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31.再颁专利公开(公告)号：USRE42566E1
公开(公告)日：2011-07-26
申请号：US10439658
申请日：2003-05-15
申请人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takashi Imaoka , Masayuki Toda
发明人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takashi Imaoka , Masayuki Toda
IPC分类号： B08B3/12
CPC分类号： H01L21/6708 , B08B3/022 , B08B3/041 , B08B3/123 , B08B2203/0288 , H01L21/67051
摘要： The wet treatment liquid feed nozzle of the invention comprises an introducing path 10 having an introducing port 7, a discharging path 12 having a discharging port 15, a crossing section 14 formed by causing the introducing path 10 and the discharging path 12 to cross at the other ends thereof, a nozzle assembly 50 having an opening section 6 opening to an object to be treated 1, provided at the crossing section 14, and pressure control means 13, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated 1 and the atmospheric pressure provided at least on the discharging path 12 side so that the wet treatment liquid having been in contact with the object to be treated 1 via the opening section 6 does not flow to outside the discharging path 12.
摘要翻译： 本发明的湿处理液体供给喷嘴包括具有引入口7的引入路径10，具有排出口15的排出路径12，通过使引入路径10和排出路径12在 设置在交叉部分14处的具有开口部分6的开口部分6的喷嘴组件50，以及压力控制装置13，用于控制接触到的湿处理液体的压力之间的差异 待处理物体1和至少设置在排出路径12侧的大气压力，使得经由开口部6与待处理物体1接触的湿处理液体不流到排出路径12的外部 。
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公开(公告)号：US5783790A
公开(公告)日：1998-07-21
申请号：US759013
申请日：1996-12-02
IPC分类号： G02F1/1333 , B08B3/04 , B08B3/12 , C02F1/461 , H01L21/304 , C07C1/00 , B08B6/00
CPC分类号： B08B3/12 , C02F1/4618
摘要： A surfactant is added to anodic or cathodic water obtained by electrolyzing deionized water or high-purity water. Then, an object of treatment is treated with the anodic or cathodic water containing the surfactant. The object of treatment may be treated, in this way, while irradiating it with an ultrasonic wave having a frequency between 30 kHz and 3 MHz. Furthermore, the anodic or cathodic water is continuously jetted or dropped onto the object of treatment from a nozzle, while irradiating an ultrasonic wave at least at a part in the feed pipe of the anodic or cathodic water.
摘要翻译： 将表面活性剂加入通过电解去离子水或高纯度水而获得的阳极或阴极水中。 然后，用含有表面活性剂的阳极或阴极水处理处理对象。 以这种方式，可以用频率在30kHz和3MHz之间的超声波照射处理对象。 此外，阳极或阴极水在从阳极或阴极水的供给管中至少部分照射超声波的同时，从喷嘴连续喷射或滴落到处理对象物上。
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公开(公告)号：US06509305B1
公开(公告)日：2003-01-21
申请号：US09570575
申请日：2000-05-12
IPC分类号： C11D1100
CPC分类号： B01F3/04985
摘要： Deionized water from a deionized water source (21) for electrolysis is supplied by a pressurizing pump (20) to an electrolyzer (2) to obtain a hydrogen gas and ozone gas by means of electrolysis. The pressures of these gasses are maintained at not less than the atmospheric pressure. These gasses at a pressure of the atmospheric pressure or more are dissolved in high-purity water in gas dissolving units (6,7) to obtain ozone water and hydrogen water respectively. These ozone water and hydrogen water are introduced into mixer (8,9) to adjust pH respectively. In this way, highly-concentrated, gas dissolved cleaning solution is prepared in a short period of time.
摘要翻译： 来自用于电解的去离子水源（21）的去离子水通过加压泵（20）供给电解槽（2），通过电解获得氢气和臭氧气体。 这些气体的压力保持在不低于大气压力。 在大气压或更高的压力下将这些气体溶解在气体溶解单元（6,7）中的高纯度水中，分别得到臭氧水和氢气水。 将这些臭氧水和氢水引入混合器（8,9）中以分别调节pH。 以这种方式，在短时间内制备高浓度，气体溶解的清洁溶液。
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34.发明授权公开(公告)号：US06274040B1
公开(公告)日：2001-08-14
申请号：US08811800
申请日：1997-03-06
申请人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Nakano , Akira Abe , Tadahiro Ohmi
发明人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Nakano , Akira Abe , Tadahiro Ohmi
IPC分类号： C02F148
CPC分类号： C02F1/48 , C02F2103/04 , Y10S210/90
摘要： There are provided a method and an apparatus for removing electrostatic charges from high resistivity liquid. An insulating film is formed on the surface of a conductive element which is in contact with the high resistivity liquid wherein the insulating film has such a thickness that a tunneling current may flow through the insulating film, thereby preventing the highly purified high resistivity liquid from being contaminated, as well as from becoming acid. Thus, objects to be treated with the high resistivity liquid become free of electrostatic charges without any contamination.
摘要翻译： 提供了一种从高电阻率液体中去除静电电荷的方法和装置。 在与高电阻率液体接触的导电元件的表面上形成绝缘膜，其中绝缘膜具有使隧道电流可以流过绝缘膜的厚度，从而防止高度纯化的高电阻率液体 污染，以及变酸。 因此，用高电阻率液体处理的物体没有静电电荷而没有任何污染。
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35.再颁专利公开(公告)号：USRE42420E1
公开(公告)日：2011-06-07
申请号：US11043890
申请日：2005-01-26
申请人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takashi Imaoka , Masayuki Toda
发明人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takashi Imaoka , Masayuki Toda
CPC分类号： H01L21/6708 , B08B3/022 , B08B3/041 , B08B3/123 , B08B2203/0288 , H01L21/67051
摘要： The wet treatment liquid feed nozzle of the invention comprises an introducing path having an introducing port, a discharging path having a discharging port, a crossing section formed by causing the introducing path and the discharging path to cross at the other ends thereof, a nozzle assembly having an opening section opening to an object to be treated, provided at the crossing section, and pressure control means, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated and the atmospheric pressure provided at least on the discharging path side so that the wet treatment liquid having been in contact with the object to be treated via the opening section does not flow to outside the discharging path.
摘要翻译： 本发明的湿式处理液体进料喷嘴包括一个具有一个引入口的引入通道，一个具有排出口的排出通道，一个通过使引入通道和排放通道在其另一端处交叉而形成的交叉部分，一个喷嘴组件 具有开口部分，设置在交叉部分处的待处理对象;以及压力控制装置，用于控制与待处理物体接触的湿处理液体的压力与至少提供的大气压力之间的差异 在放电路径侧，使得经由开口部分与待处理物体接触的湿处理液体不会流到排出路径的外部。
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公开(公告)号：US06270618B1
公开(公告)日：2001-08-07
申请号：US09205800
申请日：1998-12-04
申请人： Akira Nakano , Sung Chul Kim , Koichi Fukuda , Yasuhiko Kasama , Tadahiro Ohmi , Shoichi Ono
发明人： Akira Nakano , Sung Chul Kim , Koichi Fukuda , Yasuhiko Kasama , Tadahiro Ohmi , Shoichi Ono
IPC分类号： C23F102
CPC分类号： H01J37/32174 , C23C16/4405 , H01J37/32082
摘要： A plasma processing apparatus is provided which does not require replacement of a band eliminator according to a frequency used, which is capable of performing chamber cleaning without replacing a resonance circuit, and which is capable of performing plasma cleaning of the inside of the chamber without using a bellows. The plasma processing apparatus includes a resonance circuit (band eliminator) for causing series resonance with a microwave circuit formed of at least a susceptor electrode and a processing chamber in order to trap plasma between a plasma excitation electrode and the susceptor electrode when the surface of a workpiece placed on the susceptor electrode is processed by plasma generated between the plasma excitation electrode and the susceptor electrode, which are provided inside the processing chamber; and for causing parallel resonance with the microwave circuit in order to diffuse plasma inside the processing chamber when performing plasma cleaning.
摘要翻译： 提供一种等离子体处理装置，其不需要根据所使用的频率来更换带除器，其能够执行腔室清洁而不更换谐振电路，并且能够在不使用腔室内进行等离子体清洁室内 一个波纹管。 等离子体处理装置包括用于与由至少一个基座电极和一个处理室形成的微波电路进行串联谐振的谐振电路（去波器），以便在等离子体激发电极和基座电极之间捕获等离子体时 放置在基座电极上的工件通过设置在处理室内部的等离子体激发电极和基座电极之间产生的等离子体进行处理; 并且用于与微波电路并联谐振，以便在进行等离子体清洗时在等离子体清洗中扩散处理室内的等离子体。
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公开(公告)号：US06155202A
公开(公告)日：2000-12-05
申请号：US199944
申请日：1998-11-25
申请人： Akira Nakano , Sung Chul Kim , Koichi Fukuda , Yasuhiro Takeda , Yasuhiko Kasama , Tadahiro Ohmi , Shoichi Ono
发明人： Akira Nakano , Sung Chul Kim , Koichi Fukuda , Yasuhiro Takeda , Yasuhiko Kasama , Tadahiro Ohmi , Shoichi Ono
CPC分类号： H01J37/32082 , H01J37/32183
摘要： In a plasma processing apparatus, in a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode, one of the two electrodes which form a tuning capacitor also serves as the plasma excitation electrode. Alternatively, in a plasma processing apparatus, the side wall of a housing made from an electrically conductive member and accommodating a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode and a feeder for supplying high-frequency electric power from the high-frequency power source to the plasma excitation electrode through the matching circuit is formed not in parallel to the feeder.
摘要翻译： 在等离子体处理装置中，在高频电源和等离子体激励电极之间插入用于实现高频电源和等离子体激励电极之间的阻抗匹配的匹配电路中，形成调谐电容器的两个电极之一 也用作等离子体激发电极。 或者，在等离子体处理装置中，由导电构件制成的壳体的侧壁，并且容纳插入在高频电源和等离子体激励电极之间的匹配电路，以实现高频电源与高频电源之间的阻抗匹配 等离子体激励电极和用于通过匹配电路从高频电源向等离子体激励电极提供高频电力的馈线形成为不与馈线并联。
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38.发明授权Apparatus and method for producing ionic water and system and method for producing electrolytic ionic water 失效用于生产离子水的设备和方法及其制备方法和电解离子水的制备方法
公开(公告)号：US5888357A
公开(公告)日：1999-03-30
申请号：US756741
申请日：1996-11-26
CPC分类号： C02F1/36 , C02F1/4618 , C02F2201/46115 , C02F2201/4619
摘要： The present invention provides an apparatus and a method for producing ionic water which are capable of producing ionic water containing a low concentration of electrolyte with high reproducibility. The present invention also provides an apparatus and a method for producing electrolytic ionic water capable of producing electrolytic ionic water having stable characteristics. The ionic water producing apparatus has at least a gas-liquid mixing device for mixing raw water and a gas, and an ultrasonic exciting device for applying ultrasonic waves to the gas-liquid mixture obtained by the gas-liquid mixing device to generate ions.
摘要翻译： 本发明提供了能够以高再现性产生含有低浓度电解质的离子水的离子水的制造装置和方法。 本发明还提供一种能够生产具有稳定特性的电解离子水的电解离子水的设备和方法。 离子水生成装置至少具有用于混合原料水和气体的气液混合装置，以及用于对由气液混合装置获得的气液混合物施加超声波以产生离子的超声波激发装置。
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39.发明授权公开(公告)号：US06517635B2
公开(公告)日：2003-02-11
申请号：US09803588
申请日：2001-03-09
申请人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takayuki Imaoka , Masayuki Toda
发明人： Kenichi Mitsumori , Yasuhiko Kasama , Akira Abe , Oh Eui Yeol , Tadahiro Ohmi , Takayuki Imaoka , Masayuki Toda
IPC分类号： B08B304
CPC分类号： H01L21/6708 , B08B3/022 , B08B3/041 , B08B3/123 , B08B2203/0288 , H01L21/67051
摘要： The wet treatment liquid feed nozzle of the invention comprises an introducing path having an introducing port, a discharging path having a discharging port, a crossing section formed by causing the introducing path and the discharging path to cross at the other ends thereof, a nozzle assembly having an opening section opening to an object to be treated, provided at the crossing section, and pressure control means, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated and the atmospheric pressure provided at least on the discharging path side so that the wet treatment liquid having been in contact with the object to be treated via the opening section does not flow to outside the discharging path.
摘要翻译： 本发明的湿式处理液体进料喷嘴包括一个具有一个引入口的引入通道，一个具有排出口的排出通道，一个通过使引入通道和排放通道在其另一端处交叉而形成的交叉部分，一个喷嘴组件 具有开口部分，设置在交叉部分处的待处理对象;以及压力控制装置，用于控制与待处理物体接触的湿处理液体的压力与至少提供的大气压力之间的差异 在放电路径侧，使得经由开口部分与待处理物体接触的湿处理液体不会流到排出路径的外部。
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公开(公告)号：US06349670B1
公开(公告)日：2002-02-26
申请号：US09442539
申请日：1999-11-18
申请人： Akira Nakano , Koichi Fukuda , Sung Chul Kim , Yasuhiko Kasama , Tadahiro Ohmi , Shoichi Ono
发明人： Akira Nakano , Koichi Fukuda , Sung Chul Kim , Yasuhiko Kasama , Tadahiro Ohmi , Shoichi Ono
IPC分类号： C23C1600
CPC分类号： H01J37/32082 , G01R1/06772 , G01R27/02 , H01J37/32935
摘要： The invention provides a plasma equipment which is advantageous in that the suscepter impedance is small, the dependence on the frequency is low, the power consumption efficiency is high, the film forming speed is faster as compared with conventional plasma equipment, and the film quality is high. Metal plates AC short between a chamber wall and a shield of an electrode of the same DC potential as the chamber.
摘要翻译： 本发明提供一种等离子体设备，其优点在于，与常规等离子体设备相比，阻抗较小，对频率的依赖性低，功耗效率高，成膜速度更快，膜质量 高。 金属板在室壁与与室相同的DC电位的电极的屏蔽之间交流短路。
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