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公开(公告)号：US09250509B2
公开(公告)日：2016-02-02
申请号：US13909076
申请日：2013-06-04
Applicant: Applied Materials, Inc.
Inventor： David Markle , Thomas Laidig , Jeffrey Kaskey , Jang Fung Chen
CPC classification number: G03F7/7015 , G03B27/42 , G03F7/70291
Abstract: A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.
Abstract translation: 公开了一种空间光调制器成像系统。 该系统包括：照明模块，被配置为提供表示由空间光调制器成像系统成像的数据图案的照明光;投影模块，被配置为将照明光投影到基板;以及照明投影光束分离器，其耦合在照明模块 以及所述投影模块，其中所述照明投影光束分离器被配置为沿着照明光轴接收照明光，并且沿着投影光轴传输接收到所述投影模块的照明光，并且其中所述照明光轴和所述投影光学 轴基本上彼此平行。
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公开(公告)号：US10162268B2
公开(公告)日：2018-12-25
申请号：US15656054
申请日：2017-07-21
Applicant: Applied Materials, Inc.
Inventor： David Markle , Timothy N. Thomas
Abstract: Implementations disclosed herein generally relate to a light pipe, or kaleido, for homogenizing light such that the light is uniform once the light exits the light pipe. By reflecting the light inside the light pipe, light uniformity is increased. In one implementation, a light pipe for an image projection apparatus is provided. The light pipe comprises an elongated rectangular body having a refractive index that provides total internal reflection within the elongated rectangular body. The elongated rectangular body has an input face for accepting light into the elongated rectangular body. The input face disposed substantially orthogonal to a longitudinal axis of the elongated rectangular body. The elongated rectangular body has an output face for releasing light from the elongated rectangular body. The output face is disposed substantially orthogonal to the longitudinal axis. The elongated rectangular body has a twist along the longitudinal axis.
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3.发明授权公开(公告)号：US11592740B2
公开(公告)日：2023-02-28
申请号：US15961601
申请日：2018-04-24
Applicant: Applied Materials, Inc.
Inventor： Jang Fung Chen , Christopher Dennis Bencher , David Markle
IPC: G03F7/00 , G02F1/1335 , G02B5/30 , G03F7/20
Abstract: The present disclosure generally relates to methods and systems for manufacturing wire grid polarizers (WGP) using Markle-Dyson exposure systems and dual tone development (DTD) frequency doubling. In one embodiment, the method includes depositing a photoresist layer over an aluminum-coated display substrate, patterning the photoresist layer by dual tone development using a Markle-Dyson system to form a photoresist pattern, and transferring the photoresist pattern into the aluminum-coated display substrate to manufacture a WGP having finer pitch, for example less than or equal to about 100 nm, and increased frequency.
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公开(公告)号：US10983389B2
公开(公告)日：2021-04-20
申请号：US16076677
申请日：2017-02-10
Applicant: Applied Materials, Inc.
Inventor： David Markle , Jang Fung Chen
IPC: G02F1/1335 , G03F7/00 , G03F7/16 , G03F7/09 , G02B1/11 , G02B5/30 , G03F1/26 , G03F7/20 , G03F7/32
Abstract: The present disclosure generally relates to systems and methods for manufacturing wire grid polarizers for LCDs using interference lithography, which are also useful for generating large-area grating patterns. In one embodiment, a method includes depositing a bottom anti-reflective coating layer over an aluminum coated flat panel display substrate, depositing a photoresist layer over the bottom anti-reflective coating layer, and exposing the photoresist layer with an image from a phase grating mask. The exposure with the phase grating mask is done by imaging the ±1 diffraction orders from the phase grating mask onto the substrate using a half Dyson optical system. A plurality of half Dyson systems are generally used in parallel to pattern fine geometry lines and spaces of a wire grid polarizer for a large area substrate. Each half Dyson system includes a primary mirror, a positive lens and a reticle.
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Patent Agency Ranking
公开(公告)号：US10409172B2
公开(公告)日：2019-09-10
申请号：US15412530
申请日：2017-01-23
Applicant: Applied Materials, Inc.
Inventor： David Markle , Thomas Laidig , Timothy N. Thomas
IPC: G03B27/52 , G03F7/20 , F21V8/00 , G02B7/04 , G02B27/00 , G02F1/13 , G02B7/36 , G02B5/04 , G02B26/08
Abstract: Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact apparatuses for projecting an image onto a substrate are provided. In one embodiment, an image projection apparatus includes a light pipe coupled to a first mounting plate, and a frustrated prism assembly, one or more digital micro-mirror devices, one or more beamsplitters, and one or more projection optics, which are coupled to a second mounting plate. The first and second mounting plates are coplanar, such that the image projection apparatus is compact and may be aligned in a system having a plurality of image projection apparatuses, each of which is easily removable and replaceable.
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公开(公告)号：US09733573B2
公开(公告)日：2017-08-15
申请号：US14993071
申请日：2016-01-11
Applicant: Applied Materials, Inc.
Inventor： David Markle , Thomas Laidig , Jeffrey Kaskey , Jang Fung Chen
CPC classification number: G03F7/7015 , G03B27/42 , G03F7/70291
Abstract: A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.
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公开(公告)号：US10705431B2
公开(公告)日：2020-07-07
申请号：US16509675
申请日：2019-07-12
Applicant: Applied Materials, Inc.
Inventor： Christopher Dennis Bencher , Joseph R. Johnson , David Markle , Mehdi Vaez-Iravani
Abstract: Embodiments of the present disclosure provide methods for producing images on substrates. The method includes providing a p-polarization beam to a first mirror cube having a first digital micromirror device (DMD), providing an s-polarization beam to a second mirror cube having a second DMD, and reflecting the p-polarization beam off the first DMD and reflecting the s-polarization beam off the second DMD such that the p-polarization beam and the s-polarization beam are reflected towards a light altering device configured to produce a plurality of superimposed images on the substrate.
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公开(公告)号：US09907152B2
公开(公告)日：2018-02-27
申请号：US15087173
申请日：2016-03-31
Applicant: Applied Materials, Inc.
Inventor： Jeffrey Kaskey , Thomas Laidig , David Markle , Jang Fung Chen
CPC classification number: H05B37/04 , G03F7/70575 , H05B37/03 , H05B37/032
Abstract: An illumination system and methods for controlling the illumination system are provided. In one embodiment, the method includes providing a plurality of illumination sources, monitoring optical output power of the plurality of illumination sources over a period of time, and controlling the plurality of illumination sources to maintain a predetermined level of optical output power. The method further includes compensating for degradations of one or more of the plurality of illumination sources to maintain the predetermined level of optical output power, predicting a lifetime of the illumination system based on the parameters of the plurality of illumination sources, and performing periodic maintenance of the plurality of illumination sources according to a quality control schedule.
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公开(公告)号：US11243480B2
公开(公告)日：2022-02-08
申请号：US17057536
申请日：2019-05-31
Applicant: Applied Materials, Inc.
Inventor： David Markle , Hwan J. Jeong
Abstract: A lithography system for generating grating structures is provided having a multiple column imaging system located on a bridge capable of moving in a cross-scan direction, a mask having a grating pattern with a fixed spatial frequency located in an object plane of the imaging system, a multiple line alignment mark aligned to the grating pattern and having a fixed spatial frequency, a platen configured to hold and scan a substrate, a scanning system configured to move the platen over a distance greater than a desired length of the grating pattern on the substrate, a longitudinal encoder scale attached to the platen and oriented in a scan direction and at least two encoder scales attached to the platen and arrayed in the cross-scan direction wherein the scales contain periodically spaced alignment marks having a fixed spatial frequency.
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