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49 条记录 (耗时 0.037 秒)

    Chemical material integrated management system and method thereof
    35.
    发明授权
    Chemical material integrated management system and method thereof 失效
    化学材料综合管理系统及其方法

    公开(公告)号：US07092960B2

    公开(公告)日：2006-08-15

    申请号：US09796066

    申请日：2001-02-28

    申请人： Satoshi Ohishi ,  Yoshiaki Ichikawa ,  Akira Sekine ,  Takako Oono ,  Tetsuya Matsui

    发明人： Satoshi Ohishi ,  Yoshiaki Ichikawa ,  Akira Sekine ,  Takako Oono ,  Tetsuya Matsui

    IPC分类号： G06F7/00

    CPC分类号： G06Q10/06 ,  Y10S707/99944

    摘要： A chemical substance total management system and a chemical substance total management method which can easily manage amounts and release destination of managing substances. The chemical substance total management system includes a material composition database of component composition information of material or product in a form of database, a managing substance database in a form of a list of substance requiring management, for identifying substances constituting the material or product on the basis of the material composition database and identifying substance required management on the basis of the managing substance database for managing chemical substance contained in the material handled by a business entity or product. The system further includes release coefficient database storing weight ratio data in each transfer and release destination per the identified management required substance in a form of database.

    摘要翻译： 化学物质总管理体系和化学物质总管理方法，可以轻松管理物质的管理量和释放目的地。 化学物质总管理系统包括数据库形式的材料或产品的组成成分信息的材料组成数据库，需要管理的物质清单形式的管理物质数据库，用于识别构成材料或产品的物质 材料成分数据库的基础，并根据由商业实体或产品处理的材料中所含的管理化学物质的管理物质数据库，确定物质所需的管理。 该系统还包括释放系数数据库，以数据库的形式存储每个转移和释放目的地的每个所识别的管理所需物质的重量比数据。

    Ultrasonic flaw detecting method and ultrasonic flaw detector
    36.
    发明申请
    Ultrasonic flaw detecting method and ultrasonic flaw detector 有权
    超声波探伤法和超声波探伤仪

    公开(公告)号：US20050183505A1

    公开(公告)日：2005-08-25

    申请号：US11049949

    申请日：2005-02-04

    申请人： Naoyuki Kono ,  Tetsuya Matsui ,  Masahiro Koike ,  Masahiro Tooma ,  Yoshinori Musha ,  Masahiro Miki

    发明人： Naoyuki Kono ,  Tetsuya Matsui ,  Masahiro Koike ,  Masahiro Tooma ,  Yoshinori Musha ,  Masahiro Miki

    IPC分类号： G01N29/04 ,  G01N29/07 ,  G01N29/26

    CPC分类号： G01N29/262 ,  G01N29/07 ,  G01N2291/0232 ,  G01N2291/0421 ,  G01N2291/0422 ,  G01N2291/106

    摘要： In order to make it possible in ultrasonic flaw detection to generate ultrasonic waves containing a main beam only by use of an array probe and clearly identify a defect in a specimen by use of images, an element pitch P (the distance between centers of adjacent ultrasonic transducer elements in the array probe) is set longer than ¼ of the wavelength of longitudinal waves generated by the ultrasonic transducer elements and shorter than ½ of the wavelength and reception signals up to time corresponding to the sum of wall thickness round-trip propagation time for longitudinal waves and wall thickness round-trip propagation time for shear waves in the specimen are displayed.

    摘要翻译： 为了在超声波探伤中可以通过使用阵列探针产生包含主光束的超声波，并通过使用图像清楚地识别样本中的缺陷，元素间距P（相邻超声波中心之间的距离 阵列探头中的换能器元件）被设置为比由超声换能器元件产生的纵波的波长的1/4，并且短于对应于壁厚往返传播时间之和的波长和接收信号的1/2的一半 显示样品中剪切波的纵波和壁厚往返传播时间。

    Method and system for comprehensive management of chemical materials
    37.
    发明授权
    Method and system for comprehensive management of chemical materials 有权
    化学材料综合管理方法与系统

    公开(公告)号：US06934640B2

    公开(公告)日：2005-08-23

    申请号：US09858478

    申请日：2001-05-17

    申请人： Yoshiaki Ichikawa ,  Akira Sekine ,  Takako Oono ,  Hirotaka Satou ,  Tetsuya Matsui

    发明人： Yoshiaki Ichikawa ,  Akira Sekine ,  Takako Oono ,  Hirotaka Satou ,  Tetsuya Matsui

    IPC分类号： B09B5/00 ,  G06F17/30 ,  G06Q50/00 ,  G06Q50/26 ,  G06F17/60

    CPC分类号： G06Q10/06 ,  G06F2219/00 ,  G06Q10/0875

    摘要： The present invention provides a method and system for management of chemical materials comprising the steps of providing a first data set containing which substances comprise the materials, providing a second data set containing which of the substances are to be controlled, providing a third data set containing a ratio of discharge of the controlled substances in a process, analyzing a preset amount of the materials in the process and determining a quantity of the controlled substances utilizing the first and second data sets, determining an emissions quantity of the controlled substances utilizing the ratio and the quantity of the controlled substances and maintaining the third data set according to a preset interval of time.

    摘要翻译： 本发明提供了一种用于管理化学材料的方法和系统，包括以下步骤：提供包含物质包括材料的第一数据集，提供包含要控制哪些物质的第二数据集，提供含有 处理过程中受控物质的排放比例，分析该过程中的预设量的材料并利用第一和第二数据集确定受控物质的数量，使用该比率确定受控物质的排放量;以及 受控物质的数量，并根据预设的时间间隔维持第三数据集。

    DARK-FIELD DEFECT INSPECTING METHOD, DARK-FIELD DEFECT INSPECTING APPARATUS, ABERRATION ANALYZING METHOD, AND ABERRATION ANALYZING APPARATUS
    40.
    发明申请
    DARK-FIELD DEFECT INSPECTING METHOD, DARK-FIELD DEFECT INSPECTING APPARATUS, ABERRATION ANALYZING METHOD, AND ABERRATION ANALYZING APPARATUS 有权
    暗场缺陷检查方法，暗场缺陷检查装置，分析方法和分析方法

    公开(公告)号：US20110286001A1

    公开(公告)日：2011-11-24

    申请号：US13142328

    申请日：2010-01-20

    申请人： Atsushi Taniguchi ,  Taketo Ueno ,  Yukihiro Shibata ,  Shunji Maeda ,  Tetsuya Matsui

    发明人： Atsushi Taniguchi ,  Taketo Ueno ,  Yukihiro Shibata ,  Shunji Maeda ,  Tetsuya Matsui

    IPC分类号： G01N21/55

    CPC分类号： G01N21/9501 ,  G01N21/21 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/93 ,  G01N21/94 ,  G01N21/956 ,  G01N2021/8822

    摘要： By including an illumination system and a detection system, an information collecting function of monitoring an environment, such as temperature and atmospheric pressure, and an apparatus state managing function having a feedback function of comparing the monitoring result and a design value, a theoretical calculation value or an ideal value derived from simulation results and calibrating an apparatus so that the monitoring result is brought close to the ideal value, a unit for keeping the apparatus state and apparatus sensitivity constant is provided. A control unit 800 is configured to include a recording unit 801, a comparing unit 802, a sensitivity predicting unit 803, and a feedback control unit 804. In the comparing unit 802, the monitoring result transmitted from the recording unit 801 and an ideal value stored in a database 805 are compared with each other. When a difference between the ideal value and the monitoring result exceeds a predetermined threshold, the feedback control unit 804 corrects the illumination system and the detection system.

    摘要翻译： 通过包括照明系统和检测系统，监视诸如温度和大气压力之类的环境的信息收集功能，以及具有比较监视结果和设计值的反馈功能的设备状态管理功能，理论计算值 或者从模拟结果导出的理想值，并且对设备进行校准，使得监视结果接近理想值，提供用于保持设备状态和设备灵敏度恒定的单元。 控制单元800被配置为包括记录单元801，比较单元802，灵敏度预测单元803和反馈控制单元804.在比较单元802中，从记录单元801发送的监视结果和理想值 存储在数据库805中进行比较。 当理想值与监视结果之间的差异超过预定阈值时，反馈控制单元804校正照明系统和检测系统。