利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

54 条记录 (耗时 0.028 秒)

    USING NON-LINEAR FLUID DISPENSERS FOR FORMING THICK FILMS
    32.
    发明申请
    USING NON-LINEAR FLUID DISPENSERS FOR FORMING THICK FILMS 审中-公开

    公开(公告)号：US20200174362A1

    公开(公告)日：2020-06-04

    申请号：US16209746

    申请日：2018-12-04

    申请人： CANON KABUSHIKI KAISHA

    发明人： Niyaz Khusnatdinov

    IPC分类号： G03F7/00 ,  B29C59/02 ,  B41J2/02

    摘要： A method of controlling a control apparatus for use with a fluid dispenser having a plurality of nozzles includes obtaining, dividing, and substituting. A drop pattern is obtained as data for use in dispensing drops onto a substrate from the plurality of nozzles of the fluid dispenser. The obtained drop pattern is divided into a plurality of drop patterns based on a distance between drops of the obtained drop pattern. The plurality of drop patterns are substituted in place of the obtained drop pattern to dispense the drops onto the substrate from the fluid dispenser.

    IMPRINT APPARATUS, CONTROL METHOD, IMPRINT METHOD AND MANUFACTURING METHOD
    33.
    发明申请
    IMPRINT APPARATUS, CONTROL METHOD, IMPRINT METHOD AND MANUFACTURING METHOD 审中-公开

    公开(公告)号：US20200033720A1

    公开(公告)日：2020-01-30

    申请号：US16046810

    申请日：2018-07-26

    申请人： CANON KABUSHIKI KAISHA

    发明人： Niyaz Khusnatdinov ,  Mario Johannes Meissl

    IPC分类号： G03F7/00

    摘要： An apparatus and method configured to stabilize imprint head temperature. The apparatus and method includes an imprinting apparatus including, a mount attached to a fixed surface, a movable plate movable relative to the mount, at least one electromagnetic actuator mounted between the movable plate and the mount, wherein an electrical current is applied to the at least one electromagnetic actuator for controlling movement of the moveable plate, and wherein a root-mean-square of the electrical current applied to the at least one electromagnetic actuator in an idle state is equal to a root-mean-square of the electrical current applied to the at least one electromagnetic actuator during a continuous imprinting state.

    Process of Imprinting a Substrate with Fluid Control Features
    34.
    发明申请
    Process of Imprinting a Substrate with Fluid Control Features 审中-公开

    公开(公告)号：US20200033719A1

    公开(公告)日：2020-01-30

    申请号：US16045401

    申请日：2018-07-25

    申请人： CANON KABUSHIKI KAISHA

    发明人： Niyaz Khusnatdinov ,  Edward Brian Fletcher

    IPC分类号： G03F7/00 ,  B29C59/02

    摘要： A process, system, and method of manufacturing an article on a substrate having a fluid control feature. The fluid control feature may include at least one depressed region formed along an edge of an imprint field. Formable material is deposited in the imprint field of the substrate. A template is moved such that the template comes into contact with the formable material in the imprint field. While the template comes into contact with the formable material, the formable material may flow into the fluid control feature.

    Fluid dispense methodology and apparatus for imprint lithography
    35.
    发明授权
    Fluid dispense methodology and apparatus for imprint lithography 有权

    公开(公告)号：US10304690B2

    公开(公告)日：2019-05-28

    申请号：US15466662

    申请日：2017-03-22

    申请人： CANON KABUSHIKI KAISHA

    发明人： Niyaz Khusnatdinov ,  Dwayne L. LaBrake

    IPC分类号： G03F7/00 ,  H01L21/02 ,  B29C59/02 ,  H01L21/3105 ,  B29L31/34

    摘要： A method of can be used to generating a fluid droplet pattern for an imprint lithography process. A fluid dispense head can include a set of fluid dispense ports, wherein the fluid dispense ports are in a fixed arrangement. The method can include rotating the set of the fluid dispense ports to a rotation angle to change a fluid droplet pitch in a first direction; moving a substrate and the set of the fluid dispense ports relative to each other in a second direction substantially perpendicular to the first direction; and dispensing fluid droplets onto the substrate while moving the substrate and the set of the fluid dispense ports relative to each other. The method can be used in the formation of an electronic component within or over a semiconductor substrate. The apparatus can be configured to carry out the methods as described herein.

    Removing substrate pretreatment compositions in nanoimprint lithography
    37.
    发明授权
    Removing substrate pretreatment compositions in nanoimprint lithography 有权

    公开(公告)号：US10095106B2

    公开(公告)日：2018-10-09

    申请号：US15418952

    申请日：2017-01-30

    申请人： CANON KABUSHIKI KAISHA

    发明人： Timothy Brian Stachowiak ,  Weijun Liu ,  Niyaz Khusnatdinov ,  Zhengmao Ye ,  Toshiki Ito

    IPC分类号： B05D3/00 ,  C08J7/18 ,  G21H5/00 ,  G03F7/00

    摘要： A nanoimprint lithography method to remove uncured pretreatment composition from an imprinted nanoimprint lithography substrate. The method includes disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating and disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the nanoimprint lithography substrate. A composite polymerizable coating is formed on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads beyond its target area, and the composite polymerizable coating is contacted with a nanoimprint lithography template. The composite polymerizable coating is polymerized to yield a composite polymeric layer and an uncured portion of the pretreatment coating on the nanoimprint lithography substrate, and the uncured portion of the pretreatment coating is removed from the nanoimprint lithography substrate.

    SUBSTRATE PRETREATMENT AND ETCH UNIFORMITY IN NANOIMPRINT LITHOGRAPHY
    38.
    发明申请
    SUBSTRATE PRETREATMENT AND ETCH UNIFORMITY IN NANOIMPRINT LITHOGRAPHY 审中-公开

    公开(公告)号：US20180275511A1

    公开(公告)日：2018-09-27

    申请号：US15989622

    申请日：2018-05-25

    申请人： Canon Kabushiki Kaisha

    发明人： Timothy Stachowiak ,  Weijun Liu ,  Fen Wan ,  Gary Doyle ,  Niyaz Khusnatdinov

    IPC分类号： G03F7/00 ,  C09K13/00 ,  B29C59/02

    CPC分类号： G03F7/0002 ,  B29C59/02 ,  B29C59/026 ,  B29C2059/023 ,  C09K13/00

    摘要： A nanoimprint lithography method includes contacting a composite polymerizable coating formed from a pretreatment composition and an imprint resist with a nanoimprint lithography template defining recesses. The composite polymerizable coating is polymerized to yield a composite polymeric layer defining a pre-etch plurality of protrusions corresponding to the recesses of the nanoimprint lithography template. The nanoimprint lithography template is separated from the composite polymeric layer. At least one of the pre-etch plurality of protrusions corresponds to a boundary between two of the discrete portions of the imprint resist, and the pre-etch plurality of protrusions have a variation in pre-etch height of ±10% of a pre-etch average height. The pre-etch plurality of protrusions is etched to yield a post-etch plurality of protrusions having a variation in post-etch height of ±10% of a post-etch average height, and the pre-etch average height exceeds the post-etch average height.