Method to form a pattern of functional material on a substrate using a mask material
    37.
    发明授权
    Method to form a pattern of functional material on a substrate using a mask material 失效
    使用掩模材料在基板上形成功能材料图案的方法

    公开(公告)号:US07875313B2

    公开(公告)日:2011-01-25

    申请号:US11784067

    申请日:2007-04-05

    IPC分类号: B05D1/32

    摘要: The invention provides a method to form a pattern of functional material on a substrate for use in electronic devices and components. The method uses a stamp having a relief structure to transfer a mask material to a substrate and form a pattern of open area on the substrate. The functional material is applied to the substrate in at least the open area. Contact of an adhesive material to an exterior surface opposite the substrate and separation of the adhesive from the substrate forms the pattern of functional material on the substrate. The method is suitable for the fabrication of microcircuitry for electronic devices and components.

    摘要翻译: 本发明提供一种在基板上形成用于电子设备和部件的功能材料图案的方法。 该方法使用具有浮雕结构的印模将掩模材料转印到基底上并在基底上形成开放区域的图案。 功能性材料至少在开放区域中施加到基底上。 粘合剂材料与基材相对的外表面的接触和粘合剂与基材的分离在基材上形成功能材料的图案。 该方法适用于电子设备和组件的微电路制造。

    Method to form a pattern of functional material on a substrate
    38.
    发明申请
    Method to form a pattern of functional material on a substrate 审中-公开
    在基板上形成功能材料图案的方法

    公开(公告)号:US20080047930A1

    公开(公告)日:2008-02-28

    申请号:US11508806

    申请日:2006-08-23

    IPC分类号: C23F1/00 B29D11/00

    摘要: The invention provides a method to form a pattern of a functional material on a substrate for use in electronic devices and components. The method uses a stamp having a relief structure to transfer a mask material to a substrate and form a pattern of open area on the substrate. The functional material is applied to the substrate in at least the open area. The mask material is removed from the substrate, forming the pattern of functional material on the substrate. The method is suitable for the fabrication of microcircuitry for electronic devices and components.

    摘要翻译: 本发明提供一种在基板上形成用于电子设备和部件的功能材料图案的方法。 该方法使用具有浮雕结构的印模将掩模材料转印到基底上并在基底上形成开放区域的图案。 功能性材料至少在开放区域中施加到基底上。 掩模材料从衬底上移除,在衬底上形成功能材料的图形。 该方法适用于电子设备和组件的微电路制造。