MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20220077235A1

    公开(公告)日:2022-03-10

    申请号:US17317154

    申请日:2021-05-11

    Abstract: A memory device may include an insulating structure including a first surface and a protrusion portion protruding from the first surface in a first direction, a recording material layer on the insulating structure and extending along a protruding surface of the protrusion portion to cover the protrusion portion and extending onto the first surface of the insulating structure, a channel layer on the recording material layer and extending along a surface of the recording material layer, a gate insulating layer on the channel layer; and a gate electrode formed on the gate insulating layer at a location facing a second surface of the insulating structure. The second surface of the insulating structure may be a protruding upper surface of the protrusion portion.

    VERTICAL NONVOLATILE MEMORY DEVICE INCLUDING MEMORY CELL STRING

    公开(公告)号:US20220020818A1

    公开(公告)日:2022-01-20

    申请号:US17345423

    申请日:2021-06-11

    Abstract: A vertical nonvolatile memory device including memory cell strings using a resistance change material is provided. Each of the memory cell strings of the nonvolatile memory device includes a semiconductor layer extending in a first direction; a plurality of gates and a plurality of insulators alternately arranged in the first direction; a gate insulating layer extending in the first direction between the plurality of gates and the semiconductor layer and between the plurality of insulators and the semiconductor layer; and a resistance change layer extending in the first direction on a surface of the semiconductor layer. The resistance change layer includes a metal-semiconductor oxide including a mixture of a semiconductor material of the semiconductor layer and a transition metal oxide.

    NON-VOLATILE MEMORY DEVICE AND OPERATING METHOD OF THE SAME

    公开(公告)号:US20210035641A1

    公开(公告)日:2021-02-04

    申请号:US16775424

    申请日:2020-01-29

    Abstract: Provided are a non-volatile memory device and an operating method thereof. The non-volatile memory device includes a memory cell array having a vertically stacked structure, a bit line for applying a programming voltage to the memory cell array, and a control logic. The memory cell array includes memory cells that each include a corresponding portion of a semiconductor layer and a corresponding portion of a resistance layer. The memory cells include a non-selected memory cell, a compensation memory cell, and a selected memory cell. The control logic is configured to apply an adjusted program voltage to the selected memory cell, based on applying a first voltage to the compensation memory cell, a second voltage to the selected memory cell, and a third voltage to the non-selected memory cell. The adjusted program voltage may be dropped compared to the programming voltage due to the compensation memory cell.

    CAPACITOR STRUCTURE
    39.
    发明申请
    CAPACITOR STRUCTURE 审中-公开
    电容结构

    公开(公告)号:US20150022948A1

    公开(公告)日:2015-01-22

    申请号:US14319259

    申请日:2014-06-30

    Abstract: A capacitor structure includes a first electrode structure and a second electrode structure. The first electrode structure includes a first negative plate and a first positive plate spaced apart from each other. The first electrode structure has a first horizontal capacitance between the first negative plate and the first positive plate. The second electrode structure includes a second positive plate and a second negative plate spaced apart from each other on the first electrode structure. The second electrode structure has a second horizontal capacitance between the second negative plate and the second positive plate. First and second vertical capacitances are formed between the first negative plate and the second positive plate and between the first positive plate and the second negative plate.

    Abstract translation: 电容器结构包括第一电极结构和第二电极结构。 第一电极结构包括彼此间隔开的第一负极板和第一正极板。 第一电极结构在第一负极板和第一正极板之间具有第一水平电容。 第二电极结构包括在第一电极结构上彼此间隔开的第二正极板和第二负极板。 第二电极结构在第二负极板和第二正极板之间具有第二水平电容。 第一和第二垂直电容形成在第一负极板和第二正极板之间以及第一正极板和第二负极板之间。

    CLOTHES TREATING APPARATUS
    40.
    发明申请

    公开(公告)号:US20240417911A1

    公开(公告)日:2024-12-19

    申请号:US18612063

    申请日:2024-03-21

    Abstract: A clothes treating apparatus includes a housing, a tub inside the housing, a drainage device configured to discharge water from the tub to an outside of the housing; a filter device configured to be disposed outside the housing and connected to the drainage device to receive water discharged by the drainage device and filter out foreign substances from the received water, the filter device including a coupler on a bottom of the filter device; and an installation device configured to mount the filter device to a surface, the installation device including a supporter, and the supporter including a supporter mounting portion, wherein the installation device is configured so that the supporter is seatable to the surface, and the supporter mounting portion is couplable to the coupler so that, while the supporter is seated to the surface and the supporter mounting portion is coupled to the coupler, the filter device is mounted to the surface.

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