公开(公告)号：US20080216867A1

公开(公告)日：2008-09-11

申请号：US11411215

申请日：2006-04-24

申请人： Wei-Yung Hsu ,  Donald J. K. Olgado ,  Ho Seon Shin ,  Liang-Yuh Chen

发明人： Wei-Yung Hsu ,  Donald J. K. Olgado ,  Ho Seon Shin ,  Liang-Yuh Chen

IPC分类号： B08B7/00

CPC分类号： H01L21/67046 ,  B08B1/04 ,  H01L21/67028

摘要： In one aspect, an apparatus for cleaning an edge of a substrate is provided. The apparatus includes (1) one or more rollers of a first diameter adapted to contact an edge of a substrate and rotate the substrate; and (2) one or more rollers of a second diameter that is larger than the first diameter adapted to contact an edge of the substrate and to clean the edge of the substrate. The one or more rollers of the first diameter and the one or more rollers of the second diameter may be adapted to rotate at substantially the same speed. Numerous other aspects are provided.

摘要翻译： 一方面，提供了一种用于清洁基板的边缘的装置。 该设备包括（1）一个或多个第一直径的辊，其适于接触衬底的边缘并旋转衬底; 和（2）一个或多个第二直径的辊，其大于适于接触所述衬底的边缘并且清洁所述衬底的所述边缘的所述第一直径。 第一直径的一个或多个辊和第二直径的一个或多个辊可以适于以基本上相同的速度旋转。 提供了许多其他方面。

公开(公告)号：US07297047B2

公开(公告)日：2007-11-20

申请号：US11292839

申请日：2005-12-01

申请人： Songjae Lee ,  Ho Seon Shin ,  Donald J. K. Olgado

发明人： Songjae Lee ,  Ho Seon Shin ,  Donald J. K. Olgado

IPC分类号： B24B49/00

CPC分类号： B24B37/04 ,  B24B57/02

摘要： A method and apparatus for the delivery of slurry solution comprising an ultrasonic flow meter positioned between a fluid preparation manifold and a slurry delivery arm, and a shutoff valve positioned between a proportional valve and the slurry delivery arm. Also, a method and apparatus for the delivery of slurry solution including an ultrasonic flow meter positioned to receive fluid from a fluid preparation manifold, a proportional valve and stepper motor in communication with the flow meter, and a reverse flow restrictor in communication with the proportional valve and a slurry delivery arm.

公开(公告)号：US07285036B2

公开(公告)日：2007-10-23

申请号：US11562320

申请日：2006-11-21

申请人： Shou-Sung Chang ,  Stan D. Tsai ,  Donald J. K. Olgado ,  Liang-Yuh Chen ,  Alain Duboust ,  Ralph M. Wadensweiler

发明人： Shou-Sung Chang ,  Stan D. Tsai ,  Donald J. K. Olgado ,  Liang-Yuh Chen ,  Alain Duboust ,  Ralph M. Wadensweiler

IPC分类号： B24D11/02 ,  C25F3/00 ,  C25D17/00 ,  C25C7/04

CPC分类号： B24B37/22 ,  B23H5/06 ,  B23H5/08 ,  B23H5/10 ,  B24B37/046 ,  B24B37/11 ,  B24B37/24 ,  B24B37/26 ,  B24B49/16 ,  B24B53/017 ,  C25D17/10 ,  H01L21/32125

摘要： Embodiments of a pad assembly for processing a substrate are provided. The pad assembly includes a processing layer having a working surface adapted to process a substrate, a lower layer coupled to and disposed below the processing layer, and an electrode having an upper surface disposed above the lower layer and below the working surface of the processing layer. The upper surface of the electrode is at least partially exposed to the working surface by a plurality of apertures to provide an electrolyte pathway between the upper surface of the electrode and the working surface of the pad assembly.

摘要翻译： 提供了用于处理基板的垫组件的实施例。 焊盘组件包括处理层，其具有适于处理衬底的工作表面，耦合到处理层的下层并设置在处理层下方的电极，以及具有设置在处理层的工作表面下方和下方的上表面的电极 。 电极的上表面通过多个孔至少部分地暴露于工作表面，以在电极的上表面和焊盘组件的工作表面之间提供电解质通路。

公开(公告)号：US06736408B2

公开(公告)日：2004-05-18

申请号：US10057114

申请日：2002-01-25

申请人： Donald J. K. Olgado ,  Bernardo Donoso ,  Alexander Lerner

发明人： Donald J. K. Olgado ,  Bernardo Donoso ,  Alexander Lerner

IPC分类号： B23B3100

CPC分类号： H01L21/6838 ,  B23B31/307 ,  B25B11/005 ,  Y10T279/11

摘要： In a first aspect, a rotary vacuum-chuck is provided that may hold a substrate such as a silicon wafer for rotation. The vacuum-chuck includes a hollow rotary shaft and a chuck mounted on the hollow rotary shaft and having a surface adapted to support a substrate. The chuck has one or more openings in fluid communication with the hollow rotary shaft. A venturi is formed near an end of the hollow rotary shaft to apply vacuum to the hollow rotary shaft and the openings in the chuck surface. No seal is required between the end of the hollow rotary shaft and a surrounding stationary block.

摘要翻译： 在第一方面中，提供一种旋转式真空吸盘，其可以保持诸如硅晶片的基板旋转。 真空吸盘包括中空旋转轴和安装在中空旋转轴上并具有适于支撑基底的表面的卡盘。 卡盘具有与中空旋转轴流体连通的一个或多个开口。 在中空旋转轴的端部附近形成文丘里管，以向空心旋转轴和卡盘表面中的开口施加真空。 在空心旋转轴的端部和周围的固定块之间不需要密封。

公开(公告)号：US06585876B2

公开(公告)日：2003-07-01

申请号：US09731326

申请日：2000-12-05

申请人： Yezdi N. Dordi ,  Joseph J. Stevens ,  H. Peter W. Hey ,  Donald J. K. Olgado

发明人： Yezdi N. Dordi ,  Joseph J. Stevens ,  H. Peter W. Hey ,  Donald J. K. Olgado

IPC分类号： C25D520

CPC分类号： C25D17/008 ,  C25D7/123 ,  C25D17/001 ,  H01L21/2885 ,  H05K3/241

摘要： An apparatus comprising an electrolyte cell, an anode, and a porous rigid diffuser. The electrolyte cell is configured to receive a substrate to have a metal film deposited thereon. An anode is contained within the electrolyte cell. A porous rigid diffuser is connected to the electrolyte cell and extends across the electrolyte cell. The diffuser is positioned between a location that the substrate is to be positioned when the metal film is deposited thereon and the anode.

摘要翻译： 一种包括电解质电池，阳极和多孔刚性扩散器的装置。 电解质电池被配置为接收衬底以在其上沉积金属膜。 阳极被包含在电解质电池内。 多孔刚性扩散器连接到电解质电池并延伸穿过电解质电池。 当沉积金属膜并且阳极时，扩散器位于衬底要被定位的位置之间。