公开(公告)号：US5904487A

公开(公告)日：1999-05-18

申请号：US731028

申请日：1996-10-08

申请人： Michael R. Conboy ,  Elfido Coss, Jr.

发明人： Michael R. Conboy ,  Elfido Coss, Jr.

IPC分类号： G01N19/08

CPC分类号： H01L21/3065 ,  H01J37/32091 ,  H01J37/32541

摘要： An electrode reshaping process and apparatus is provided for use in a semiconductor etching device. A wafer is place between upper and lower electrodes of the semiconductor etching device. The apparatus and method selectively adjusts the shape of an upper electrode in the semiconductor etching device to compensate for non-uniformities inherent in the etching device. One or more motors attached to the upper electrode provide the electrode shaping forces in accordance with information provided by etch rate variation models stored in a host computer. With the shape of the upper electrode adjusted, the wafer can be etched more uniformally.

摘要翻译： 提供了一种在半导体蚀刻装置中使用的电极整形工艺和装置。 晶片位于半导体蚀刻装置的上下电极之间。 该装置和方法选择性地调节半导体蚀刻装置中的上电极的形状，以补偿蚀刻装置固有的不均匀性。 附接到上电极的一个或多个电动机根据存储在主计算机中的蚀刻速率变化模型提供的信息提供电极成形力。 随着上电极的形状调整，可以更均匀地蚀刻晶片。

公开(公告)号：US5485759A

公开(公告)日：1996-01-23

申请号：US234395

申请日：1994-04-28

申请人： Gerald L. Goff ,  Michael D. Smith ,  Michael R. Conboy

发明人： Gerald L. Goff ,  Michael D. Smith ,  Michael R. Conboy

IPC分类号： H01L21/677 ,  E01C23/01

CPC分类号： H01L21/67781

摘要： A test fixture for a boat having a plurality of slots for holding wafers includes a base for fixedly holding a boat to be tested; a wafer simulator, which wafer simulator includes a plurality of wafers sized to properly seat in the plurality of slots in the boat; structure for moving the plurality of wafers of the wafer simulator wholly into and out of the plurality of slots in the boat; and structure determining whether the plurality of wafers is properly seated in the plurality of slots in the boat when the wafer simulator is moved wholly into the plurality of slots in the boat.

摘要翻译： 用于具有用于保持晶片的多个狭槽的船的测试夹具包括用于固定地保持待测试的船的基座; 晶片模拟器，其中晶片模拟器包括多个晶片，其尺寸适于正确地安置在船中的多个槽中; 用于将晶片模拟器的多个晶片完全移入和移出船中的多个槽的结构; 以及当所述晶片模拟器完全移动到所述船中的所述多个槽中时，确定所述多个晶片是否正确地位于所述船中的所述多个槽中的结构。

公开(公告)号：US06878895B1

公开(公告)日：2005-04-12

申请号：US09383508

申请日：1999-08-26

申请人： Patrick J. Ryan ,  Michael R. Conboy ,  Stephen P. Hovestol

发明人： Patrick J. Ryan ,  Michael R. Conboy ,  Stephen P. Hovestol

IPC分类号： B07C5/344

CPC分类号： B07C5/344 ,  Y10S209/939

摘要： A reticle sorter and a semiconductor fabrication facility employing one or more reticle sorters is provided. The reticle sorter(s) generally lies between a reticle storage system and a group of one or more photolithography exposure tools (e.g., steppers) and is configured for sorting reticles in one or more cassettes. The use of the reticle sorter provides sorting functionality apart from the reticle storage system and typically closer to the group of photolithography steppers with which it is associated. This can, for example, significantly increase the throughput of semiconductor wafers through the associated photolithography exposure tools as well as in the semiconductor fabrication plant as a whole.

摘要翻译： 提供了采用一个或多个掩模版分拣机的掩模版分拣机和半导体制造设备。 掩模版分选机通常位于掩模版存储系统和一组一个或多个光刻曝光工具（例如步进器）之间，并且被配置用于将一个或多个盒中的掩模版分类。 标线分类器的使用提供了除了掩模版存储系统之外的分类功能，并且通常更接近与其相关联的光刻步进组。 例如，这可以通过相关的光刻曝光工具以及整个半导体制造工厂显着提高半导体晶片的生产量。

公开(公告)号：US06571371B1

公开(公告)日：2003-05-27

申请号：US09749293

申请日：2000-12-27

申请人： Elfido Coss, Jr. ,  Michael R. Conboy ,  Bryce Hendrix

发明人： Elfido Coss, Jr. ,  Michael R. Conboy ,  Bryce Hendrix

IPC分类号： G06F1750

CPC分类号： G03F7/70533 ,  H01L22/20 ,  Y10S438/946

摘要： The present invention provides for a method and an apparatus for using a latency time period as a control input parameter. A manufacturing run of semiconductor devices is processed. Metrology data from the processed semiconductor devices is acquired. A latency analysis process is performed using the acquired metrology data. A feedback/feed-forward modification process is performed in response to the latency analysis process.

摘要翻译： 本发明提供一种使用等待时间段作为控制输入参数的方法和装置。 处理半导体器件的制造运行。 获取来自处理的半导体器件的计量数据。 使用获取的测量数据执行延迟分析过程。 响应于延迟分析过程执行反馈/前馈修改过程。

公开(公告)号：US06449522B1

公开(公告)日：2002-09-10

申请号：US09193349

申请日：1998-11-17

申请人： Michael R. Conboy ,  Patrick J. Ryan ,  Elfido Coss, Jr.

发明人： Michael R. Conboy ,  Patrick J. Ryan ,  Elfido Coss, Jr.

IPC分类号： G06F1900

CPC分类号： H01L21/67294 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/137 ,  Y10S414/14

摘要： Systems and methods for managing automated material handling systems, such as semiconductor fabrication facilities, using material item (e.g., wafer lot) attributes and cassette attributes are provided. A semiconductor fabrication facility typically includes multiple wafer lots and multiple cassettes for storing the wafer lots. A system and method, in one embodiment of the invention, includes setting one or more lot attributes for each wafer lot, setting one or more cassette attributes for each cassette, and selecting a particular cassette for holding a particular wafer lot based on the one or more wafer lot attributes of the particular wafer lot and the one or more cassette attributes of the particular cassette. The wafer lot and cassette attributes may, for example, include an attribute identifying a position in a fabrication sequence and one or more attributes indicative of one or more contaminants. By selecting cassettes in this manner, wafer lots and cassettes may, for example, be classified or logically zoned.

摘要翻译： 提供了用于管理自动化材料处理系统的系统和方法，例如半导体制造设施，使用材料项目（例如，晶片块）属性和盒子属性。 半导体制造设备通常包括多个晶片批次和用于存储晶片批次的多个盒。 在本发明的一个实施例中的系统和方法包括设置每个晶片批次的一个或多个批次属性，为每个盒设置一个或多个盒属性，并且基于该一个或多个盒子选择用于保持特定晶片批次的特定盒 特定晶片批次的更多晶片批次属性和特定盒的一个或多个盒属性。 晶片块和盒属性可以例如包括识别制造序列中的位置的属性和指示一种或多种污染物的一个或多个属性。 通过以这种方式选择盒式磁带，可以对晶片批次和磁带盒进行分类或逻辑划分。

公开(公告)号：US06431814B1

公开(公告)日：2002-08-13

申请号：US09578101

申请日：2000-05-22

申请人： Eric Christensen ,  Russel Shirley ,  Michael R. Conboy ,  Elfido Coss, Jr.

发明人： Eric Christensen ,  Russel Shirley ,  Michael R. Conboy ,  Elfido Coss, Jr.

IPC分类号： B65B2102

CPC分类号： H01L21/67294 ,  G01R31/01 ,  H01L21/67271

摘要： A system for verifying the integrity of components moving within a material handling system ensures that only components of acceptable integrity and condition are allowed to move onto the processing locations of a semiconductor plant. In an example embodiment, components that are warped or cracked are initially detected and scanned by a beam break system and/or an optical system. An integrity verification assessment is made immediately on the component to determine whether the scanned component meets with a predefined baseline parameter or characteristic. The components that do not pass integrity verification are then removed from the material handling system while the components that pass move on to the first processing location.

摘要翻译： 用于验证在材料处理系统内移动的部件的完整性的系统确保仅允许可接受的完整性和条件的部件移动到半导体工厂的处理位置。 在一个示例实施例中，翘曲或破裂的部件最初由束断系统和/或光学系统检测和扫描。 在组件上立即进行完整性验证评估，以确定扫描的组件是否满足预定义的基准参数或特性。 然后，不通过完整性验证的组件从材料处理系统中移除，而传递的组件移动到第一个处理位置。

公开(公告)号：US06351684B1

公开(公告)日：2002-02-26

申请号：US09665646

申请日：2000-09-19

申请人： Russel Shirley ,  Michael R. Conboy ,  Horace Paul Bowser, Jr.

发明人： Russel Shirley ,  Michael R. Conboy ,  Horace Paul Bowser, Jr.

IPC分类号： G06F1900

CPC分类号： H01L21/67271 ,  G03F7/70525 ,  G03F7/70541 ,  G03F7/70741

摘要： The physical movement of reticles and solder bump masks within a wafer processing plant are continually tracked and documented in a historical database for the useful life of the reticles or masks. In an example embodiment of the mask tracking method, the method includes moving the masks from one location to another in mask pods. In addition, a mask data set is generated for each mask composed of a mask identification code cross-referenced to a pod identification code and the mask data sets are then stored in a computer arrangement. The mask data sets are then updated in the computer arrangement to include a facility location identification code as each mask moves to a subsequent location during wafer processing. An important advantage is that wafer lots and reticles can now be matched to an event on the processing line and stored as data for later review and analysis.

摘要翻译： 在晶圆处理设备内的掩模版和焊料凸块的物理运动被连续跟踪并记录在历史数据库中以保证标线片或掩模的使用寿命。 在掩模跟踪方法的示例实施例中，该方法包括将掩模从掩模盒中的一个位置移动到另一个位置。 此外，对于由与荚标识码相交的掩码识别码构成的每个掩码，生成掩模数据集，然后将掩模数据集存储在计算机装置中。 然后在计算机装置中更新掩模数据集，以在每个掩模在晶片处理期间移动到随后的位置时包括设施位置识别码。 一个重要的优点是，现在可以将晶圆批号和标线片与处理线上的事件相匹配，并将其作为数据进行存储，以备后续审查和分析。

公开(公告)号：US5818018A

公开(公告)日：1998-10-06

申请号：US826487

申请日：1997-03-27

申请人： Michael R. Conboy ,  Danny C. Shedd ,  Elfido Coss, Jr.

发明人： Michael R. Conboy ,  Danny C. Shedd ,  Elfido Coss, Jr.

IPC分类号： G06K7/10 ,  G06K13/00

CPC分类号： G06K7/10594

摘要： A scanning system for scanning bar codes attached to wafer cassettes received in a chamber of a wafer processing tool. The system includes a scanner positioned external to the chamber for reading the bar codes and generating signals indicative thereof. Light generated by the scanner passes through an opening in the chamber wall and reflects off one or more reflective or refractive members positioned internal to the chamber, to illuminate the bar code attached to a wafer cassette contained in the chamber. Light reflected from the bar code likewise is bent by the reflective or refractive members and passes through the wall opening where it is sensed by the scanner. The reflective or refractive members are positioned so that the scanner can read bar codes which are not within the line of sight of the scanner through the wall opening. Once the bar code is read, the scanner generates a signal which can be used to access a database stored in memory which contains information related to wafers contained in the cassettes identified by the bar codes.

摘要翻译： 一种扫描系统，用于扫描附接到晶片处理工具的腔室中的晶片盒的条形码。 该系统包括位于室外部的扫描器，用于读取条形码并产生指示其的信号。 由扫描器产生的光通过腔室壁中的开口并且反射位于腔室内部的一个或多个反射或折射构件，以照亮附着到容纳在腔室中的晶片盒的条形码。 从条形码反射的光同样被反射或折射构件弯曲，并穿过其中由扫描仪感测的壁开口。 反射或折射构件被定位成使得扫描仪可以通过壁开口读取不在扫描仪的视线范围内的条形码。 一旦条形码被读取，扫描器产生一个信号，该信号可用于访问存储在存储器中的数据库，其中包含与由条形码标识的盒中所包含的晶片有关的信息。

公开(公告)号：US5658123A

公开(公告)日：1997-08-19

申请号：US530404

申请日：1995-09-15

申请人： Gerald L. Goff ,  Michael R. Conboy

发明人： Gerald L. Goff ,  Michael R. Conboy

IPC分类号： B65G49/07 ,  H01L21/677 ,  B65G65/00

CPC分类号： H01L21/67757 ,  Y10S414/138 ,  Y10S414/139

摘要： A method and apparatus is presented for transferring semiconductor wafers through a barrier between two separate fabrication areas without the transfer of a container (i.e., wafer boat) with the wafers. The method includes providing an air lock chamber configured within a wall separating a first fabrication area and a second fabrication area. A first door providing access to the air lock chamber from the first fabrication area is opened and a first wafer boat containing the wafers is placed into the air lock chamber. The wafers are removed from the first wafer boat and placed in the air lock chamber. The empty first wafer boat is then removed from the air lock chamber, and the first door is closed. A second door providing access to the air lock chamber from the second fabrication area is opened, and an empty second wafer boat is placed into the air lock chamber. The wafers in the air lock chamber are then placed into the empty second wafer boat, and the second wafer boat containing the wafers is removed from the air lock chamber. The second door is then closed, completing the transfer of the wafers. In a preferred embodiment, the air lock chamber contains a mass transfer system which automatically performs the steps of (i) removing the wafers from the first wafer boat, and (ii) placing the wafers into the empty second wafer boat. The mass transfer system also stores the wafers inside the mass transfer system during the transfer operation.

摘要翻译： 提出了一种方法和装置，用于通过两个分开的制造区域之间的屏障传送半导体晶片，而不会与晶片一起转移容器（即晶片舟皿）。 该方法包括提供一个配置在分隔第一制造区域和第二制造区域的壁内的气锁室。 打开从第一制造区域进入空气锁定室的第一门，并且将包含晶片的第一晶片舟放置在空气锁定室中。 将晶片从第一晶片舟皿移除并放置在空气锁定室中。 然后将空的第一个晶片舟从空气锁定室中取出，第一个门关闭。 打开从第二制造区域进入空气锁定室的第二门，并且将空的第二晶片舟放置在空气锁定室中。 然后将空气锁定室中的晶片放置在空的第二晶片舟皿中，并且将含有晶片的第二晶片舟皿从空气锁定室中移除。 然后关闭第二扇门，完成晶片的转移。 在优选实施例中，气锁室包含质量传递系统，其自动执行以下步骤：（i）从第一晶片舟上移除晶片，以及（ii）将晶片放置在空的第二晶片舟皿中。 质量传递系统还在转移操作期间将晶片存储在质量传递系统内。

公开(公告)号：US5651798A

公开(公告)日：1997-07-29

申请号：US588565

申请日：1996-01-18

申请人： Michael R. Conboy ,  Michael D. Smith

发明人： Michael R. Conboy ,  Michael D. Smith

IPC分类号： H01L21/673 ,  H01L21/02 ,  B65D85/38 ,  H01L21/68

CPC分类号： H01L21/67294 ,  H01L21/67313 ,  Y10T29/41

摘要： The invention provides an apparatus for supporting a workpiece during the manufacturing process involving the workpiece and a process for manufacturing a workpiece using the apparatus. The apparatus includes a holding device for maintaining the workpiece in a predetermined orientation during performance of the manufacturing process. The holding device includes a plurality of members. The improvement comprises at least one member of the plurality of members including a plurality of indicators arranged in a predetermined order to establish an identifying code. Each indicator of the plurality of indicators absorbs a predetermined portion of incident light.

摘要翻译： 本发明提供一种用于在涉及工件的制造过程中支撑工件的装置和使用该装置制造工件的工艺。 该装置包括用于在制造过程的执行期间将工件保持在预定取向的保持装置。 保持装置包括多个构件。 改进包括多个构件中的至少一个构件，包括以预定顺序布置的多个指示器，以建立识别代码。 多个指示器中的每个指示器吸收入射光的预定部分。