公开(公告)号：US20100085150A1

公开(公告)日：2010-04-08

申请号：US12503998

申请日：2009-07-16

申请人： Makoto Aikawa ,  Shoko Hatanaka ,  Takeshi Inoue ,  Hiroki Yamazaki

发明人： Makoto Aikawa ,  Shoko Hatanaka ,  Takeshi Inoue ,  Hiroki Yamazaki

IPC分类号： G06F7/04

CPC分类号： G07C9/00087 ,  G06Q20/341 ,  G06Q20/40145 ,  G07F7/1008 ,  G07F7/1083

摘要： A semiconductor element or mobile terminal stores a user's biometric information pattern used for execution of a biometric authentication process and the residual number of trials indicating the number of allowed failures in the biometric authentication process, sends processing data to an external device so that the external device can use the processing data when the external device executes part of the biometric authentication process, and decreases the residual number of trials by a predetermined value while the processing data is output to the external device after start of communication with the external device.

摘要翻译： 半导体元件或移动终端存储用于生物认证处理的执行的用户的生物体信息模式和表示生物体认证处理中允许的失败次数的剩余次数，将处理数据发送到外部设备，使得外部设备 当外部设备执行部分生物认证处理时，可以使用处理数据，并且在开始与外部设备通信之后将处理数据输出到外部设备，将剩余的试验次数减少预定值。

公开(公告)号：US20060037703A1

公开(公告)日：2006-02-23

申请号：US11156561

申请日：2005-06-21

申请人： Akira Koshiishi ,  Masaru Sugimoto ,  Kunihiko Hinata ,  Noriyuki Kobayashi ,  Chishio Koshimizu ,  Ryuji Ohtani ,  Kazuo Kibi ,  Masashi Saito ,  Naoki Matsumoto ,  Manabu Iwata ,  Daisuke Yano ,  Yohei Yamazawa ,  Hidetoshi Hanaoka ,  Toshihiro Hayami ,  Hiroki Yamazaki ,  Manabu Sato

发明人： Akira Koshiishi ,  Masaru Sugimoto ,  Kunihiko Hinata ,  Noriyuki Kobayashi ,  Chishio Koshimizu ,  Ryuji Ohtani ,  Kazuo Kibi ,  Masashi Saito ,  Naoki Matsumoto ,  Manabu Iwata ,  Daisuke Yano ,  Yohei Yamazawa ,  Hidetoshi Hanaoka ,  Toshihiro Hayami ,  Hiroki Yamazaki ,  Manabu Sato

IPC分类号： C23F1/00

CPC分类号： H01J37/32091 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/3244 ,  H01J37/32697 ,  H01J37/32706 ,  H01J2237/334 ,  H01L21/3065

摘要： An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency, and a second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber to generate plasma of the process gas so as to perform plasma etching.

摘要翻译： 一种装置包括用于支撑在处理室内相对设置的晶片的上电极和下电极。 被配置为施加具有相对较高频率的第一RF功率的第一RF电源和被配置为施加具有相对较低频率的第二RF功率的第二RF电源连接到下电极。 可变直流电源连接到上电极。 将工艺气体供应到处理室中以产生处理气体的等离子体，以进行等离子体蚀刻。

公开(公告)号：US06956000B2

公开(公告)日：2005-10-18

申请号：US10277883

申请日：2002-10-23

申请人： Hiroshi Komori ,  Hiroki Yamazaki

发明人： Hiroshi Komori ,  Hiroki Yamazaki

IPC分类号： C03C4/08 ,  C03C3/078 ,  C03C3/085 ,  C03C3/087 ,  C03C3/095 ,  H01J29/86

CPC分类号： C03C3/085

摘要： Panel glass, for a cathode ray tube, which has an SrO/(SrO+BaO) ratio of from 0.35 to 0.70, an X-ray absorption coefficient of 36.0 cm−1 or more at the wavelength of 0.6 angstrom, wherein Na2O/R2O, K2O/R2O and Li2O/R2O (R2O: Na2O+K2O+Li2O) molar ratios fall within a range surrounded by the points A (0, 0.2, 0.8), B (0.2, 0.2, 0.6), C (0.4, 0.6, 0), D (0.2, 0.8, 0) and E (0, 0.4, 0.6) in the ternary phase diagram as shown in FIG. 1.

摘要翻译： 用于阴极射线管的面板玻璃，其SrO /（SrO + BaO）比为0.35-0.70，X射线吸收系数为36.0cm -1以上的波长 0.6埃，其中Na 2 O / R 2 O，K 2 O / R 2 O和Li < O 2 R 2 O 2（R 2 O 2 Na 2 O + K 2 O 2） （O，Li，O）O摩尔比落在由点A（0,0.2,0.8），B（0.2,0.2,0.6），C（0.4,0.6,0）所包围的范围内， ，D（0.2,0.8,0）和E（0,0.4,0.6），如图3所示。 1。

公开(公告)号：US20050054513A1

公开(公告)日：2005-03-10

申请号：US10966214

申请日：2004-10-15

申请人： Hiroshi Komori ,  Hiroki Yamazaki

发明人： Hiroshi Komori ,  Hiroki Yamazaki

IPC分类号： C03C4/02 ,  C03C3/105 ,  C03C4/08 ,  H01J9/24 ,  H01J29/86 ,  C03C3/085 ,  C03C3/102

CPC分类号： H01J29/863 ,  C03C3/105

摘要： On producing CRT funnel glass from CRT panel glass or CRT frit, Fe2O3 is added in a range of 0.05 to 1 mass % so that the fluctuation of transmittance of light having a wavelength of 1,050 nm becomes 10% or less, at a thickness of 10 mm of the produced CRT funnel glass.

摘要翻译： 在从CRT面板玻璃或CRT玻璃料制造CRT漏斗玻璃时，以0.05〜1质量％的范围添加Fe2O3，使得波长为1050nm的光的透射率的变化为10％以下，厚度为10 所制造的CRT漏斗玻璃的mm。

公开(公告)号：US06811728B2

公开(公告)日：2004-11-02

申请号：US10374906

申请日：2003-02-24

申请人： Shougo Yagi ,  Tadayuki Imai ,  Michio Ono ,  Hiroki Yamazaki ,  Haruki Kozawaguchi

发明人： Shougo Yagi ,  Tadayuki Imai ,  Michio Ono ,  Hiroki Yamazaki ,  Haruki Kozawaguchi

IPC分类号： B29D1100

CPC分类号： G11B7/0065 ,  G03H2001/2226 ,  G03H2001/2615 ,  G11B7/24

摘要： An inexpensive multi-layered holographic read-only memory having a large capacity is provided. In the memory in which single-mode slab waveguides are multi-layered, a periodic scattering center whose period approximately agrees with the period of the guided mode is provided in at least one of a core layer and a clad layer in each waveguide so that a guided wave in the waveguide is diffracted by the periodic scattering center to the outside of the waveguide and a holographic image is generated.

摘要翻译： 提供了一种具有大容量的便宜的多层全息只读存储器。 在单模平板波导为多层的存储器中，在每个波导管中的芯层和覆层中的至少一个中提供周期大约与引导周期大致相同的周期性散射中心，使得 波导中的导波被周期性散射中心衍射到波导的外部，并且产生全息图像。

公开(公告)号：US6155950A

公开(公告)日：2000-12-05

申请号：US280716

申请日：1999-03-30

申请人： Kiyoji Minegishi ,  Masanori Egawa ,  Hiroki Yamazaki

发明人： Kiyoji Minegishi ,  Masanori Egawa ,  Hiroki Yamazaki

IPC分类号： B23P15/00 ,  F16H1/32

CPC分类号： F16H57/0487 ,  B23P15/00 ,  F16H1/32 ,  Y10T29/4956 ,  Y10T29/49565

摘要： An inner roller 30 (in FIG. 2) for use in an internal-meshing planetary gear construction has its inner-peripheral wall 32 formed into a shape which is brought closer to a regular polygon of n sides (where n denotes an integer of at least 3, and n=3 holds in the illustrated example). Lubricating oil is reserved in clearances H1 defined near the vertices of the regular triangle, and an inner pin 7 is retained in light touch with the three middle points P1-P3 of the respective sides of the regular triangle. Thus, the reservation of the lubricating oil and the retention of the inner pin 7 free from backlash are made consistent, thereby to relieve the backlash of the planetary gear construction and to enhance the durability thereof. The shape of the inner-peripheral wall 32 closer to the regular polygon of n 7 is obtained in such a way that the inner-peripheral wall 32 is subjected to a burnishing work in the state in which depressive forces (deforming forces) based on chucking jigs are applied to the circumferential equidistant positions of the cylindrical blank of the inner roller 30, and that strains (residual strains) remaining after the burnishing work are further enlarged by a heat treatment.

摘要翻译： 用于内啮合行星齿轮结构的内辊30（图2中）具有内周壁32，其内周壁32形成为更靠近+ E，n + n + EE侧的正多边形（其中 + E，uns n + EE表示至少3的整数，在所示示例中n = 3。 润滑油保留在正三角形的顶点附近限定的间隙H1中，内销7与正三角形的各侧的三个中间点P1-P3保持轻微的接触。 因此，使润滑油的保留和内销7没有齿隙的保持一致，从而减轻行星齿轮构造的间隙并提高其耐久性。 获得更接近+ E，n n + EE 7的正多边形的内周壁32的形状，使得内周壁32在抑制压力的状态下进行抛光加工 基于夹紧夹具的变形力施加到内辊30的圆筒形坯料的圆周等距位置，并且通过热处理进一步扩大抛光加工后残留的应变（残余应变）。

公开(公告)号：US5992020A

公开(公告)日：1999-11-30

申请号：US872386

申请日：1997-06-10

申请人： Kiyoji Minegishi ,  Masanori Egawa ,  Hiroki Yamazaki

发明人： Kiyoji Minegishi ,  Masanori Egawa ,  Hiroki Yamazaki

IPC分类号： B23P15/00 ,  F16H1/32

CPC分类号： F16H57/0487 ,  B23P15/00 ,  F16H1/32 ,  Y10T29/4956 ,  Y10T29/49565

摘要： An inner roller 30 for use in an internal-meshing planetary gear construction has its inner-peripheral wall 32 formed into a shape which is brought closer to a regular polygon of n sides (where n denotes an integer of at least 3, and n=3 holds in the illustrated example). Lubricating oil is reserved in clearances H1 defined near the vertices of the regular triangle, and an inner pin 7 is retained in light touch with the three middle points P1-P3 of the respective sides of the regular triangle. Thus, the reservation of the lubricating oil and the retention of the inner pin 7 free from backlash are made consistent, thereby to relieve the backlash of the planetary gear construction and to enhance the durability thereof. The shape of the inner-peripheral wall 32 closer to the regular polygon of n 7 is obtained in such a way that the inner-peripheral wall 32 is subjected to a burnishing work in the state in which depressive forces (deforming forces) based on chucking jigs are applied to the circumferential equidistant positions of the cylindrical blank of the inner roller 30, and that strains (residual strains) remaining after the burnishing work are further enlarged by a heat treatment.

摘要翻译： 用于内啮合行星齿轮结构的内辊30的内周壁32形成为更靠近+ E，n + EE面的正多边形的形状（其中n表示整数 至少3，在所示示例中n = 3）。 润滑油保留在正三角形的顶点附近限定的间隙H1中，内销7与正三角形的各侧的三个中间点P1-P3保持轻微的接触。 因此，使润滑油的保留和内销7没有齿隙的保持一致，从而减轻行星齿轮构造的间隙并提高其耐久性。 获得更靠近+ E，n n + EE 7的正多边形的内周壁32的形状，使得内周壁32在抑制力的状态下进行抛光加工 基于夹紧夹具的变形力施加到内辊30的圆筒形坯料的圆周等距位置，并且通过热处理进一步扩大抛光加工后残留的应变（残余应变）。