公开(公告)号：US10957521B2

公开(公告)日：2021-03-23

申请号：US15991021

申请日：2018-05-29

Applicant: LAM RESEARCH CORPORATION

Inventor： Yuhou Wang ,  Michael John Martin ,  Jon Mcchesney ,  Alexander Miller Paterson

IPC: H01J37/32 ,  G06T7/00 ,  H01L21/66

Abstract: A system includes an image processing module configured to receive an image, captured by an imaging device, of a plasma environment within a substrate processing chamber during processing of a substrate and extract one or more features of the image indicative of a plasma sheath formed within the plasma environment during the processing of the substrate. A control module is configured to determine a plasma sheath profile based on the one or more features extracted from the image and selectively adjust at least one processing parameter related to the processing of the substrate based on the plasma sheath profile.

公开(公告)号：US20200020510A1

公开(公告)日：2020-01-16

申请号：US16035423

申请日：2018-07-13

Applicant: Lam Research Corporation

Inventor： Juline Shoeb ,  Alexander Miller Paterson ,  Ying Wu

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/3065

Abstract: Systems and methods for generating monoenergetic ions are described. A duty cycle of a high parameter level of a multistate parameter signal is maintained and a difference between the high parameter level and a low parameter level of the multistate parameter signal is maintained to generate monoenergetic ions. The monoenergetic ions are used to etch a top material layer of a substrate at a rate that is self-limiting without substantially etching a bottom material layer of the substrate.