly, splitting the single beam of light into an s-polarization beam and a p-polarization beam, and reflecting the s-polarization beam and the p-polarization beam through the multiple DMD assembly such that the multiple DMD assembly produces a plurality of superimposed images on the substrate.

公开(公告)号：US09823573B2

公开(公告)日：2017-11-21

申请号：US15188667

申请日：2016-06-21

Applicant: Applied Materials, Inc.

Inventor： Joseph R. Johnson ,  Christopher Dennis Bencher ,  Thomas L. Laidig

IPC: G03F7/20

CPC classification number: G03F7/70041 ,  G03F7/70291 ,  G03F7/70583

Abstract: An image correction application relating to the ability to apply maskless lithography patterns to a substrate in a manufacturing process is disclosed. The embodiments described herein relate to a software application platform which maintains the ability to correct non-uniform image patterns using time-shifted exposures of the substrate. The application exposes subsequent portions of a substrate to electromagnetic radiation at variable and alternating pulse frequencies using a time delay in order to correct interference patterns and increase exposure uniformity.