公开(公告)号：US12230482B2

公开(公告)日：2025-02-18

申请号：US16497091

申请日：2017-07-24

Applicant: LAM RESEARCH CORPORATION

Inventor： Hiran Rajitha Rathnasinghe ,  Jon Mcchesney

IPC: H01J37/32 ,  H01L21/683 ,  H01L21/687

Abstract: An edge ring is configured to be raised and lowered relative to a substrate support, via one or more lift pins, in a substrate processing system. The edge ring is further configured to interface with a guide feature extending upward from a bottom ring and/or a middle ring of the substrate support during tuning of the edge ring. The edge ring includes an upper surface, an annular inner diameter, an annular outer diameter, a lower surface, and an annular groove arranged in the lower surface of the edge ring to interface with the guide feature. Walls of the annular groove are substantially vertical.

公开(公告)号：US12027410B2

公开(公告)日：2024-07-02

申请号：US17181571

申请日：2021-02-22

Applicant: LAM RESEARCH CORPORATION

Inventor： Haoquan Yan ,  Robert Griffith O'Neill ,  Raphael Casaes ,  Jon Mcchesney ,  Alex Paterson

IPC: H01L21/687 ,  H01J37/02 ,  H01J37/20 ,  H01J37/32 ,  H01L21/67

CPC classification number: H01L21/68742 ,  H01J37/023 ,  H01J37/20 ,  H01J37/32623 ,  H01J37/32642 ,  H01J37/32715 ,  H01L21/67069 ,  H01L21/68735

Abstract: An edge ring arrangement for a processing chamber includes a first ring configured to surround and overlap a radially outer edge of an upper plate of a pedestal arranged in the processing chamber, a second ring arranged below the first moveable ring, wherein a portion of the first ring overlaps the second ring, a first actuator configured to actuate a first pillar to selectively move the first ring to a raised position and a lowered position relative to the pedestal, and a second actuator configured to actuate a second pillar to selectively move the second ring to a raised position and a lowered position relative to the pedestal.

公开(公告)号：US12183554B2

公开(公告)日：2024-12-31

申请号：US17681606

申请日：2022-02-25

Applicant: Lam Research Corporation

Inventor： Hiran Rajitha Rathnasinghe ,  Shawn Tokairin ,  Jon Mcchesney

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/687

Abstract: A middle ring configured to be arranged on a bottom ring and to support a moveable edge ring and further configured to be raised and lowered relative to a substrate support includes an upper surface that is stepped, an annular inner diameter, an annular outer diameter, a lower surface, a guide feature in the upper surface defining the annular outer diameter, an inner annular rim in the upper surface defining the annular inner diameter, and a groove defined in the upper surface between the guide feature and the inner annular rim.

公开(公告)号：US10957521B2

公开(公告)日：2021-03-23

申请号：US15991021

申请日：2018-05-29

Applicant: LAM RESEARCH CORPORATION

Inventor： Yuhou Wang ,  Michael John Martin ,  Jon Mcchesney ,  Alexander Miller Paterson

IPC: H01J37/32 ,  G06T7/00 ,  H01L21/66

Abstract: A system includes an image processing module configured to receive an image, captured by an imaging device, of a plasma environment within a substrate processing chamber during processing of a substrate and extract one or more features of the image indicative of a plasma sheath formed within the plasma environment during the processing of the substrate. A control module is configured to determine a plasma sheath profile based on the one or more features extracted from the image and selectively adjust at least one processing parameter related to the processing of the substrate based on the plasma sheath profile.