公开(公告)号：US20080259323A1

公开(公告)日：2008-10-23

申请号：US12061118

申请日：2008-04-02

申请人： Ryoichi Hirano ,  Riki Ogawa

发明人： Ryoichi Hirano ,  Riki Ogawa

IPC分类号： G01J1/46

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold.

摘要翻译： 提供了一种掩模版缺陷检查装置，其通过在使掩模版静止时通过用检查光照射来控制掩模版的损坏。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 所述掩模版缺陷检查装置具有用于测量对所述掩模版的光的剂量的剂量监视部，比较部，根据由所述剂量监视部测定的所述剂量的累积照射计算所述累积照射与预设阈值之间进行比较， 作为比较结果，积累的照射超过阈值的停止机构，用于停止用光照射的掩模版。

公开(公告)号：US20070081149A1

公开(公告)日：2007-04-12

申请号：US11344205

申请日：2006-02-01

申请人： Noboru Kobayashi ,  Riki Ogawa ,  Masayuki Hideshima ,  Hiroyuki Nagahama ,  Koji Nakajima

发明人： Noboru Kobayashi ,  Riki Ogawa ,  Masayuki Hideshima ,  Hiroyuki Nagahama ,  Koji Nakajima

IPC分类号： G01J1/00

CPC分类号： G01J1/36 ,  G01J1/04 ,  G01J1/044 ,  G01J1/18

摘要： A device for measuring the intensity of incoming light is disclosed. This device includes a rotatable light blocking unit which interrupts incident signal light at short regular intervals. The device also includes a light source which emits certain light different from the signal light while the signal light is interrupted by the block unit, and a measurement unit for measuring intensity values of the signal light and the certain light. A correction unit is provided for correcting the measured signal light intensity based on the certain light intensity. A calculator unit calculates a correction value through comparison of the intensity of the certain light to a reference value. The correction unit uses this correction value to correct the signal light intensity.

摘要翻译： 公开了一种用于测量入射光强度的装置。 该装置包括可旋转的光阻挡单元，其以规则间隔的短时间中断入射信号光。 该装置还包括在信号光被块单元中断时发出与信号光不同的特定光的光源，以及用于测量信号光和特定光的强度值的测量单元。 提供校正单元，用于基于特定光强度校正测量的信号光强度。 计算器单元通过将特定光的强度与参考值进行比较来计算校正值。 校正单元使用该校正值来校正信号光强度。

公开(公告)号：US20070070334A1

公开(公告)日：2007-03-29

申请号：US11526638

申请日：2006-09-26

申请人： Riki Ogawa ,  Soichiro Mitsui

发明人： Riki Ogawa ,  Soichiro Mitsui

IPC分类号： G01N21/88

CPC分类号： G01N21/95607 ,  G01N21/94 ,  G01N2021/8841 ,  G01N2021/95676 ,  G03F1/84 ,  G03F7/7065

摘要： A defect inspection apparatus includes an illumination optical system which sets a transmission illumination region and a reflection illumination region on an inspection target surface of a mask, first and second imaging units having first and second visual fields which are set on the inspection target surface, an imaging optical system that provides images, which are present on the first and second visual fields, on the first and second imaging units, a defect detection unit which detects a defect of the mask on the basis of the images provided on the first and second imaging units, and a control unit which controls a positional relationship between setting positions of the transmission illumination region and the reflection illumination region and setting positions of the first and second visual fields.

摘要翻译： 缺陷检查装置包括在掩模的检查对象面上设置透射照明区域和反射照明区域的照明光学系统，具有设置在检查对象面上的第一和第二视野的第一和第二摄像单元， 成像光学系统，其提供第一和第二视野上存在于第一和第二成像单元上的图像;缺陷检测单元，其基于第一和第二成像上提供的图像检测掩模的缺陷; 控制单元，其控制透射照明区域和反射照明区域的设定位置和第一和第二视野的设定位置之间的位置关系。