公开(公告)号：US20120081538A1

公开(公告)日：2012-04-05

申请号：US13242655

申请日：2011-09-23

申请人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

发明人： Riki Ogawa ,  Masatoshi Hirono ,  Takeshi Nishizaka ,  Ryoichi Hirano ,  Ikunao Isomura ,  Kazuto Matsuki ,  Fumio Ozaki

IPC分类号： H04N7/18

CPC分类号： G01N21/956

摘要： This pattern inspection apparatus includes an inspection region information storage unit that stores an inspection region specified in a pattern region, a pattern surface height detection unit that detects a pattern surface height signal corresponding to a pattern surface height measurement position on the inspection sample, an autofocus mechanism that focuses on the inspection sample using the pattern surface height signal detected by the pattern surface height detection unit, a determination unit, and an autofocus mechanism control unit. When the determination unit determines that the pattern surface height measurement position is located within the inspection region, the autofocus mechanism control unit drives the autofocus mechanism, and the determination unit determines that the pattern surface height measurement position is not located within the inspection region, the autofocus mechanism control unit stops the autofocus mechanism.

摘要翻译： 该图案检查装置包括：检查区域信息存储单元，其存储在图案区域中指定的检查区域;图案表面高度检测单元，其检测与检查样品上的图案表面高度测量位置对应的图案表面高度信号;自动对焦 使用由图案表面高度检测单元，确定单元和自动对焦机构控制单元检测到的图案表面高度信号来关注检查样本的机构。 当确定单元确定图案表面高度测量位置位于检查区域内时，自动聚焦机构控制单元驱动自动聚焦机构，并且确定单元确定图案表面高度测量位置不位于检查区域内， 自动对焦机构控制单元停止自动对焦机构。

公开(公告)号：US07894051B2

公开(公告)日：2011-02-22

申请号：US12061118

申请日：2008-04-02

申请人： Ryoichi Hirano ,  Riki Ogawa

发明人： Ryoichi Hirano ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold.

摘要翻译： 提供了一种掩模版缺陷检查装置，其通过在使掩模版静止时通过用检查光照射来控制掩模版的损坏。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 所述掩模版缺陷检查装置具有用于测量对所述掩模版的光的剂量的剂量监视部，比较部，根据由所述剂量监视部测定的所述剂量的累积照射计算所述累积照射与预设阈值之间进行比较， 作为比较结果，积累的照射超过阈值的停止机构，用于停止用光照射的掩模版。

公开(公告)号：US20080259323A1

公开(公告)日：2008-10-23

申请号：US12061118

申请日：2008-04-02

申请人： Ryoichi Hirano ,  Riki Ogawa

发明人： Ryoichi Hirano ,  Riki Ogawa

IPC分类号： G01J1/46

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that controls damage of a reticle by irradiation with an inspection light when the reticle is caused to be at rest is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. The reticle defect inspection apparatus has a dose monitoring part for measuring a dose of the light to the reticle, a comparing part for comparing, after calculating accumulated irradiation from the dose measured by the dose monitoring part, the accumulated irradiation with a preset threshold, and a stop mechanism for stopping irradiation of the reticle with the light when, as a result of the comparison, the accumulated irradiation exceeds the threshold.

摘要翻译： 提供了一种掩模版缺陷检查装置，其通过在使掩模版静止时通过用检查光照射来控制掩模版的损坏。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 所述掩模版缺陷检查装置具有用于测量对所述掩模版的光的剂量的剂量监视部，比较部，根据由所述剂量监视部测定的所述剂量的累积照射计算所述累积照射与预设阈值之间进行比较， 作为比较结果，积累的照射超过阈值的停止机构，用于停止用光照射的掩模版。

公开(公告)号：US08049897B2

公开(公告)日：2011-11-01

申请号：US12047844

申请日：2008-03-13

申请人： Ryoichi Hirano ,  Riki Ogawa

发明人： Ryoichi Hirano ,  Riki Ogawa

IPC分类号： G01N21/55

CPC分类号： G01N21/95607 ,  G01N2021/95676 ,  G01N2201/0631

摘要： A reticle defect inspection apparatus that suppresses deterioration of optical components resulting from luminescent spots generated by an integrator and can sustain a defect inspection with high precision for a long time is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. And the apparatus includes an illuminating optical system for irradiating the reticle with an inspection light and a detecting optical system for detecting a pattern image of the reticle irradiated with the inspection light, wherein the illuminating optical system comprises an integrator for equalizing illumination distribution of the inspection light and a moving mechanism for enabling the integrator to slightly move in a direction perpendicular to an optical axis of the integrator.

摘要翻译： 提供了一种掩模版缺陷检查装置，其抑制由积分器产生的发光点导致的光学部件的劣化，并且能够长期高精度地进行缺陷检查。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 该装置包括用于用检查光照射标线的照明光学系统和用于检测用检查光照射的掩模版的图案图像的检测光学系统，其中照明光学系统包括用于均衡检查的照明分布的积分器 光和移动机构，用于使积分器能够在垂直于积分器的光轴的方向上稍微移动。

公开(公告)号：US5642373A

公开(公告)日：1997-06-24

申请号：US550119

申请日：1995-10-30

申请人： Takeshi Kamizato ,  Ryoichi Hirano

发明人： Takeshi Kamizato ,  Ryoichi Hirano

IPC分类号： H01S3/08 ,  H01S5/00 ,  H01S5/022 ,  H01S5/042 ,  H01S5/10 ,  H01S5/18 ,  H01S5/42 ,  H01S3/19

CPC分类号： H01S5/42 ,  H01L2224/48463 ,  H01L2224/73265 ,  H01S5/02292 ,  H01S5/0422 ,  H01S5/18 ,  H01S5/4018 ,  H01S5/4056

摘要： A monolithic semiconductor laser array includes an insulating substrate, a plurality of semiconductor layers epitaxially grown on the substrate and forming a laser structure, and at least one groove transverse to the substrate extending through the semiconductor layers into the substrate, dividing the semiconductor laser structure into at least two mutually isolated parts. Within each of the isolated parts of the semiconductor laser structure, a first groove includes a side wall transverse to the substrate and forming a first resonator facet of a semiconductor laser. A second groove in each of the parts includes a second side wall transverse to the substrate and opposite the first side wall, forming a second resonator facet of the semiconductor laser in that part. Each second groove also includes a third side wall oblique to the substrate and opposite the second side wall for reflecting light from the respective semiconductor laser so that light from each of the semiconductor lasers is emitted along a common axis transverse to the substrate. The second grooves are arranged radially about a common point on the substrate. The semiconductor lasers may be electrically connected in series to each other.

摘要翻译： 单片半导体激光器阵列包括绝缘基板，在基板上外延生长并形成激光结构的多个半导体层以及横跨于基板的至少一个沟槽延伸穿过半导体层进入基板，将半导体激光器结构分成 至少两个相互隔离的部分。 在半导体激光器结构的每个隔离部分中，第一凹槽包括横向于衬底的侧壁并形成半导体激光器的第一谐振器面。 每个部件中的第二凹槽包括横向于基板并与第一侧壁相对的第二侧壁，在该部分中形成半导体激光器的第二谐振器面。 每个第二凹槽还包括与基板倾斜并与第二侧壁相对的第三侧壁，用于反射来自各个半导体激光器的光，使得来自每个半导体激光器的光沿着与基板横向的共同轴线发射。 第二槽围绕基板上的公共点径向地布置。 半导体激光器可以彼此串联电连接。

公开(公告)号：US5442445A

公开(公告)日：1995-08-15

申请号：US173879

申请日：1993-12-27

申请人： Kyoichi Tatsuno ,  Toshiya Umeda ,  Ryoichi Hirano

发明人： Kyoichi Tatsuno ,  Toshiya Umeda ,  Ryoichi Hirano

IPC分类号： G02B27/42 ,  B23Q15/24 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F9/7088 ,  B23Q15/24

摘要： A registration system for registering a target registration object with respect to a predetermined reference position by using a registration mark formed on the target registration object includes the intensity measurement step of receiving a mark image for a predetermined period of time by a storage type sensor while an area of the target registration object which includes the mark is illuminated, the storage type sensor having elements whose positional relationship is known with respect to the mark image, the process of obtaining a center position of the mark image on the storage type sensor in a positioning direction in accordance with outputs from the elements of the storage type sensor obtained in the intensity measurement step, the distance calculation step of calculating a distance between the reference position and the center position obtained by the process, and the moving step of moving the target registration object by a distance corresponding to the distance obtained in the distance calculation step.

摘要翻译： 用于通过使用形成在目标登记对象上的登记标记来登记目标登记对象的登录系统包括：强度测量步骤，通过存储型传感器接收一段时间的标记图像; 包含标记的目标登记对象的区域被照亮，存储型传感器具有相对于标记图像的位置关系已知的元素，在定位中获取存储型传感器上的标记图像的中心位置的处理 根据在强度测量步骤中获得的存储型传感器的元件的输出，计算基准位置与通过处理获得的中心位置之间的距离的距离计算步骤，以及移动目标登记 对象距离对应于获得的距离 距离计算步骤

公开(公告)号：US5100234A

公开(公告)日：1992-03-31

申请号：US538186

申请日：1990-06-13

申请人： Yoriyuki Ishibashi ,  Ryoichi Hirano ,  Kyoji Yamashita

发明人： Yoriyuki Ishibashi ,  Ryoichi Hirano ,  Kyoji Yamashita

IPC分类号： G03F9/00

CPC分类号： G03F9/7049 ,  G03F9/7023

摘要： A first diffraction grating is formed on a mask, and a second diffraction grating is formed on a wafer. Two light beams having slightly different frequencies interfere with each other and are diffracted as they travel through the first diffraction grating, are reflected by the second diffraction grating, and again pass through the first diffraction grating. As a result, they change into thrice diffracted light beams. The diffracted light beams are combined into a detection light beam which has a phase shift .phi..sub.A representing the displacement between the wafer and the mask, or a phase shift .phi..sub.G representing the gap between the wafer and the mask. The detection light beam is converted into a detection signal. The phase difference between the detection signal and a reference signal having no phase shifts are calculated, thus determining phase shift .phi..sub.A or .phi..sub.G. The displacement or the gap is determined from the phase shift. In accordance with the displacement or the gap, the wafer and the mask are aligned to each other, or the gap between them is adjusted to a desired value. Since the detection signal is generated from diffracted light beams, its S/N ratio is sufficiently great. Therefore, the displacement or the gap is determined with high precision. In addition, it is possible with the invention to perform the aligning of the wafer and the mask and the adjusting of the gap therebetween, simultaneously. Further, the incident light may be either circularly polarized light or non-polarized light.

公开(公告)号：US07036980B2

公开(公告)日：2006-05-02

申请号：US10329514

申请日：2002-12-27

申请人： Ryoichi Hirano ,  Satoshi Imura ,  Noriaki Nakayamada

发明人： Ryoichi Hirano ,  Satoshi Imura ,  Noriaki Nakayamada

IPC分类号： G01K13/12 ,  G01K1/16

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/78 ,  H01J37/3174 ,  H01J2237/2001 ,  H01J2237/304 ,  Y10S430/143

摘要： A pattern forming apparatus includes a drawing chamber having a drawing substrate on which an original pattern is drawn, a first temperature control unit having a first temperature regulator to make the temperature of the drawing chamber constant, and a constant-temperature member arranged near the drawing substrate. The pattern forming apparatus further includes a second temperature control unit having a second temperature regulator. The second temperature control unit is configured to control the set temperature of the constant-temperature member independently such that the temperature of the drawing substrate becomes substantially constant when the original pattern is drawn.

摘要翻译： 图案形成装置包括具有绘制原始图案的绘图基板的拉伸室，具有使拉伸室的温度恒定的第一温度调节器的第一温度控制单元和布置在图中的恒温部件 基质。 图案形成装置还包括具有第二温度调节器的第二温度控制单元。 第二温度控制单元被配置为独立地控制恒温部件的设定温度，使得当拉制原始图案时拉伸基板的温度基本上恒定。

公开(公告)号：US06182369B2

公开(公告)日：2001-02-06

申请号：US09038038

申请日：1998-03-11

申请人： Ryoichi Hirano ,  Shusuke Yoshitake ,  Kazuto Matsuki ,  Toru Tojo

发明人： Ryoichi Hirano ,  Shusuke Yoshitake ,  Kazuto Matsuki ,  Toru Tojo

IPC分类号： G01B5004

CPC分类号： G03F7/70383 ,  G03F7/70433 ,  H01J37/3023 ,  H01J2237/30461 ,  H01J2237/31764

摘要： A pattern forming apparatus comprising a sample base for positioning a sample on the base and moving a drawing position of the sample, a position measuring unit for measuring a position of the sample base, a correcting unit for mutually independently correcting drawing positions at those respective areas into which a whole drawing section of the sample is divided, the drawing position being calculated by the position measuring unit at the respective area, and a drawing unit for drawing a pattern on the sample on the basis of the position of the sample base measured by the position measuring unit and drawing position of the respective area corrected by the correcting unit.

摘要翻译： 一种图案形成装置，包括用于将样本定位在基座上并移动样本的绘制位置的样本基座，用于测量样本基座的位置的位置测量单元，用于相互独立地校正各个区域的绘制位置的校正单元 样本的整个绘图部分被划分成，绘图位置由各个区域的位置测量单元计算，以及绘图单元，用于根据样本的位置根据由 位置测量单元和由校正单元校正的各个区域的绘图位置。

公开(公告)号：US5519720A

公开(公告)日：1996-05-21

申请号：US177466

申请日：1994-01-05

申请人： Ryoichi Hirano ,  Etsuji Omura ,  Akira Takemoto ,  Kimio Shigihara

发明人： Ryoichi Hirano ,  Etsuji Omura ,  Akira Takemoto ,  Kimio Shigihara

IPC分类号： H01L21/52 ,  G02B6/42 ,  H01L23/36 ,  H01S5/00 ,  H01S5/022 ,  H01S5/024 ,  H01S3/043 ,  H01S3/18

CPC分类号： H01L33/483 ,  G02B6/4204 ,  H01L33/64 ,  H01S5/02212 ,  H01L2224/45139 ,  H01L2224/48091 ,  H01L33/62 ,  H01S5/02272 ,  H01S5/02284 ,  H01S5/024

摘要： A semiconductor light emitting device includes a semiconductor light emitting element mounted on a package stem via a radiating heatsink block, the light emitting point of the light emitting element being positioned on the central axis of the stem and at or near the center of mass of the heatsink block. Another light emitting device includes a light emitting element mounted on a stem via a heatsink block, the light emitting point of the element being positioned on the central axis of the stem with only a portion of a lower surface of the heatsink block close to the central axis of the stem attached to the stem. The movement of the light emitting point with temperature variations is suppressed. Another light emitting device includes a laser chip element mounted on a package stem via a heatsink block, the laser chip element being mounted on the heatsink block so that the emitted light forms an angle .theta. with a surface of the stem and the position and angle of the emitted light do not vary when the temperature changes.

摘要翻译： 半导体发光器件包括通过辐射散热块安装在封装主干上的半导体发光元件，发光元件的发光点位于杆的中心轴线上，并且位于或接近质心的中心 散热片 另一种发光器件包括通过散热块安装在杆上的发光元件，元件的发光点位于杆的中心轴线上，散热块的下表面的仅一部分靠近中心 杆的轴线连接到杆上。 抑制了具有温度变化的发光点的移动。 另一种发光器件包括通过散热块安装在封装主体上的激光芯片元件，激光芯片元件安装在散热块上，使发射的光与杆表面形成角度θ， 当温度变化时，发出的光不会变化。