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公开(公告)号：US11728137B2
公开(公告)日：2023-08-15
申请号：US17267920
申请日：2019-08-08
发明人： Yuhou Wang , Maolin Long , Ying Wu , Alexander Miller Paterson
IPC分类号： H01J37/32
CPC分类号： H01J37/32165 , H01J37/32183 , H01J2237/24564 , H01J2237/24585
摘要： A drive circuit for providing RF power to a component of a substrate processing system includes a plasma source operating at a first frequency. A load includes the component of the substrate processing system. An impedance network connects the plasma source to the load. A current sensor senses current at an output of the plasma source. A voltage sensor senses voltage at the output of the plasma source. A controller includes a tuned frequency calculator configured to calculate a tuned frequency for the plasma source based on the voltage, the current, and a configuration of the impedance network and to adjust the first frequency based on the tuned frequency.
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公开(公告)号：US20200286713A1
公开(公告)日：2020-09-10
申请号：US16885083
申请日：2020-05-27
发明人： Maolin Long , Yuhou Wang , Ying Wu , Alex Paterson
IPC分类号： H01J37/32
摘要： Frequency tuning for a matchless plasma source is described. To perform the frequency tuning, current is measured at an output of an amplification circuit of the matchless plasma source after a change in a frequency of operation of the matchless plasma source. Upon determining that the current has increased with the change in the frequency of operation, the frequency of operation is further changed until the current has decreased. When the current has decreased, the changed frequency of operation is further modified to be an operational frequency. When the matchless plasma source operates at the operational frequency, the current at the output of the amplification circuit is maximized.
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公开(公告)号：US20230223236A1
公开(公告)日：2023-07-13
申请号：US18009308
申请日：2021-06-08
发明人： Tom A. Kamp , Yuhou Wang , Michael John Martin
IPC分类号： H01J37/32
CPC分类号： H01J37/32165 , H01J37/32146 , H01J37/32174
摘要： A method for pulsing is described. The method includes generating a first radio frequency (RF) signal, and pulsing a parameter of the first RF signal between a first parameter level and a second parameter level at a pulsing frequency during a cycle of a digital pulsed signal. The method further includes generating a second RF signal, and pulsing a parameter of the second RF signal at a higher pulsing frequency than the pulsing frequency of the parameter of the first RF signal during the cycle. During the cycle, a start time of pulsing the parameter of the first RF signal is synchronized with a start time of pulsing the parameter of the second RF signal and an end time of pulsing the parameter of the first RF signal is synchronized with an end time of pulsing the parameter of the second RF signal.
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公开(公告)号：US11342159B2
公开(公告)日：2022-05-24
申请号：US16888613
申请日：2018-11-28
发明人： Maolin Long , Yuhou Wang , Ying Wu , Alex Paterson
摘要： A system and method for generating a radio frequency (RF) waveform are described. The method includes defining a train of on-off pulses separated by an off state having no on-off pulses. The method further includes applying a multi-level pulse waveform that adjusts a magnitude of each of the on-off pulses to generate an RF waveform. The method includes sending the RF waveform to an electrode.
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公开(公告)号：US20220117074A1
公开(公告)日：2022-04-14
申请号：US17558332
申请日：2021-12-21
发明人： Maolin Long , Yuhou Wang , Ricky Marsh , Alex Paterson
摘要： A matchless plasma source is described. The matchless plasma source includes a controller that is coupled to a direct current (DC) voltage source of an agile DC rail to control a shape of an amplified square waveform that is generated at an output of a half-bridge transistor circuit. The matchless plasma source further includes the half-bridge transistor circuit used to generate the amplified square waveform to power an electrode, such as an antenna, of a plasma chamber. The matchless plasma source also includes a reactive circuit between the half-bridge transistor circuit and the electrode. The reactive circuit has a high-quality factor to negate a reactance of the electrode. There is no radio frequency (RF) match and an RF cable that couples the matchless plasma source to the electrode.
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6.发明申请公开(公告)号：US20180294566A1
公开(公告)日：2018-10-11
申请号：US15942629
申请日：2018-04-02
发明人： Yuhou Wang , Arthur H. Sato , Ying Wu , Alexander Miller Paterson
IPC分类号： H01Q5/335
摘要： A radio frequency (RF) matching circuit control system includes an RF matching circuit including a plurality of tunable components. The RF matching circuit is configured to receive an input signal including at least two pulsing levels from an RF generator, provide an output signal to a load based on the input signal, and match an impedance associated with the input signal to impedances of the load. A controller is configured to determine respective impedances of the load for the at least two pulsing levels of the input signal and adjust operating parameters of the plurality of tunable components to align a frequency tuning range of the RF matching circuit with the respective impedances of the load for the at least two pulsing levels to match the impedance associated with the input signal to the respective impedances.
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公开(公告)号：US11728136B2
公开(公告)日：2023-08-15
申请号：US17729451
申请日：2022-04-26
发明人： Maolin Long , Yuhou Wang , Ying Wu , Alex Paterson
CPC分类号： H01J37/32128 , H01J37/3211 , H03K4/92 , H01J2237/334
摘要： A system and method for generating a radio frequency (RF) waveform are described. The method includes defining a train of on-off pulses separated by an off state having no on-off pulses. The method further includes applying a multi-level pulse waveform that adjusts a magnitude of each of the on-off pulses to generate an RF waveform. The method includes sending the RF waveform to an electrode.
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公开(公告)号：US20220199365A1
公开(公告)日：2022-06-23
申请号：US17606686
申请日：2020-04-24
IPC分类号： H01J37/32
摘要： A direct drive system for providing RF power to a substrate processing system includes a direct drive enclosure including a first direct drive circuit located in the direct drive enclosure and operating at a first frequency and a first connector connected to the first direct drive circuit. A junction box is arranged adjacent to the direct drive enclosure and includes a first capacitive circuit connected to the first direct drive circuit; a second connector located on one side of the junction box, connected to one terminal of the first capacitive circuit and mating with the first connector of the direct drive enclosure; third and fourth connectors connected to another terminal of the first capacitive circuit; and a coil enclosure arranged adjacent to the junction box and including first and second coils and fifth and sixth connectors mating with the third and fourth connectors of the junction box.
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公开(公告)号：US10672590B2
公开(公告)日：2020-06-02
申请号：US15921266
申请日：2018-03-14
发明人： Maolin Long , Yuhou Wang , Ying Wu , Alex Paterson
IPC分类号： H01J37/32
摘要： Frequency tuning for a matchless plasma source is described. To perform the frequency tuning, current is measured at an output of an amplification circuit of the matchless plasma source after a change in a frequency of operation of the matchless plasma source. Upon determining that the current has increased with the change in the frequency of operation, the frequency of operation is further changed until the current has decreased. When the current has decreased, the changed frequency of operation is further modified to be an operational frequency. When the matchless plasma source operates at the operational frequency, the current at the output of the amplification circuit is maximized.
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公开(公告)号：US20190287764A1
公开(公告)日：2019-09-19
申请号：US15921266
申请日：2018-03-14
发明人： Maolin Long , Yuhou Wang , Ying Wu , Alex Paterson
IPC分类号： H01J37/32
摘要： Frequency tuning for a matchless plasma source is described. To perform the frequency tuning, current is measured at an output of an amplification circuit of the matchless plasma source after a change in a frequency of operation of the matchless plasma source. Upon determining that the current has increased with the change in the frequency of operation, the frequency of operation is further changed until the current has decreased. When the current has decreased, the changed frequency of operation is further modified to be an operational frequency. When the matchless plasma source operates at the operational frequency, the current at the output of the amplification circuit is maximized.
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