摘要:
A power supply circuit for discharge machining comprising a first switching means for supplying a d-c power voltage to a discharge gap between a discharge machining electrode and a workpiece, a first energy consumption circuit having a second switching means provided on the output side of the first switching means, and a second energy consumption circuit having a third switching means provided in the vicinity of the discharge gap in parallel therewith, in which the second switching means of the first energy consumption circuit and the third switching means of the second energy consumption circuit are caused to conduct after the first switching means is turned off.
摘要:
Disclosed is an image measuring apparatus including an image capture unit which captures an image of a measurement subject, an import unit which imports the image of the measurement subject which is captured by the image capture unit, a binarization unit which binarizes the image which is imported by the import unit, a contour detection unit which recognizes graphic information in the image which is binarized by the binarization unit and detects a contour of the graphic information, a corner detection unit which detects corners of the graphic information based on the contour which is detected by the contour detection unit, a setting unit which respectively sets edge detection tools on lines of the contour including the corners detected by the corner detection unit and a measurement unit which measures the graphic information by the edge detection tools which are set by the setting unit.
摘要:
A method of fabricating a photomask used to form a lens. The method includes the steps of generating mask pattern data for each of a plurality of grid cells constituting a mask pattern for the lens, and fabricating the photomask based on the mask pattern data. The step of generating the mask pattern data includes acquiring data which represents a transmitted light distribution required for the photomask to fabricate the lens, in which the transmitted light distribution includes a quantity of transmitted light in each of the plurality of grid cells, and determining whether to place a shield on each of the plurality of grid cells by binarizing the quantity of transmitted light in each of the plurality of grid cells in order of increasing or decreasing distance from a center of the mask pattern using an error diffusion method.
摘要:
In apparatuses for automatically acquiring and also for automatically classifying images of defects present on a sample such as a semiconductor wafer, a classifying system is provided which are capable of readily accepting even such a case that a large number of classification classes are produced based upon a request issued by a user, and also even such a case that a basis of the classification class is changed in a high frequency. When the user defines the classification classes, a device for designating attributes owned by the respective classification classes is provided. The classifying system automatically changes a connecting mode between an internally-provided rule-based classifier and an example-based classifier, so that such a classifying system which is fitted to the classification basis of the user is automatically constructed.
摘要:
A method of manufacturing a microlens array includes forming a resist film on a structure including a plurality of light-receiving portions, exposing the resist film using a photomask in which a plurality of lens patterns for forming a plurality of microlenses are arranged, forming a resist pattern by developing the exposed resist film, and forming the plurality of microlens by annealing the resist pattern, wherein the plurality of lens patterns include lens patterns having exposure light transmittance distributions different from each other.
摘要:
A method for generating mask pattern data of a photomask used to form microlenses divides a pattern formation surface of a mask pattern to be used for the photomask into a plurality of grid cells, acquires data which represents transmitted light distribution of the mask pattern to be used for the photomask, determines whether to place a shield on each of the plurality of grid cells by binarizing the plurality of grid cells in order of increasing or decreasing distance from a center of the pattern formation surface using an error diffusion method to acquire the transmitted light distribution, and generates mask pattern data which represents an arrangement of the shields based on results from the determining step.
摘要:
In apparatuses for automatically acquiring and also for automatically classifying images of defects present on a sample such as a semiconductor wafer, a classifying system is provided which are capable of readily accepting even such a case that a large number of classification classes are produced based upon a request issued by a user, and also even such a case that a basis of the classification class is changed in a high frequency. When the user defines the classification classes, a device for designating attributes owned by the respective classification classes is provided. The classifying system automatically changes a connecting mode between an internally-provided rule-based classifier and an example-based classifier, so that such a classifying system which is fitted to the classification basis of the user is automatically constructed.
摘要:
A method and apparatus for reviewing defects of a semiconductor device is provided which involves detecting a defect on a SEM image taken at low magnification, and reviewing the defect on a SEM image taken at high magnification, and which can review a lot of defects in a short period of time thereby to improve the efficiency of defect review. In the present invention, the method for reviewing defects of a semiconductor device includes the steps of obtaining an image including a defect on the semiconductor device detected by a detection device by use of a scanning electron microscope at a first magnification, making a reference image from the image including the defect obtained at the first magnification, detecting the defect by comparing the image including the defect obtained at the first magnification to the reference image made from the image including the defect at the first magnification, and taking an image of the detected defect at a second magnification that is larger than the first magnification.
摘要:
An information recording apparatus is provided with: a reserving device for specifying a channel, a recording start time point, and a recording end time point of a regular broadcast program which is regularly broadcasted (i.e. every week, every day, every month, or the like), to thereby reserve the regular broadcast program; an obtaining device for obtaining Electronic Program Guide (EPG) information which is distributed along with or aside from the regular broadcast program and which includes airtime zone information for indicating a channel, a broadcast start time point, and a broadcast end time point; a recording device capable of recording the regular broadcast program; and a controlling device for (i) controlling the recording device to record the regular broadcast program from the recording start time point, (ii) searching for the broadcast end time point of the regular broadcast program, from the EPG information, while the regular broadcast program is recorded, and (iii) controlling the recording device to record the regular broadcast program until the searched broadcast end time point