公开(公告)号：US20060082751A1

公开(公告)日：2006-04-20

申请号：US10964817

申请日：2004-10-15

申请人： Johannes Moors ,  Uwe Mickan ,  Wolfgang Singer ,  Hans-Juergen Mann

发明人： Johannes Moors ,  Uwe Mickan ,  Wolfgang Singer ,  Hans-Juergen Mann

IPC分类号： G03B27/72

CPC分类号： G03F7/70575

摘要： A lithographic system includes a radiation system configured to provide a beam of radiation; an illumination system configured to condition the beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the projection beam with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; and transmission adaptor arranged along an optical pathway. The radiation system includes a source configured to generate a beam of radiation. The transmission adaptor adapts an intensity profile as a function of wavelength of the beam of radiation and/or the patterned beam in such a way that the intensity profile equals a predetermined intensity profile.

摘要翻译： 光刻系统包括被配置为提供辐射束的辐射系统; 配置成调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述投影光束图案; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 和传输适配器沿着光学路径布置。 辐射系统包括被配置为产生辐射束的源。 传输适配器以强度分布等于预定强度分布的方式适应作为辐射束和/或图案化束的波长的函数的强度分布。

公开(公告)号：US20060001856A1

公开(公告)日：2006-01-05

申请号：US10882684

申请日：2004-07-02

申请人： Johannes Moors ,  Uwe Mickan

发明人： Johannes Moors ,  Uwe Mickan

IPC分类号： G03B27/72

CPC分类号： G03F7/70558

摘要： A calibration apparatus is provided for calibrating a radiation sensor in a lithographic apparatus. The calibration apparatus includes a window formed of substantially radiation-transparent material for allowing radiation to pass therethrough to reach the radiation sensor. A first reference sensor is located behind the window, having an active surface abutting the window, for measuring the intensity of radiation which passes through the window. A second reference sensor is located a short distance behind the window, having an active surface facing the window, for measuring the intensity of radiation which passes through the window, a first contamination layer formed on the window, and a second contamination layer formed on the active surface of the second reference sensor. The radiation sensor can be calibrated by combining the measurements from the first and second radiation sensors.

摘要翻译： 提供了一种用于校准光刻设备中的辐射传感器的校准设备。 校准装置包括由基本上辐射透明的材料形成的窗口，用于允许辐射通过其中以到达辐射传感器。 第一参考传感器位于窗后，具有邻接窗口的活动表面，用于测量通过窗口的辐射强度。 第二参考传感器位于窗后的短距离处，具有面向窗口的活动表面，用于测量通过窗口的辐射强度，形成在窗口上的第一污染层，以及形成在窗户上的第二污染层 第二参考传感器的有效表面。 可以通过组合来自第一和第二辐射传感器的测量来校准辐射传感器。

公开(公告)号：US20050157284A1

公开(公告)日：2005-07-21

申请号：US10758270

申请日：2004-01-16

申请人： Johannes Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Leonardus Franken

发明人： Johannes Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Leonardus Franken

IPC分类号： G02B17/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/72

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. The apparatus further includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a collector which is arranged for transmitting radiation, received from a first radiation source, to the illumination system. The apparatus includes at least a heater for heating the collector when the collector receives substantially no radiation from the first radiation source. Further aspects of the invention relate to a device manufacturing method as well as a device manufactured thereby.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及被布置成用于将从第一辐射源接收的辐射传送到照明系统的收集器。 当收集器基本上不接收来自第一辐射源的辐射时，该装置至少包括用于加热集电器的加热器。 本发明的其它方面涉及一种装置制造方法以及由此制造的装置。

公开(公告)号：US20050162629A1

公开(公告)日：2005-07-28

申请号：US10762565

申请日：2004-01-23

申请人： Johannes Moors ,  Uwe Mickan

发明人： Johannes Moors ,  Uwe Mickan

IPC分类号： G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70483 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

摘要： In a lithographic apparatus, a beam of radiation passes along a beam path to a substrate, for applying patterned illumination to the substrate. An exchangeable aperture screen is inserted in the beam path to partially block out the beam from a remainder of the path onto the substrate. A test surface is provided on the aperture screen, so that the test surface receives a part of the beam that is not passed along the remainder of the beam path. The test surface is made of a material that is sensitive, under influence of radiation from the beam, to chemical alterations that also affect the optical element under influence of radiation from the beam. The test surface is later analyzed for chemical alterations after exposure to the beam.

公开(公告)号：US07092072B2

公开(公告)日：2006-08-15

申请号：US10882684

申请日：2004-07-02

申请人： Johannes Hubertus Josephina Moors ,  Uwe Mickan

发明人： Johannes Hubertus Josephina Moors ,  Uwe Mickan

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70558

摘要： A calibration apparatus is provided for calibrating a radiation sensor in a lithographic apparatus. The calibration apparatus includes a window formed of substantially radiation-transparent material for allowing radiation to pass therethrough to reach the radiation sensor. A first reference sensor is located behind the window, having an active surface abutting the window, for measuring the intensity of radiation which passes through the window. A second reference sensor is located a short distance behind the window, having an active surface facing the window, for measuring the intensity of radiation which passes through the window, a first contamination layer formed on the window, and a second contamination layer formed on the active surface of the second reference sensor. The radiation sensor can be calibrated by combining the measurements from the first and second radiation sensors.

公开(公告)号：US20060141375A1

公开(公告)日：2006-06-29

申请号：US11020557

申请日：2004-12-27

申请人： Jan Hauschild ,  Arie Den Boef ,  Martinus Antonius Leenders ,  Uwe Mickan ,  Roeland Maria Vanneer

发明人： Jan Hauschild ,  Arie Den Boef ,  Martinus Antonius Leenders ,  Uwe Mickan ,  Roeland Maria Vanneer

IPC分类号： G03B27/00 ,  G03C5/00

CPC分类号： G03F7/70191 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70641

摘要： The present invention relates to an exposure apparatus that includes an illumination system for providing a projection beam of radiation, a support structure for supporting a device provided with a pattern, the device serving to impart the projection beam with a pattern in its cross-section; a table for holding a target object, a projection system for projecting the patterned beam onto the target object and a tilting device for providing the projection beam with a tilt. The tilting device is provided substantially in a pupil plane of the projection system.

公开(公告)号：US08634062B2

公开(公告)日：2014-01-21

申请号：US12627776

申请日：2009-11-30

申请人： Gosse Charles De Vries ,  Edwin Johan Buis ,  Uwe Mickan

发明人： Gosse Charles De Vries ,  Edwin Johan Buis ,  Uwe Mickan

IPC分类号： G03B27/54

CPC分类号： G03F7/70825 ,  G03F7/70141

摘要： An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements may be configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system may further include at least one power supply configured to provide independently controllable heating to the first and second actuating elements.

摘要翻译： 提供致动器系统，其构造成相对于致动器系统的基座移动部件。 致动器系统可以包括第一和第二致动元件，每个致动元件包括彼此连接并且具有不同的热膨胀系数的两部分材料。 两个致动元件可被构造成使得如果一个温度升高，则如果其温度升高，则该部件在与另一致动元件施加的力相反的方向上施加力。 致动器系统还可以包括被配置为向第一和第二致动元件提供独立可控加热的至少一个电源。

公开(公告)号：US20120262690A1

公开(公告)日：2012-10-18

申请号：US13518301

申请日：2010-11-29

申请人： Wilhelmus Petrus De Boeij ,  Erik Roelof Loopstra ,  Uwe Mickan ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

发明人： Wilhelmus Petrus De Boeij ,  Erik Roelof Loopstra ,  Uwe Mickan ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

IPC分类号： G03B27/54

CPC分类号： G03F7/70116 ,  G03F7/70075

摘要： An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective to reflect the incident radiation towards respective reflective pupil facets so as to form part of a conditioned beam reflected from the pupil-facet mirror-device. The field facets in their second orientations are effective to reflect the incident radiation onto respective areas of the pupil-facet mirror-device designated as beam dump areas. The areas are arranged to prevent radiation incident on the areas from forming part of the conditioned beam and are arranged between the limits of an annular area on the pupil-facet mirror-device effective to define the inner and outer regions of the conditioned beam reflected from the pupil-facet mirror-device.

摘要翻译： 照明系统包括场分面镜装置和配置成调节入射在场面镜装置上的辐射束的光瞳镜。 场面反射镜装置包括相对于入射光束在第一和第二取向之间移动的反射场面。 其第一取向中的场小面有效地将入射辐射反射到各个反射光瞳面，以便形成从瞳孔面反射镜装置反射的条件光束的一部分。 其第二取向中的场面有效地将入射的辐射反射到被指定为光束聚集区域的瞳孔面反射镜装置的相应区域上。 这些区域被布置成防止入射到区域上的辐射形成调节梁的一部分，并且被布置在瞳孔面反射镜装置上的环形区域的极限之间，有效地限定条件束的内部和外部区域从 瞳孔面反射镜。

公开(公告)号：US08208123B2

公开(公告)日：2012-06-26

申请号：US10927531

申请日：2004-08-27

申请人： Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

发明人： Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Matthew Lipson ,  Tammo Utterdijk

IPC分类号： G03B27/54

CPC分类号： G03F7/70966 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70983 ,  Y10S430/162

摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

公开(公告)号：US07834975B2

公开(公告)日：2010-11-16

申请号：US11441348

申请日：2006-05-26

申请人： Jacobus Burghoorn ,  Jan Hauschild ,  Arie Jeffrey Den Boef ,  Martinus Hendrikus Antonius Leenders ,  Uwe Mickan ,  Roeland Nicolaas Maria Vanneer

发明人： Jacobus Burghoorn ,  Jan Hauschild ,  Arie Jeffrey Den Boef ,  Martinus Hendrikus Antonius Leenders ,  Uwe Mickan ,  Roeland Nicolaas Maria Vanneer

IPC分类号： G03B27/42

CPC分类号： G03F7/70641 ,  G03F7/70283 ,  G03F9/7026 ,  G03F9/7069

摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

摘要翻译： 执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投影射束投射到目标部分上，引入第一投射投影 使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影 确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。