摘要:
A liquid crystal panel P is positioned and held by a plurality of first locating pins 5 of a first holder 3 with a diagonal line of the liquid crystal panel P oriented in a vertical direction by making use of a weight of the liquid crystal panel P. A backlight B is positioned and held by a plurality of second locating pins 6 of a second holder 4 with a diagonal line of the backlight B corresponding to the diagonal line of the liquid crystal panel P extending in the vertical direction by making use of a weight of the backlight B. A bonding mechanism 13 horizontally moves the second holder 4 to bring the first and second holders 3 and 4 relatively close to each other to bond the liquid crystal panel P and the backlight B. This allows easy and precise positioning and bonding of the objects.
摘要:
Sidewalls of patterned resist are reformed using a reforming agent selected from the group consisting of (a) a carbon trichloride radical, (b) a mixture of silicon ion and oxygen ion, (c) a mixture of carbon ion and carbon monoxide ion, (d) a chlorine radical, (e) aluminum trichloride liquid and (f) dibutyl magnesium liquid, and sidewall reformed portions are thus formed on the sidewalls of pattern resist. The not reformed portion of the patterned resist is removed away, and sidewall reformed portions are left on an object layer. The portion of object layer excluding the portion immediately below sidewall reformed portions is etched away, and fine patterns of object layer are formed as a result.
摘要:
It is an object to realize a measuring head capable of maintaining high Z direction accuracy even with a measured sample having fine, complicated and very uneven pattern configuration, in an atomic force microscope. A light beam (141) of non-linear polarization is incident upon an end portion (110a) of an upper main surface of a cantilever body (110) having a probe (2). The cantilever body (110) is a polarizing plate, and its refractive index is given by tan (a Brewster's angle of the light beam (141)). Accordingly, a reflected light beam (142) reflected at the end portion (110a) becomes light of linear polarization. A light position detector (150) including an analyzing window (150a) including a polaroid thin film as an analyzing material transmits only the light oscillating in the same direction as the electric vector of the linearly polarized reflected light beam (142) to detect its positional change. A control signal (V3) for driving a piezo element (6) is generated on the basis of a value of its output signal (V1) and a measured sample (3) is scanned in the XYZ directions.
摘要:
A method of use of a scanning probe microscope includes the step of mounting a probe to a scanning probe microscope in ambient atmosphere, the step of drawing on a surface of a standard sample by two-dimensionally scanning while keeping constant a tunnel current under feedback control of a distance between a standard sample and the probe, the step of applying pulse voltage between the probe and the standard sample while two-dimensionally scanning, with feedback control stopped at each scanning point, the step for obtaining drawn image of the surface of the standard sample again, comparing the obtained drawn image with the drawn image obtained in the step of drawing on the surface of the standard sample thereby determining cleanness of the probe, the step of repeating the step of pulse application and the step of determination of cleanness until the probe is cleaned, the step for replacing the standard sample by a sample for measurement after cleanness of the probe is confirmed, and the step of drawing.
摘要:
An adhesion measuring apparatus includes a measuring device for measuring a Force-Curve at each of multiple measuring points on a sample surface using a cantilever provided at its distal end with a probe which is made of a material to be formed on the sample surface, and a distribution image forming device for calculating adhesion between a material making up the sample surface and the material to be formed on the sample surface from an output of the measuring device, and forming an image of adhesion distribution on the sample surface. An adhesion measuring method includes the steps of adjusting the spacing between a probe which is provided at the distal end of a cantilever and made of a material to be formed on a sample surface and the sample surface to measure a Force-Curve at each of multiple measuring points on the sample surface, calculating adhesion between a material making up the sample surface and the material to be formed on the sample surface at each of the measuring points from the result of measuring the Force-Curve, and forming an image of adhesion distribution on the sample surface from the adhesion calculated for each of the measuring points. With the present adhesion measuring apparatus and method, the condition of the sample surface can be accurately determined at an atomic level.