公开(公告)号：US06818148B1

公开(公告)日：2004-11-16

申请号：US09401490

申请日：1999-09-22

申请人： Satoshi Watanabe ,  Toyohisa Sakurada ,  Yoshitaka Yanagi ,  Shigehiro Nagura ,  Toshinobu Ishihara

发明人： Satoshi Watanabe ,  Toyohisa Sakurada ,  Yoshitaka Yanagi ,  Shigehiro Nagura ,  Toshinobu Ishihara

IPC分类号： C09K1300

CPC分类号： G03F7/0048

摘要： A resist composition is provided comprising a fluorochemical surfactant which functions to reduce the contact angle of a coating of the resist composition with water or an aqueous base developer as the amount of the fluorochemical surfactant increases. The resist composition forms a coating having a thickness uniformity, free of defects, and wettable with an aqueous base developer when applied onto a substrate, and has a good storage stability in that particles do not increase during storage in solution form.

摘要翻译： 提供了一种抗蚀剂组合物，其包括含氟化学表面活性剂，其功能是随着含氟表面活性剂的量的增加，抗蚀剂组合物的涂层与水或碱性显影剂水溶液的接触角降低。 抗蚀剂组合物形成具有厚度均匀性，无缺陷的涂层，并且当涂覆在基材上时可用基础显影剂水溶液润湿，并且具有良好的储存稳定性，因为在溶液形式储存期间颗粒不增加。

公开(公告)号：US06623909B2

公开(公告)日：2003-09-23

申请号：US09870745

申请日：2001-06-01

申请人： Jun Hatakeyama ,  Toshiaki Takahashi ,  Toshinobu Ishihara ,  Jun Watanabe ,  Tohru Kubota ,  Yoshio Kawai

发明人： Jun Hatakeyama ,  Toshiaki Takahashi ,  Toshinobu Ishihara ,  Jun Watanabe ,  Tohru Kubota ,  Yoshio Kawai

IPC分类号： G03F7038

CPC分类号： C08G77/24 ,  G03F7/0045 ,  G03F7/0757 ,  Y10S430/106 ,  Y10S430/108

摘要： Polymers comprising recurring units of formula (1) are provided wherein R1 is a straight, branched or cyclic divalent C1-20 hydrocarbon group or a bridged cyclic hydrocarbon group, R is hydrogen atom or an acid labile group, 0≦m≦3, 0≦n≦3 and 0≦m+n≦6. Using the polymers, chemical amplification positive resist compositions featuring low absorption of F2 excimer laser light are obtained.

摘要翻译： 提供了包含式（1）的重复单元的聚合物，其中R 1是直链，支链或环状二价C 1-20烃基或桥连环烃基，R是氢原子或酸不稳定基团，0≤m <= 3,0 <= n <= 3，0 <= m + n <= 6。使用聚合物，获得具有F2受激准分子激光的低吸收性的化学放大阳性抗蚀剂组合物。

公开(公告)号：US06455223B1

公开(公告)日：2002-09-24

申请号：US09534351

申请日：2000-03-24

申请人： Jun Hatakeyama ,  Tomohiro Kobayashi ,  Osamu Watanabe ,  Takanobu Takeda ,  Toshinobu Ishihara ,  Jun Watanabe

发明人： Jun Hatakeyama ,  Tomohiro Kobayashi ,  Osamu Watanabe ,  Takanobu Takeda ,  Toshinobu Ishihara ,  Jun Watanabe

IPC分类号： G03F7039

CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/038 ,  Y10S430/106

摘要： A resist composition comprising a dendritic or hyperbranched polymer of a phenol derivative having a weight average molecular weight of 500-10,000,000 has an excellent resolution, reduced line edge roughness, and dry etching resistance and is useful as a chemical amplification type resist composition which may be either positive or negative working.

摘要翻译： 包含重均分子量为500-10,000,000的苯酚衍生物的树枝状或超支化聚合物的抗蚀剂组合物具有优异的分辨率，线边缘粗糙度和耐干蚀刻性，并且可用作化学放大型抗蚀剂组合物，其可以是 正面或负面工作。

公开(公告)号：US06414101B1

公开(公告)日：2002-07-02

申请号：US09535166

申请日：2000-03-24

申请人： Osamu Watanabe ,  Takanobu Takeda ,  Jun Hatakeyama ,  Tomohiro Kobayashi ,  Toshinobu Ishihara ,  Jun Watanabe

发明人： Osamu Watanabe ,  Takanobu Takeda ,  Jun Hatakeyama ,  Tomohiro Kobayashi ,  Toshinobu Ishihara ,  Jun Watanabe

IPC分类号： C08F21214

CPC分类号： C08F257/02 ,  C08F290/04 ,  C08F297/02

摘要： A dendritic or hyperbranched polymer having a weight average molecular weight of 500-10,000,000 is prepared by polymerizing a hydroxystyrene derivative, adding a branching monomer midway in the polymerization step to introduce branch chains, and repeating the polymerizing and branching steps. The polymer is advantageously used as the base resin of resist material because the size of the polymer can be reduced while maintaining strength.

摘要翻译： 通过聚合羟基苯乙烯衍生物，在聚合步骤中途加入支化单体以引入支链并重复聚合和分支步骤，制备重均分子量为500-10,000,000的树枝状或超支化聚合物。 聚合物有利地用作抗蚀剂材料的基础树脂，因为可以在保持强度的同时降低聚合物的尺寸。

公开(公告)号：US6033828A

公开(公告)日：2000-03-07

申请号：US12583

申请日：1998-01-26

申请人： Junji Shimada ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

发明人： Junji Shimada ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

IPC分类号： C08F8/04 ,  G03F7/004 ,  G03F7/039 ,  G03C1/492 ,  C08F12/08 ,  C08F12/24

CPC分类号： G03F7/039 ,  C08F8/04 ,  G03F7/0045

摘要： A polymer comprising recurring units of formula (1) is provided wherein some of the hydrogen atoms of phenolic hydroxyl groups and/or alcoholic hydroxyl groups are replaced by acid labile groups. The polymer is crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining phenolic hydroxyl groups and/or alcoholic hydroxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group and alcoholic hydroxyl group. The polymer has Mw of 1,000-500,000. ##STR1## R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, letter x is 0 or a positive integer, y is a positive integer, x+y.ltoreq.5, letters p and q are positive numbers satisfying p+q=1 and 0

摘要翻译： 提供了包含式（1）的重复单元的聚合物，其中酚羟基和/或醇羟基的一些氢原子被酸不稳定基团取代。 聚合物在分子内和/或分子之间交联，具有由一些残留的酚羟基和/或醇羟基与链烯基醚化合物或卤代烷基醚化合物的反应产生的具有C-O-C键的交联基团。 酸不稳定基团和交联基团的用量平均为全部酚羟基和醇羟基的0摩尔％至80摩尔％以上。 聚合物的Mw为1,000-500,000。 R1是H或甲基，R2是C1-C8烷基，字母x是0或正整数，y是正整数，x + y <5，字母p和q是满足p + q = 1的正数， 0

公开(公告)号：US5951820A

公开(公告)日：1999-09-14

申请号：US882160

申请日：1997-06-25

申请人： Hiromi Ohsaki ,  Kazuhiro Hirahara ,  Toshinobu Ishihara ,  Isao Kaneko

发明人： Hiromi Ohsaki ,  Kazuhiro Hirahara ,  Toshinobu Ishihara ,  Isao Kaneko

IPC分类号： B01D8/00 ,  B01D5/00 ,  B01D7/00 ,  C07F3/00 ,  C07F5/00 ,  C23C16/44 ,  B01D1/00

CPC分类号： B01D5/0012 ,  B01D7/00 ,  C23C16/4402 ,  Y10S159/16 ,  Y10S159/23 ,  Y10S165/911 ,  Y10S165/912

摘要： An organometallic compound represented by the general formula (I) ##STR1## or the general formula (II)R-M.sup.2 -R (II)is evaporated, and then passed through the inner tube of a heat exchanger to be precipitated. The heat exchanger is then heated to re-evaporate the organometallic compound, and the re-evaporated organometallic compound is then precipitated in a filling container which is connected to said heat exchanger and cooled down to a prescribed temperature to fill the container.

摘要翻译： 将由通式（I）或通式（II）表示的有机金属化合物R-M2-R（II）蒸发，然后通过热交换器的内管沉淀。 然后将热交换器加热以再蒸发有机金属化合物，然后将再蒸发的有机金属化合物沉淀在与所述热交换器连接的填充容器中并冷却至规定温度以填充容器。

公开(公告)号：US5942367A

公开(公告)日：1999-08-24

申请号：US839107

申请日：1997-04-23

申请人： Satoshi Watanabe ,  Osamu Watanabe ,  Tomoyoshi Furihata ,  Yoshihumi Takeda ,  Shigehiro Nagura ,  Toshinobu Ishihara ,  Tsuguo Yamaoka

发明人： Satoshi Watanabe ,  Osamu Watanabe ,  Tomoyoshi Furihata ,  Yoshihumi Takeda ,  Shigehiro Nagura ,  Toshinobu Ishihara ,  Tsuguo Yamaoka

IPC分类号： C08F8/00 ,  G03F7/004 ,  G03F7/039

CPC分类号： G03F7/039 ,  C08F8/00 ,  G03F7/0045 ,  C08F2810/20 ,  C08F2810/30 ,  Y10S430/106

摘要： A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group .tbd.C--COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.

公开(公告)号：US5849461A

公开(公告)日：1998-12-15

申请号：US684395

申请日：1996-07-19

申请人： Jun Hatakeyama ,  Shigehiro Nagura ,  Kiyoshi Motomi ,  Takeshi Nagata ,  Toshinobu Ishihara

发明人： Jun Hatakeyama ,  Shigehiro Nagura ,  Kiyoshi Motomi ,  Takeshi Nagata ,  Toshinobu Ishihara

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/038

CPC分类号： G03F7/039 ,  G03F7/0045

摘要： In a chemically amplified positive resist composition comprising an organic solvent, an acid labile group-protected resin and a photoacid generator, a compound having a weight average molecular weight of 100-1,000 and at least two phenolic hydroxyl groups in a molecule wherein the hydrogen atom of the phenolic hydroxyl group is partially replaced by an acid labile group in an overall average proportion of 10-80% is blended as a dissolution controller. The resist composition is highly sensitive to actinic radiation, has improved sensitivity and resolution, and is suitable for use in a fine patterning technique and commercially acceptable.

摘要翻译： 在包含有机溶剂，酸不稳定基团保护的树脂和光致酸产生剂的化学放大型正性抗蚀剂组合物中，分子中具有重均分子量为100-1,000的化合物和至少两个酚羟基，其中氢原子 的酚羟基被酸不稳定基团部分替代，总平均比例为10-80％混合作为溶解控制剂。 抗蚀剂组合物对光化辐射高度敏感，具有改进的灵敏度和分辨率，并且适用于精细图案化技术和商业上可接受的。

公开(公告)号：US5691396A

公开(公告)日：1997-11-25

申请号：US719011

申请日：1996-09-24

申请人： Katsuya Takemura ,  Junji Tsuchiya ,  Osamu Watanabe ,  Toshinobu Ishihara

发明人： Katsuya Takemura ,  Junji Tsuchiya ,  Osamu Watanabe ,  Toshinobu Ishihara

IPC分类号： G03F7/004 ,  C08G77/14 ,  C08G77/22 ,  C08G77/38 ,  C09D5/25 ,  C09D183/06 ,  G03F7/029 ,  G03F7/039 ,  G03F7/075 ,  G03F7/30 ,  H01L21/027 ,  C08J3/28

CPC分类号： G03F7/075 ,  C08G77/38 ,  C09D183/06

摘要： The invention provides a novel polysiloxane compound, typically polyhydroxybenzylsilsesquioxane, having some hydroxyl groups replaced by acetal groups and optionally acid labile groups. The polysiloxane compound is useful as an alkali soluble polymer for positive resist material.

摘要翻译： 本发明提供了一种新的聚硅氧烷化合物，典型的是多羟基苄基倍半硅氧烷，其中一些羟基被缩醛基团和任选的酸不稳定基团取代。 聚硅氧烷化合物可用作正性抗蚀剂材料的碱溶性聚合物。

公开(公告)号：US5258537A

公开(公告)日：1993-11-02

申请号：US16289

申请日：1993-02-11

申请人： Masaki Takeuchi ,  Toshinobu Ishihara ,  Tohru Kubota ,  Mikio Endo

发明人： Masaki Takeuchi ,  Toshinobu Ishihara ,  Tohru Kubota ,  Mikio Endo

IPC分类号： B01J31/02 ,  C07B61/00 ,  C07F7/12 ,  C07F7/08

CPC分类号： C07F7/123

摘要： An organodisiloxane represented by the general formula: R.sup.1 R.sup.2 R.sup.3 SiOSiR.sup.4 R.sup.5 R.sup.6 is reacted with thionyl chloride in the presence of an ammonium salt represented by the general formula: R.sup.7 R.sup.8 R.sup.9 R.sup.10 NX wherein R.sup.1 to R.sup.5 and R.sup.10 may be the same or different and each represents a monovalent hydrocarbon group or a hydrogen atom; R.sup.7 to R.sup.9 may be the same or different and each represents a monovalent hydrocarbon group; and X represents a monovalent anion. Thus, organomonochlorosilanes represented by R.sup.1 R.sup.2 R.sup.3 SiCl and R.sup.4 R.sup.5 R.sup.6 SiCl can be obtained.