BACK-ILLUMINATED SENSOR AND A METHOD OF MANUFACTURING A SENSOR USING A SILICON ON INSULATOR WAFER

    公开(公告)号:US20210320144A1

    公开(公告)日:2021-10-14

    申请号:US17197292

    申请日:2021-03-10

    Abstract: An image sensor is fabricated by first heavily p-type doping the thin top monocrystalline silicon substrate of an SOI wafer, then forming a relatively lightly p-doped epitaxial layer on a top surface of the top silicon substrate, where p-type doping levels during these two processes are controlled to produce a p-type dopant concentration gradient in the top silicon substrate. Sensing (circuit) elements and associated metal interconnects are fabricated on the epitaxial layer, then the handling substrate and oxide layer of the SOI wafer are at least partially removed to expose a lower surface of either the top silicon substrate or the epitaxial layer, and then a pure boron layer is formed on the exposed lower surface. The p-type dopant concentration gradient monotonically decreases from a maximum level near the top-silicon/epitaxial-layer interface to a minimum concentration level at the epitaxial layer's upper surface.

    Electron gun and electron microscope

    公开(公告)号:US10943760B2

    公开(公告)日:2021-03-09

    申请号:US16568110

    申请日:2019-09-11

    Abstract: An electron gun for an electron microscope or similar device includes a field emitter cathode having a field emitter protrusion extending from the output surface of a monocrystalline silicon substrate, and electrodes configured to enhance the emission of electrons from a tip portion of the field emitter protrusion to generate a primary electron beam. A thin, contiguous SiC layer is disposed directly on at least the tip portion of the field emitter protrusion using a process that minimizes oxidation and defects in the SiC layer. Optional gate layers may be placed at, slightly lower than or slightly higher than the height of the field emitter tip portion to achieve high emission current and fast and accurate control of the primary emission beam. The field emitter can be p-type doped and configured to operate in a reverse bias mode, or the field emitter can be n-type doped.

    IMAGE SENSORS WITH A TUNABLE FLOATING DIFFUSION STRUCTURE

    公开(公告)号:US20240250110A1

    公开(公告)日:2024-07-25

    申请号:US18404530

    申请日:2024-01-04

    CPC classification number: H01L27/14856

    Abstract: Image sensors with a tunable floating diffusion (FD) structure for applications such as inspection and metrology are provided. One image sensor includes a sensing node electrically connected to circuits of the image sensor, formed on a first side of a silicon layer adjacent to the circuits, and formed by a Voltage-Controlled Variable Floating Diffusion (VCVFD) structure. The VCVFD structure includes a gate electrode configured to control a variable capacitance of the VCVFD structure via voltage applied to the gate electrode by an electrical connection to the gate electrode. The VCVFD structure converts a charge responsive to electron accumulation in the channel of the circuits to a voltage proportional to an amount of the charge and dependent on the variable capacitance. The VCVFD may also be implemented in an electron-sensor pixel configured for detecting electrons or x-rays as described further herein.

    Back-Illuminated Sensor And A Method Of Manufacturing A Sensor Using A Silicon On Insulator Wafer

    公开(公告)号:US20240063248A1

    公开(公告)日:2024-02-22

    申请号:US18502059

    申请日:2023-11-05

    CPC classification number: H01L27/14687 H01L27/1464 H01L27/14806

    Abstract: An image sensor is fabricated by first heavily p-type doping the thin top monocrystalline silicon substrate of an SOI wafer, then forming a relatively lightly p-doped epitaxial layer on a top surface of the top silicon substrate, where p-type doping levels during these two processes are controlled to produce a p-type dopant concentration gradient in the top silicon substrate. Sensing (circuit) elements and associated metal interconnects are fabricated on the epitaxial layer, then the handling substrate and oxide layer of the SOI wafer are at least partially removed to expose a lower surface of either the top silicon substrate or the epitaxial layer, and then a pure boron layer is formed on the exposed lower surface. The p-type dopant concentration gradient monotonically decreases from a maximum level near the top-silicon/epitaxial-layer interface to a minimum concentration level at the epitaxial layer's upper surface.

    United states frequency conversion using interdigitated nonlinear crystal gratings

    公开(公告)号:US11815784B2

    公开(公告)日:2023-11-14

    申请号:US18087236

    申请日:2022-12-22

    Abstract: A nonlinear crystal grating assembly including two integral nonlinear crystal grating structures having inverted crystal axes and having parallel spaced-apart mesas with predetermined mesa widths arranged such that, when assembled in an interdigitated configuration, the mesas of the two grating structures form an alternating grating pattern that is aligned with a propagation direction of input light, thereby creating a periodic structure for quasi-phase-matching (QPM). The nonlinear crystal grating structures are formed using strontium tetraborate, lithium triborate or another nonlinear crystal material. The nonlinear crystal grating assembly is utilized in a laser assembly in which fundamental wavelengths are doubled and/or summed using intermediate frequency conversion stages, and then a final frequency converting stage utilizes the nonlinear crystal grating assembly to double or sum one or more intermediate light beam frequencies to generate laser output light at high power and photon energy levels. A method and inspection system are also described.

    Frequency conversion using interdigitated nonlinear crystal gratings

    公开(公告)号:US11567391B1

    公开(公告)日:2023-01-31

    申请号:US17555404

    申请日:2021-12-18

    Abstract: A nonlinear crystal grating assembly including two integral nonlinear crystal grating structures having inverted crystal axes and having parallel spaced-apart mesas with predetermined mesa widths arranged such that, when assembled in an interdigitated configuration, the mesas of the two grating structures form an alternating grating pattern that is aligned with a propagation direction of input light, thereby creating a periodic structure for quasi-phase-matching (QPM). The nonlinear crystal grating structures are formed using strontium tetraborate, lithium triborate or another nonlinear crystal material. The nonlinear crystal grating assembly is utilized in a laser assembly in which fundamental wavelengths are doubled and/or summed using intermediate frequency conversion stages, and then a final frequency converting stage utilizes the nonlinear crystal grating assembly to double or sum one or more intermediate light beam frequencies to generate laser output light at high power and photon energy levels. A method and inspection system are also described.

    Frequency conversion using stacked strontium tetraborate plates

    公开(公告)号:US11543732B2

    公开(公告)日:2023-01-03

    申请号:US17553705

    申请日:2021-12-16

    Abstract: An optical element includes Strontium tetraborate SrB4O7 (SBO) crystal plates that are cooperatively configured to create a periodic structure for quasi-phase-matching (QPM) is used in the final frequency converting stage of a laser assembly to generate laser output light having a wavelength in the range of 125 nm to 183 nm. One or more fundamental light beams having fundamental wavelengths between 1 and 1.1 μm are doubled and/or summed using multiple intermediate frequency conversion stages to generate one or more intermediate light beam frequencies (e.g., second through eighth harmonics, or sums thereof), and then the final frequency converting stage utilizes the optical element to either double a single intermediate light beam frequency or to sum two intermediate light beam frequencies to generate the desired laser output light at high power and photon energy levels. A method and inspection system incorporating the laser assembly is also described.

    Strontium tetraborate as optical coating material

    公开(公告)号:US11360032B2

    公开(公告)日:2022-06-14

    申请号:US17144475

    申请日:2021-01-08

    Abstract: Strontium tetraborate is used as an optical coating material for optical components utilized in semiconductor inspection and metrology systems to take advantage of its high refractive indices, high optical damage threshold and high microhardness in comparison to conventional optical materials. At least one layer of strontium tetraborate is formed on the light receiving surface of an optical component's substrate such that its thickness serves to increase or decrease the reflectance of the optical component. One or multiple additional coating layers may be placed on top of or below the strontium tetraborate layer, with the additional coating layers consisting of conventional optical materials. The thicknesses of the additional layers may be selected to achieve a desired reflectance of the optical component at specific wavelengths. The coated optical component is used in an illumination source or optical system utilized in a semiconductor inspection system, a metrology system or a lithography system.

    Frequency conversion using stacked strontium tetraborate plates

    公开(公告)号:US11237455B2

    公开(公告)日:2022-02-01

    申请号:US17239561

    申请日:2021-04-24

    Abstract: A nonlinear crystal including stacked Strontium tetraborate SrB4O7 (SBO) crystal plates that are cooperatively configured to create a periodic structure for quasi-phase-matching (QPM) is used in the final frequency converting stage of a laser assembly to generate laser output light having a wavelength in the range of 125 nm to 183 nm. One or more fundamental light beams having fundamental wavelengths between 1 and 1.1 μm are doubled and/or summed using multiple intermediate frequency conversion stages to generate one or more intermediate light beam frequencies (e.g., second through eighth harmonics, or sums thereof), and then the final frequency converting stage utilizes the nonlinear crystal to either double a single intermediate light beam frequency or to sum two intermediate light beam frequencies to generate the desired laser output light at high power and photon energy levels. A method and inspection system incorporating the laser assembly is also described.

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