-
公开(公告)号：US20240404804A1
公开(公告)日：2024-12-05
申请号：US18689017
申请日：2022-09-13
Applicant: Lam Research Corporation
Inventor： Alexander Miller Paterson , Daniel Guzman , William T. Hart , Cristian Siladie , Michael John Martin , Yuhou Wang , Michael Drymon , John Drewery , Robert Griffith O'Neill , Luc Albarede , Neil Simon Ocampo
Abstract: A radiofrequency calibration system for a direct-drive radiofrequency power supply includes a reference box that includes a reference circuit for converting a non-reference input impedance to a reference output impedance. The reference box has an input connector electrically connected to a radiofrequency output coupling of the direct-drive radiofrequency power supply. A radiofrequency power meter has a radiofrequency power input electrically connected to an output connector of the reference box. The radiofrequency power meter has an input impedance and an output impedance that substantially match the reference output impedance of the reference box. A cable has a first end electrically connected to a radiofrequency power output of the radiofrequency power meter and a second end connected to a test load that has an impedance that substantially matches the reference output impedance of the reference box. A controller is connected in data communication with a data interface of the radiofrequency power meter.
-
2.发明公开公开(公告)号：US20230245873A1
公开(公告)日：2023-08-03
申请号：US18009575
申请日：2021-06-10
Applicant: Lam Research Corporation
Inventor： Maolin Long , Yuhou Wang , Michael John Martin , Alexander Miller Paterson
CPC classification number: H01J37/32935 , H01J37/32082 , G01R27/08 , H02J50/20
Abstract: A direct drive system for providing RF power to a component of a substrate processing system includes a direct drive circuit including a switch and configured to supply RF power to the component. A switch protection module is configured to monitor a load current and a load voltage in a processing chamber, calculate load resistance based on the load current and the load voltage, compare the load resistance to a first predetermined load resistance, and adjust at least one of an RF power limit and an RF current limit of the direct drive circuit based on the comparison.
-
公开(公告)号：US20230223292A1
公开(公告)日：2023-07-13
申请号：US18009254
申请日：2021-06-10
Applicant: Lam Research Corporation
Inventor： Lai Wei , Ji Soo Kim , Alan Jeffrey Miller , William Thie , Frank Yun Lin , Jun Hee Hee Han , Jie Liu , Conan Chiang , Michael John Martin
IPC: H01L21/687 , H01J37/32 , H01L21/67 , H01L21/3065
CPC classification number: H01L21/68721 , H01L21/68735 , H01J37/32715 , H01L21/67069 , H01L21/3065 , H01J2237/334
Abstract: In some examples, a flat Bottom Shadow Ring (fBSR) is provided for processing a substrate in a processing chamber. An example fBSR comprises an overhang for covering an edge of the substrate in the processing chamber. The overhang includes a fiat zone that extends radially outward over the outer edge of the substrate.
-
公开(公告)号：US10957521B2
公开(公告)日：2021-03-23
申请号：US15991021
申请日：2018-05-29
Applicant: LAM RESEARCH CORPORATION
Inventor： Yuhou Wang , Michael John Martin , Jon Mcchesney , Alexander Miller Paterson
Abstract: A system includes an image processing module configured to receive an image, captured by an imaging device, of a plasma environment within a substrate processing chamber during processing of a substrate and extract one or more features of the image indicative of a plasma sheath formed within the plasma environment during the processing of the substrate. A control module is configured to determine a plasma sheath profile based on the one or more features extracted from the image and selectively adjust at least one processing parameter related to the processing of the substrate based on the plasma sheath profile.
-
Patent Agency Ranking
公开(公告)号：US20240396372A1
公开(公告)日：2024-11-28
申请号：US18689007
申请日：2022-09-13
Applicant: Lam Research Corporation
Inventor： Alexander Miller Paterson , Michael John Martin , Yuhou Wang , John Drewery , Neema Rastgar
Abstract: A junction system for a direct-drive radiofrequency power supply includes a first terminal connected to a radiofrequency signal supply pin that is connected to an output of a direct-drive radiofrequency signal generator. The junction system also includes a second terminal connected to a coil of a plasma processing chamber. The junction system includes a reactive circuit connected between the first terminal and the second terminal. The reactive circuit is configured to transform a shaped-amplified square waveform signal into a shaped-sinusoidal signal in route from the first terminal to the second terminal. The reactive circuit includes a variable capacitor having a capacitance set so that a peak amount of radiofrequency power is transmitted from the direct-drive radiofrequency signal generator through the reactive circuit to the coil.
-
公开(公告)号：US20220126454A1
公开(公告)日：2022-04-28
申请号：US17427522
申请日：2020-02-06
Applicant: Lam Research Corporation
Inventor： Michael John Martin , Yuhou Wang , Alexander Miller Paterson
Abstract: Systems and methods are provided for positioning a wafer in relation to a datum structure. In one example, a system comprises a camera arrangement including at least two cameras, each of the at least two cameras including a field of view when positioned in the camera arrangement, each field of view including a peripheral edge of the wafer and a peripheral edge of the datum structure. A processor receives positional data from each of the at least two cameras and determines, in relation to each field of view, a gap size between the respective peripheral edges of the wafer and the datum location included in the respective field of view. A controller adjusts a position of the wafer relative to the datum structure based on the determined respective gap sizes.
-
公开(公告)号：US20240395519A1
公开(公告)日：2024-11-28
申请号：US18689023
申请日：2022-09-14
Applicant: Lam Research Corporation
Inventor： Alexander Miller Paterson , Daniel Guzman , William T. Hart , Cristian Siladie , Michael John Martin , Michael Drymon , Yuhou Wang , John Drewery , Eduardo Castanos-Martinez , Jorge Luque
IPC: H01J37/32
Abstract: A plasma processing chamber has an upper window with a coil disposed above the upper window. A coil connection enclosure is disposed above the coil. A metrology enclosure is disposed above the coil connection enclosure. A spectral reflectometry system is disposed within the metrology enclosure. The spectral reflectometry system includes an optical collimator positioned to direct a beam of light through an opening in the metrology enclosure, an opening in the coil connection enclosure, and the upper window into the plasma processing chamber. The optical collimator is also configured to receive reflected light from within the plasma processing chamber, where the reflected light passes through the upper window and through the opening in the coil connection enclosure and through the opening in the metrology enclosure. A tip angle and a tilt angle of the optical collimator are remotely adjusted to optimize an orientation of the optical collimator.
-
公开(公告)号：US20230223236A1
公开(公告)日：2023-07-13
申请号：US18009308
申请日：2021-06-08
Applicant: Lam Research Corporation
Inventor： Tom A. Kamp , Yuhou Wang , Michael John Martin
IPC: H01J37/32
CPC classification number: H01J37/32165 , H01J37/32146 , H01J37/32174
Abstract: A method for pulsing is described. The method includes generating a first radio frequency (RF) signal, and pulsing a parameter of the first RF signal between a first parameter level and a second parameter level at a pulsing frequency during a cycle of a digital pulsed signal. The method further includes generating a second RF signal, and pulsing a parameter of the second RF signal at a higher pulsing frequency than the pulsing frequency of the parameter of the first RF signal during the cycle. During the cycle, a start time of pulsing the parameter of the first RF signal is synchronized with a start time of pulsing the parameter of the second RF signal and an end time of pulsing the parameter of the first RF signal is synchronized with an end time of pulsing the parameter of the second RF signal.
-
公开(公告)号：US12261029B2
公开(公告)日：2025-03-25
申请号：US18009575
申请日：2021-06-10
Applicant: Lam Research Corporation
Inventor： Maolin Long , Yuhou Wang , Michael John Martin , Alexander Miller Paterson
Abstract: A direct drive system for providing RF power to a component of a substrate processing system includes a direct drive circuit including a switch and configured to supply RF power to the component. A switch protection module is configured to monitor a load current and a load voltage in a processing chamber, calculate load resistance based on the load current and the load voltage, compare the load resistance to a first predetermined load resistance, and adjust at least one of an RF power limit and an RF current limit of the direct drive circuit based on the comparison.
-
-
-
-
-
-
-
-
Search Results
9
records
(took 0.016 seconds)
