Plasma processing apparatus, matching box, and feeder
    1.
    发明授权
    Plasma processing apparatus, matching box, and feeder 失效
    等离子体处理装置,配套箱和进料器

    公开(公告)号:US06155202A

    公开(公告)日:2000-12-05

    申请号:US199944

    申请日:1998-11-25

    CPC分类号: H01J37/32082 H01J37/32183

    摘要: In a plasma processing apparatus, in a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode, one of the two electrodes which form a tuning capacitor also serves as the plasma excitation electrode. Alternatively, in a plasma processing apparatus, the side wall of a housing made from an electrically conductive member and accommodating a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode and a feeder for supplying high-frequency electric power from the high-frequency power source to the plasma excitation electrode through the matching circuit is formed not in parallel to the feeder.

    摘要翻译: 在等离子体处理装置中,在高频电源和等离子体激励电极之间插入用于实现高频电源和等离子体激励电极之间的阻抗匹配的匹配电路中,形成调谐电容器的两个电极之一 也用作等离子体激发电极。 或者,在等离子体处理装置中,由导电构件制成的壳体的侧壁,并且容纳插入在高频电源和等离子体激励电极之间的匹配电路,以实现高频电源与高频电源之间的阻抗匹配 等离子体激励电极和用于通过匹配电路从高频电源向等离子体激励电极提供高频电力的馈线形成为不与馈线并联。

    Plasma processing apparatus
    2.
    发明授权
    Plasma processing apparatus 失效
    等离子体处理装置

    公开(公告)号:US06270618B1

    公开(公告)日:2001-08-07

    申请号:US09205800

    申请日:1998-12-04

    IPC分类号: C23F102

    摘要: A plasma processing apparatus is provided which does not require replacement of a band eliminator according to a frequency used, which is capable of performing chamber cleaning without replacing a resonance circuit, and which is capable of performing plasma cleaning of the inside of the chamber without using a bellows. The plasma processing apparatus includes a resonance circuit (band eliminator) for causing series resonance with a microwave circuit formed of at least a susceptor electrode and a processing chamber in order to trap plasma between a plasma excitation electrode and the susceptor electrode when the surface of a workpiece placed on the susceptor electrode is processed by plasma generated between the plasma excitation electrode and the susceptor electrode, which are provided inside the processing chamber; and for causing parallel resonance with the microwave circuit in order to diffuse plasma inside the processing chamber when performing plasma cleaning.

    摘要翻译: 提供一种等离子体处理装置,其不需要根据所使用的频率来更换带除器,其能够执行腔室清洁而不更换谐振电路,并且能够在不使用腔室内进行等离子体清洁室内 一个波纹管。 等离子体处理装置包括用于与由至少一个基座电极和一个处理室形成的微波电路进行串联谐振的谐振电路(去波器),以便在等离子体激发电极和基座电极之间捕获等离子体时 放置在基座电极上的工件通过设置在处理室内部的等离子体激发电极和基座电极之间产生的等离子体进行处理; 并且用于与微波电路并联谐振,以便在进行等离子体清洗时在等离子体清洗中扩散处理室内的等离子体。

    Electronic element and method of producing same
    5.
    发明授权
    Electronic element and method of producing same 失效
    电子元件及其制造方法

    公开(公告)号:US5623161A

    公开(公告)日:1997-04-22

    申请号:US442906

    申请日:1995-05-17

    摘要: An electronic element having a sufficient dielectric strength remarkably superior to any of the conventional ones. In this element, a conductive wire pattern is formed on the surface of a substrate which is insulative at least in its surface, and an insulating layer is so formed as to cover the substrate and the wire pattern either partially or entirely. The insulating layer is composed of a silicon nitride film where the oxygen content is less than 10 atomic percent at least in the vicinity of a step portion of the wire pattern. There is also provided a method of producing such electronic element, wherein the insulating layer is formed by plasma enhanced CVD under the conditions that the following relationship among a film forming temperature T (.degree. C.), an ion flux I (A) and a film forming speed v (nm/min): T.gtoreq.-651 (I/v)+390, 150.ltoreq.T.ltoreq.350 (where the ion flux denotes the current (A) per 60.times.60 cm.sup.2). According to this method, an insulating film of a high withstand voltage with a great dielectric strength can be obtained stably at a high yield rate.

    摘要翻译: 具有显着优于常规电介质的电介质强度的电子元件。 在该元件中,在至少在其表面上绝缘的基板的表面上形成导线图案,并且形成绝缘层以部分或全部覆盖基板和线图案。 绝缘层由至少在导线图案的台阶附近的氧含量小于10原子%的氮化硅膜构成。 还提供了一种制造这种电子元件的方法,其中通过等离子体增强CVD形成绝缘层,条件是成膜温度T(℃),离子通量I(A)和 成膜速度v(nm / min):T> / = - 651(I / V)+390,150

    Apparatus for removing electrostatic charge from high resistivity liquid
    7.
    发明授权
    Apparatus for removing electrostatic charge from high resistivity liquid 失效
    用于从高电阻率液体中去除静电荷的装置

    公开(公告)号:US06274040B1

    公开(公告)日:2001-08-14

    申请号:US08811800

    申请日:1997-03-06

    IPC分类号: C02F148

    摘要: There are provided a method and an apparatus for removing electrostatic charges from high resistivity liquid. An insulating film is formed on the surface of a conductive element which is in contact with the high resistivity liquid wherein the insulating film has such a thickness that a tunneling current may flow through the insulating film, thereby preventing the highly purified high resistivity liquid from being contaminated, as well as from becoming acid. Thus, objects to be treated with the high resistivity liquid become free of electrostatic charges without any contamination.

    摘要翻译: 提供了一种从高电阻率液体中去除静电电荷的方法和装置。 在与高电阻率液体接触的导电元件的表面上形成绝缘膜,其中绝缘膜具有使隧道电流可以流过绝缘膜的厚度,从而防止高度纯化的高电阻率液体 污染,以及变酸。 因此,用高电阻率液体处理的物体没有静电电荷而没有任何污染。

    Method for removing electrostatic charge from high resistivity liquid
    8.
    发明授权
    Method for removing electrostatic charge from high resistivity liquid 失效
    从高电阻率液体中去除静电荷的方法

    公开(公告)号:US5480563A

    公开(公告)日:1996-01-02

    申请号:US219154

    申请日:1994-03-29

    IPC分类号: H05F3/00 C02F1/48 H05F3/02

    摘要: There are provided a method and an apparatus for removing electrostatic charges from high resistivity liquid. An insulating film is formed on the surface of a conductive element which is in contact with the high resistivity liquid wherein the insulating film has such a thickness that a tunneling current may flow through the insulating film, thereby preventing the highly purified high resistivity liquid from being contaminated, as well as from becoming acid. Thus, objects to be treated with the high resistivity liquid become free of electrostatic charges without any contamination.

    摘要翻译: 提供了一种从高电阻率液体中去除静电电荷的方法和装置。 在与高电阻率液体接触的导电元件的表面上形成绝缘膜,其中绝缘膜具有使隧道电流可以流过绝缘膜的厚度,从而防止高度纯化的高电阻率液体 污染,以及变酸。 因此,用高电阻率液体处理的物体没有静电电荷而没有任何污染。

    Method of removing photoresist film
    9.
    发明授权
    Method of removing photoresist film 失效
    去除光刻胶膜的方法

    公开(公告)号:US5681487A

    公开(公告)日:1997-10-28

    申请号:US499538

    申请日:1995-07-07

    IPC分类号: G03F7/42 H01L21/027 G03C11/00

    CPC分类号: G03F7/42

    摘要: The present invention provides a method of removing a photoresist film, which exhibits the high ability to remove photoresist and excellent safety and handling properties such as workability, In the removing method, the photoresist film is removed by chemical decomposition in an inorganic aqueous solution under ultraviolet-light irradiation. The inorganic aqueous solution is an aqueous solution of peroxomonosulfate or an aqueous solution containing 4.5 to 36 wt % of sulfuric acid and 0.05 to 0.8 wt % of hydrogen peroxide.

    摘要翻译: 本发明提供一种去除光致抗蚀剂膜的方法,其具有高的去除光致抗蚀剂的能力和优异的安全性和操作性能如可加工性。在去除方法中,通过在紫外线下的无机水溶液中通过化学分解除去光致抗蚀剂膜 光线照射。 无机水溶液是含硫酸盐的水溶液或含有4.5〜36重量%的硫酸和0.05〜0.8重量%的过氧化氢的水溶液。

    Liquid feed nozzle, wet treatment, apparatus and wet treatment method
    10.
    再颁专利
    Liquid feed nozzle, wet treatment, apparatus and wet treatment method 失效
    液体进料喷嘴,湿式处理,设备和湿法处理方法

    公开(公告)号:USRE42566E1

    公开(公告)日:2011-07-26

    申请号:US10439658

    申请日:2003-05-15

    IPC分类号: B08B3/12

    摘要: The wet treatment liquid feed nozzle of the invention comprises an introducing path 10 having an introducing port 7, a discharging path 12 having a discharging port 15, a crossing section 14 formed by causing the introducing path 10 and the discharging path 12 to cross at the other ends thereof, a nozzle assembly 50 having an opening section 6 opening to an object to be treated 1, provided at the crossing section 14, and pressure control means 13, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated 1 and the atmospheric pressure provided at least on the discharging path 12 side so that the wet treatment liquid having been in contact with the object to be treated 1 via the opening section 6 does not flow to outside the discharging path 12.

    摘要翻译: 本发明的湿处理液体供给喷嘴包括具有引入口7的引入路径10,具有排出口15的排出路径12,通过使引入路径10和排出路径12在 设置在交叉部分14处的具有开口部分6的开口部分6的喷嘴组件50,以及压力控制装置13,用于控制接触到的湿处理液体的压力之间的差异 待处理物体1和至少设置在排出路径12侧的大气压力,使得经由开口部6与待处理物体1接触的湿处理液体不流到排出路径12的外部 。