公开(公告)号：US09757895B2

公开(公告)日：2017-09-12

申请号：US14633272

申请日：2015-02-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghoon Lee ,  Dongouk Kim ,  Joonyong Park ,  Jihyun Bae ,  Bongsu Shin ,  Hongseok Lee ,  Jaeseung Chung ,  Sukgyu Hahm

IPC: B29C59/02 ,  G02B5/30 ,  G03F7/00 ,  G02B1/12 ,  B29K25/00 ,  B29K33/00

CPC classification number: B29C59/026 ,  B29K2025/06 ,  B29K2033/12 ,  G02B1/12 ,  G02B5/3058 ,  G02B5/3066 ,  G02B2207/101 ,  G03F7/0002 ,  Y10T428/2457

Abstract: A patterning method using an imprint mold, to form an imprinted pattern structure, includes providing a resist layer from which the pattern structure will be formed, performing a first imprint process on a first area of the resist layer by using the imprint mold to form a first pattern of the pattern structure through deformation of the resist layer in the first area, and performing a second imprint process on a second area of the resist layer by using the imprint mold to form a second pattern of the pattern structure through deformation of the resist layer in the second area. The first and second areas are overlapped with each other in a third area of the resist layer, and the performing the second imprint process deforms a first portion of the first pattern in the third area to form the second pattern.

公开(公告)号：US20160062132A1

公开(公告)日：2016-03-03

申请号：US14838507

申请日：2015-08-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Joonyong Park ,  Dongouk Kim ,  Jihyun Bae ,  Bongsu Shin ,  Jong G. Ok ,  Ilsun Yoon ,  Sunghoon Lee ,  Jaeseung Chung ,  Sukgyu Hahm

IPC: G02B27/62 ,  G02F1/1335 ,  G02B5/30 ,  B29C65/48 ,  B29C65/00

CPC classification number: G02B27/62 ,  G02B5/3058 ,  G02F1/13336 ,  G02F2001/133548

Abstract: A master wafer includes: a plurality of unit wafers each including a pattern disposed thereon; a coupling surface defined on each of the unit wafers; and a coupling part which couples adjacent unit wafers among the plurality of unit wafers on which the coupling surface is defined, to each other.

Abstract translation: 主晶片包括：多个单元晶片，每个单元晶片包括设置在其上的图案; 限定在每个单元晶片上的耦合表面; 以及耦合部件，其将限定有耦合表面的多个单元晶片中的相邻单元晶片彼此连接。

公开(公告)号：US20160023399A1

公开(公告)日：2016-01-28

申请号：US14724898

申请日：2015-05-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghoon Lee ,  Dongouk Kim ,  Joonyong Park ,  Jihyun Bae ,  Bongsu Shin ,  Jaeseung Chung ,  Sukgyu Hahm ,  Jong G. Ok ,  Ilsun Yoon

IPC: B29C59/16

CPC classification number: B29C59/16 ,  B29C59/165 ,  B29C67/00 ,  B29C2045/0075 ,  G03F7/0002

Abstract: A method of forming a pattern by using an imprint process includes: forming an adhesion promoting layer only in a pattern formation region on a substrate; coating a resin to cover the substrate and the adhesion promoting layer; transferring a pattern of a stamp mold to the resin covering the substrate and the adhesion promoting layer, by pressing the stamp mold onto the resin; irradiating ultraviolet light onto the resin covering the substrate and the adhesion promoting layer, to cure the resin and form a pattern of the cured resin to correspond to the pattern of the stamp mold, on the substrate; and detaching the stamp mold from the substrate, to leave a portion of the cured resin pattern only on the adhesion promoting layer on the substrate and to remove a remaining portion of the cured resin pattern from the substrate.

Abstract translation: 通过使用压印工艺形成图案的方法包括：仅在基板上的图案形成区域中形成粘附促进层; 涂覆树脂以覆盖基材和粘合促进层; 通过将印模模压到树脂上，将印模的图案转印到覆盖基材和粘合促进层的树脂上; 在覆盖基材和粘合促进层的树脂上照射紫外光，固化树脂并在基材上形成对应于印模的图案的固化树脂的图案; 并将印模从基板上分离出来，将一部分固化的树脂图案仅留在基板上的粘合促进层上，并从基板上除去固化的树脂图案的剩余部分。

公开(公告)号：US10539734B2

公开(公告)日：2020-01-21

申请号：US15418119

申请日：2017-01-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dongsik Shim ,  Dongouk Kim ,  Hyunjoon Kim ,  Joonyong Park ,  Jihyun Bae ,  Bongsu Shin ,  Sunghoon Lee ,  Jaeseung Chung

IPC: F21V8/00

Abstract: A directional backlight unit is provided, including a light guide plate, a light source, and a grating that is formed on a light-emitting surface of the light guide plate. The grating is configured such that an intensity of one ray of light, of the light irradiated by the light source and diffracted and emitted by the grating, is greater than a sum of intensities of all other rays of light, of the light irradiated by the light source and diffracted and emitted by the grating.

公开(公告)号：US10317693B2

公开(公告)日：2019-06-11

申请号：US15434364

申请日：2017-02-16

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sunghoon Lee ,  Joonyong Park ,  Bongsu Shin ,  Dongouk Kim ,  Jihyun Bae ,  Dongsik Shim ,  Jaeseung Chung

IPC: G02B27/26 ,  G02B5/18 ,  G02B5/30 ,  F21V8/00 ,  G02F1/1335 ,  G02B27/22 ,  H04N13/31

Abstract: A directional backlight unit includes: a light source configured to emit light; a light guide plate including: an incident surface on which light emitted by the light source is incident, an emission surface from which the light incident on the incident surface is emitted, and a reflective surface facing the emission surface; a reflective polarizer provided on the emission surface and configured to transmit a portion of the light as first polarized light having a first polarization direction and reflect another portion of the light as second polarized light having a second polarization direction and being perpendicular to the first polarized light; and a diffractor configured to diffract the first polarized light transmitted through the reflective polarizer toward a plurality of viewing zones.

公开(公告)号：US10228506B2

公开(公告)日：2019-03-12

申请号：US15171523

申请日：2016-06-02

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jaeseung Chung ,  Sunghoon Lee ,  Jihyun Bae ,  Joonyong Park ,  Hoon Song ,  Hongseok Lee ,  Dongouk Kim ,  Hyunjoon Kim ,  Bongsu Shin ,  Dongsik Shim ,  Seogwoo Hong

IPC: F21V8/00 ,  G02B5/18 ,  G02B27/22

Abstract: A directional backlight and a 3D image display apparatus including the directional backlight are provided. The directional backlight includes a light guide plate guiding light emitted from a light source; a diffractive device configured to adjust the direction of light exiting the light guide plate; and an aperture adjusting layer including a plurality of apertures. The aperture adjusting layer may adjust the optical output efficiency of the diffractive device.

公开(公告)号：US10180530B2

公开(公告)日：2019-01-15

申请号：US15236604

申请日：2016-08-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Bongsu Shin ,  Joonyong Park ,  Hyunjoon Kim ,  Dongouk Kim ,  Jihyun Bae ,  Dongsik Shim ,  Sunghoon Lee ,  Jaeseung Chung ,  Seogwoo Hong

IPC: G02B27/22 ,  F21V8/00 ,  G02F1/1335

Abstract: A directional backlight unit and a three-dimensional image display apparatus including the directional backlight unit are provided. The directional backlight unit includes a light source, a light guide plate guiding light emitted from the light source, and a diffraction device including a plurality of sections. Each of the sections includes a grating pattern set configured to adjust the direction of light incident from the light guide plate.

公开(公告)号：US20180081190A1

公开(公告)日：2018-03-22

申请号：US15434364

申请日：2017-02-16

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sunghoon Lee ,  Joonyong Park ,  Bongsu Shin ,  Dongouk Kim ,  Jihyun Bae ,  Dongsik Shim ,  Jaeseung Chung

IPC: G02B27/26 ,  F21V8/00 ,  G02F1/1335

CPC classification number: G02B27/26 ,  G02B5/1819 ,  G02B5/1842 ,  G02B5/3058 ,  G02B6/005 ,  G02B6/0056 ,  G02B6/0065 ,  G02B27/225 ,  G02F1/133528 ,  G02F1/133615 ,  G02F2001/133548 ,  H04N13/31 ,  H04N2213/001

Abstract: A directional backlight unit includes: a light source configured to emit light; a light guide plate including: an incident surface on which light emitted by the light source is incident, an emission surface from which the light incident on the incident surface is emitted, and a reflective surface facing the emission surface; a reflective polarizer provided on the emission surface and configured to transmit a portion of the light as first polarized light having a first polarization direction and reflect another portion of the light as second polarized light having a second polarization direction and being perpendicular to the first polarized light; and a diffractor configured to diffract the first polarized light transmitted through the reflective polarizer toward a plurality of viewing zones.

公开(公告)号：US09855703B2

公开(公告)日：2018-01-02

申请号：US14724898

申请日：2015-05-29

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghoon Lee ,  Dongouk Kim ,  Joonyong Park ,  Jihyun Bae ,  Bongsu Shin ,  Jaeseung Chung ,  Sukgyu Hahm ,  Jong G. Ok ,  Ilsun Yoon

IPC: B29C59/16 ,  B29C67/00 ,  G03F7/00 ,  B29C45/00

CPC classification number: B29C59/16 ,  B29C59/165 ,  B29C67/00 ,  B29C2045/0075 ,  G03F7/0002

Abstract: A method of forming a pattern by using an imprint process includes: forming an adhesion promoting layer only in a pattern formation region on a substrate; coating a resin to cover the substrate and the adhesion promoting layer; transferring a pattern of a stamp mold to the resin covering the substrate and the adhesion promoting layer, by pressing the stamp mold onto the resin; irradiating ultraviolet light onto the resin covering the substrate and the adhesion promoting layer, to cure the resin and form a pattern of the cured resin to correspond to the pattern of the stamp mold, on the substrate; and detaching the stamp mold from the substrate, to leave a portion of the cured resin pattern only on the adhesion promoting layer on the substrate and to remove a remaining portion of the cured resin pattern from the substrate.

公开(公告)号：US09658484B2

公开(公告)日：2017-05-23

申请号：US14817496

申请日：2015-08-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghoon Lee ,  Dongouk Kim ,  Joonyong Park ,  Jihyun Bae ,  Bongsu Shin ,  Jong G. Ok ,  Ilsun Yoon ,  Jaeseung Chung ,  Sukgyu Hahm

IPC: G02F1/1335 ,  G02B5/30 ,  G03F7/00 ,  G02F1/1333

CPC classification number: G02F1/133528 ,  G02B5/3058 ,  G02F1/13336 ,  G02F2001/133548 ,  G03F7/0002

Abstract: A pattern structure includes a plurality of pattern structure units arranged on a same plane, where each of the plurality of pattern structure units includes a plurality of microstructures defined on a surface thereof and having a width of less than about 1 micrometer (μm); and a connection layer disposed between the plurality of pattern structure units and having a width of less than about 10 μm, where the connection layer connects the plurality of pattern structure units to each other.