公开(公告)号：US20060132743A1

公开(公告)日：2006-06-22

申请号：US11015727

申请日：2004-12-20

申请人： Uwe Mickan ,  Antonius Van Dijsseldonk

发明人： Uwe Mickan ,  Antonius Van Dijsseldonk

IPC分类号： G03B27/52

CPC分类号： G03F9/7026 ,  G03F9/7065 ,  G03F9/7088

摘要： A lithographic apparatus having a projection system that includes a plurality of mirrors arranged to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes an autofocus system having a light source, a position sensitive detector, and a light directing arrangement for directing a first portion of light from the light source to the position sensitive detector. The light directing arrangement further directs a second portion of light from the light source into the projection system and, after the second portion of light has traveled through the projection system to the substrate and back through the projection system to the light directing arrangement, the second portion of light is directed onto the position sensitive detector.

摘要翻译： 一种具有投影系统的光刻设备，该投影系统包括多个反射镜，所述多个反射镜布置成将图案化的辐射束投影到基板的目标部分上。 光刻设备还包括具有光源，位置敏感检测器和用于将来自光源的第一部分光引导到位置敏感检测器的光引导装置的自动对焦系统。 光引导装置进一步将来自光源的第二部分光引导到投影系统中，并且在第二部分光已经穿过投影系统移动到基板并且通过投影系统返回到光引导装置之后，第二部分 光的一部分被引导到位置敏感检测器上。

公开(公告)号：US20060092397A1

公开(公告)日：2006-05-04

申请号：US10979798

申请日：2004-11-03

申请人： Hans Laan ,  Uwe Mickan ,  Markus Franciscus Eurlings ,  Jan Bernard Van Schoot

发明人： Hans Laan ,  Uwe Mickan ,  Markus Franciscus Eurlings ,  Jan Bernard Van Schoot

IPC分类号： G03B27/54

CPC分类号： G03F7/70941 ,  G03F7/70558 ,  G03F7/70666

摘要： A lithographic apparatus comprises an illumination system for providing a projection beam of radiation, a support structure for supporting patterning device, the patterning device serving to transmit or reflect radiation in the projection beam and impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. A sensor is provided for measuring the spatial intensity distribution of the projection beam at the substrate. The spatial distribution of transmission or reflectance of the patterning device, together with the distribution of the projection beam incident on the patterning device, may be determined from the measured intensity distribution. By comparing the transmission or reflectance from regions having identical patterns the overall (macroscopic) distribution of the transmission or reflectance of the patterning device can be determined.

摘要翻译： 光刻设备包括用于提供投影辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于透射或反射投影光束中的辐射并且在其横截面中赋予投影光束图案， 用于保持基板的基板台，以及用于将图案化的光束投影到基板的目标部分上的投影系统。 提供了一种传感器，用于测量投影光束在基板处的空间强度分布。 可以根据测量的强度分布来确定图案形成装置的透射或反射率的空间分布以及入射在图案形成装置上的投影光束的分布。 通过比较具有相同图案的区域的透射率或反射率，可以确定透射率的总体（宏观）分布或图案形成装置的反射率。

公开(公告)号：US20050231704A1

公开(公告)日：2005-10-20

申请号：US10823775

申请日：2004-04-14

申请人： Uwe Mickan ,  Antonius Van Dijsseldonk

发明人： Uwe Mickan ,  Antonius Van Dijsseldonk

IPC分类号： G03B27/72 ,  G03F7/11 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/11 ,  G03F7/70941

摘要： A method of fabricating a device using a lithographic process, the method comprising applying a layer of radiation sensitive resist on top of the device, applying a metallic layer on top of the resist layer, and exposing a part of the resist layer to radiation while coupling the metallic layer to a fixed potential so as to apply an electric field across the resist layer, the direction of the electric field being substantially perpendicular to the plane of the resist layer.

摘要翻译： 一种使用光刻工艺制造器件的方法，所述方法包括在器件的顶部上施加一层辐射敏感抗蚀剂，在抗蚀剂层的顶部上施加金属层，并将抗蚀层的一部分暴露于辐射同时耦合 将金属层固定为电位，以便在抗蚀剂层上施加电场，电场的方向基本上垂直于抗蚀剂层的平面。

公开(公告)号：US20050162629A1

公开(公告)日：2005-07-28

申请号：US10762565

申请日：2004-01-23

申请人： Johannes Moors ,  Uwe Mickan

发明人： Johannes Moors ,  Uwe Mickan

IPC分类号： G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70483 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

摘要： In a lithographic apparatus, a beam of radiation passes along a beam path to a substrate, for applying patterned illumination to the substrate. An exchangeable aperture screen is inserted in the beam path to partially block out the beam from a remainder of the path onto the substrate. A test surface is provided on the aperture screen, so that the test surface receives a part of the beam that is not passed along the remainder of the beam path. The test surface is made of a material that is sensitive, under influence of radiation from the beam, to chemical alterations that also affect the optical element under influence of radiation from the beam. The test surface is later analyzed for chemical alterations after exposure to the beam.

公开(公告)号：US20050134820A1

公开(公告)日：2005-06-23

申请号：US10740830

申请日：2003-12-22

申请人： Heine Mulder ,  Antonius Johannes Van Dijsseldonk ,  Erik Loopstra ,  Uwe Mickan ,  Johannes Catharinus Mulkens ,  Harm-Jan Voorma

发明人： Heine Mulder ,  Antonius Johannes Van Dijsseldonk ,  Erik Loopstra ,  Uwe Mickan ,  Johannes Catharinus Mulkens ,  Harm-Jan Voorma

IPC分类号： G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70075 ,  G03F7/701 ,  G03F7/70425 ,  G03F7/70566

摘要： A method using a lithographic apparatus comprising a reflective integrator is claimed that optimizes the exposure of features on a target area of a substrate, when the features make an angle between 5 and 85 degrees with respect to the target area. The method comprises rotating the reflective integrator with respect to the target area providing a rotated mirror-symmetric pupil shape, which is implemented by either rotating the substrate or rotating the reflective integrator with respect to the machine or the patterning device. The patterning device comprises a maximum usable area and a patterned area which are rotated with respect to each other if a rotated substrate is employed. The method can be used in single exposure or double exposure mode. A further advantage of the method of using a rotated wafer is that it can be used for exposing features on a substrate in any direction even when the projection system of the lithographic apparatus shows a preferred polarization direction.

摘要翻译： 要求使用包括反射积分器的光刻设备的方法，当特征相对于目标区域形成5至85度的角度时，可优化基板目标区域上的特征的曝光。 该方法包括使反射积分器相对于目标区域旋转，从而提供旋转的对称瞳孔形状，其通过旋转基底或相对于机器或图案形成装置旋转反射积分器来实现。 如果使用旋转的衬底，则图案形成装置包括相对于彼此旋转的最大可用面积和图案化区域。 该方法可用于单次曝光或双曝光模式。 使用旋转晶片的方法的另一个优点是，即使当光刻设备的投影系统显示优选的偏振方向时，其可以用于在任何方向上曝光衬底上的特征。