公开(公告)号：US07912679B2

公开(公告)日：2011-03-22

申请号：US11858882

申请日：2007-09-20

申请人： Shifang Li ,  Hanyou Chu

发明人： Shifang Li ,  Hanyou Chu

IPC分类号： G06F19/00 ,  G06F17/40

CPC分类号： H01L22/12 ,  G03F7/705 ,  G03F7/70625

摘要： An optical metrology model is created for a structure formed on a semiconductor wafer. The optical metrology model comprises one or more profile parameters, one or more process parameters, and dispersion. A dispersion function is obtained that relates the dispersion to at least one of the one or more process parameters. A simulated diffraction signal is generated using the optical metrology model and a value for the at least one of the process parameters and a value for the dispersion. The value for the dispersion is calculated using the value for the at least one of the process parameter and the dispersion function. A measured diffraction signal of the structure is obtained. The measured diffraction signal is compared to the simulated diffraction signal. One or more profile parameters of the structure and one or more process parameters are determined based on the comparison of the measured diffraction signal to the simulated diffraction signal.

摘要翻译： 为在半导体晶片上形成的结构创建光学计量模型。 光学测量模型包括一个或多个轮廓参数，一个或多个过程参数和色散。 获得将色散与一个或多个工艺参数中的至少一个相关联的色散函数。 使用光学测量模型生成模拟衍射信号，并且生成至少一个工艺参数的值和色散值。 使用过程参数和色散函数中的至少一个的值来计算色散的值。 获得该结构的测量衍射信号。 将测得的衍射信号与模拟衍射信号进行比较。 基于测量的衍射信号与模拟衍射信号的比较来确定结构的一个或多个轮廓参数和一个或多个过程参数。

公开(公告)号：US07522294B2

公开(公告)日：2009-04-21

申请号：US12026485

申请日：2008-02-05

申请人： Hanyou Chu ,  Vi Vuong ,  Yan Chen

发明人： Hanyou Chu ,  Vi Vuong ,  Yan Chen

IPC分类号： G06F19/00 ,  H01L21/66

CPC分类号： H01L22/20

摘要： To measure a process parameter of a semiconductor fabrication process, the fabrication process is performed on a first area using a first value of the process parameter. The fabrication process is performed on a second area using a second value of the process parameter. A first measurement of the first area is obtained using an optical metrology tool. A second measurement of the second area is obtained using the optical metrology tool. One or more optical properties of the first area are determined based on the first measurement. One or more optical properties of the second area are determined based on the second measurement. The fabrication process is performed on a third area. A third measurement of the third area is obtained using the optical metrology tool. A third value of the process parameter is determined based on the third measurement and a relationship between the determined optical properties of the first and second areas.

摘要翻译： 为了测量半导体制造工艺的工艺参数，使用工艺参数的第一值在第一区域上执行制造工艺。 使用过程参数的第二值在第二区域上执行制造过程。 使用光学测量工具获得第一区域的第一测量。 使用光学测量工具获得第二区域的第二测量。 基于第一测量确定第一区域的一个或多个光学性质。 基于第二测量来确定第二区域的一个或多个光学特性。 制造工艺在第三区域进行。 使用光学测量工具获得第三个区域的第三个测量值。 基于第三测量和所确定的第一和第二区域的光学特性之间的关系确定过程参数的第三值。

公开(公告)号：US06919964B2

公开(公告)日：2005-07-19

申请号：US10345814

申请日：2003-01-16

申请人： Hanyou Chu

发明人： Hanyou Chu

IPC分类号： G03F7/20 ,  G01B11/00

CPC分类号： G03F7/70625

摘要： A method for modeling diffraction includes constructing a theoretical model of the subject. A numerical method is then used to predict the output field that is created when an incident field is diffracted by the subject. The numerical method begins by computing the output field at the upper boundary of the substrate and then iterates upward through each of the subject's layers. Structurally simple layers are evaluated directly. More complex layers are discretized into slices. A finite difference scheme is performed for these layers using a recursive expansion of the field-current ratio that starts (or has a base case) at the lowermost slice. The combined evaluation, through all layers, creates a scattering matrix that is evaluated to determine the output field for the subject.

公开(公告)号：US08670948B2

公开(公告)日：2014-03-11

申请号：US13656487

申请日：2012-10-19

申请人： Hanyou Chu ,  Peilin Jiang

发明人： Hanyou Chu ,  Peilin Jiang

IPC分类号： G01N37/00

CPC分类号： G01N21/00 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/4788 ,  G01N21/9501 ,  G03F7/705 ,  G03F7/70625

摘要： Provided are techniques for numerically integrating an intensity distribution function over a numerical aperture in a manner dependent on a determination of whether the numerical aperture spans a Rayleigh singularity. Where a singularity exists, Gaussian quadrature (cubature) is performed using a set of weights and points (nodes) that account for the effect of the Wood anomaly present within the aperture space. The numerical aperture may be divided into subregions separated by curves where the Wood anomaly condition is satisfied. Each subregion is then numerically integrated and a weighted sum of the subregion contributions is the estimate of the integral. Alternatively, generalized Gaussian quadrature (cubature) is performed where an analytical polynomial function which accounts for the effect of the Wood anomaly present within the aperture space is integrated. Points and nodes generated from a fit of the analytical polynomial function are then used for integration of the intensity distribution function.

摘要翻译： 提供了用于以取决于数值孔径是否跨越瑞利奇点的确定的方式将数值孔径上的强度分布函数数值积分的技术。 在存在奇异点的情况下，使用一组权重和点（节点）来执行高斯正交（立方体），这些权重和点（节点）表示存在于孔径空间内的木材异常的影响。 数值孔径可以分为由木材异常条件满足的曲线分开的子区域。 然后每个次区域数值整合，次区域会费的加权和是积分的估计。 或者，执行广义高斯正交（立方体），其中综合考虑了在孔隙空间内存在木材异常的影响的分析多项式函数。 然后将从分析多项式函数的拟合生成的点和节点用于强度分布函数的积分。

公开(公告)号：US20100042388A1

公开(公告)日：2010-02-18

申请号：US12193341

申请日：2008-08-18

申请人： Joerg Bischoff ,  Shifang Li ,  Weidong Yang ,  Hanyou Chu

发明人： Joerg Bischoff ,  Shifang Li ,  Weidong Yang ,  Hanyou Chu

IPC分类号： G06G7/62

CPC分类号： G06E1/00

摘要： A method for improving computation efficiency for diffraction signals in optical metrology is described. The method includes simulating a set of diffraction orders for a three-dimensional structure. The diffraction orders within the set of diffraction orders are then prioritized. The set of diffraction orders is truncated to provide a truncated set of diffraction orders based on the prioritizing. Finally, a simulated spectrum is provided based on the truncated set of diffraction orders.

摘要翻译： 描述了一种提高光学测量中衍射信号的计算效率的方法。 该方法包括模拟一组三维结构的衍射级数。 然后优先考虑该组衍射级中的衍射级。 衍射级的集合被截断以提供基于优先级的截断的衍射级集合。 最后，基于截断的衍射级组提供了一个模拟光谱。

公开(公告)号：US07636649B2

公开(公告)日：2009-12-22

申请号：US11859669

申请日：2007-09-21

申请人： Shifang Li ,  Hanyou Chu ,  Manuel Madriaga

发明人： Shifang Li ,  Hanyou Chu ,  Manuel Madriaga

IPC分类号： G05B17/00 ,  G06F19/00 ,  G06F17/40

CPC分类号： G01B11/0625 ,  H01L22/12

摘要： An optical metrology model for the structure is obtained. The optical metrology model comprising one or more profile parameters, one or more process parameters, and a dispersion. A dispersion function that relates the dispersion to at least one of the one or more process parameters is obtained. A simulated diffraction signal is generated using the optical metrology model and a value for the at least one of the process parameters and a value for the dispersion. The value for the dispersion is calculated using the value for the at least one of the process parameter and the dispersion function. A measured diffraction signal of the structure is obtained using an optical metrology tool. The measured diffraction signal is compared to the simulated diffraction signal to determine one or more profile parameters of the structure. The fabrication tool is controlled based on the determined one or more profile parameters of the structure.

摘要翻译： 获得了该结构的光学计量学模型。 光学测量模型包括一个或多个轮廓参数，一个或多个过程参数和分散体。 获得将色散与一个或多个工艺参数中的至少一个相关联的色散函数。 使用光学测量模型生成模拟衍射信号，并且生成至少一个工艺参数的值和色散值。 使用过程参数和色散函数中的至少一个的值来计算色散的值。 使用光学测量工具获得该结构的测量的衍射信号。 将测量的衍射信号与模拟的衍射信号进行比较，以确定结构的一个或多个轮廓参数。 基于确定的结构的一个或多个轮廓参数来控制制造工具。

公开(公告)号：US07106459B2

公开(公告)日：2006-09-12

申请号：US11150003

申请日：2005-06-10

申请人： Hanyou Chu

发明人： Hanyou Chu

IPC分类号： G01B11/00

CPC分类号： G03F7/70625

摘要： A method for modeling diffraction includes constructing a theoretical model of the subject. A numerical method is then used to predict the output field that is created when an incident field is diffracted by the subject. The numerical method begins by computing the output field at the upper boundary of the substrate and then iterates upward through each of the subject's layers. Structurally simple layers are evaluated directly. More complex layers are discretized into slices. A finite difference scheme is performed for these layers using a recursive expansion of the field-current ratio that starts (or has a base case) at the lowermost slice. The combined evaluation, through all layers, creates a scattering matrix that is evaluated to determine the output field for the subject.

摘要翻译： 用于建模衍射的方法包括构建主体的理论模型。 然后使用数字方法来预测当事件场被对象衍射时创建的输出字段。 数值方法通过计算衬底上边界处的输出场开始，然后向上遍历每个受试者的层。 直接对结构简单的层进行评估。 更复杂的层被离散成切片。 使用在最下面的切片处开始（或具有基本情况）的场电流比率的递归展开，对这些层执行有限差分方案。 通过所有层的组合评估创建了一个散射矩阵，该散射矩阵被评估以确定主体的输出场。

公开(公告)号：US20050231737A1

公开(公告)日：2005-10-20

申请号：US11150003

申请日：2005-06-10

申请人： Hanyou Chu

发明人： Hanyou Chu

IPC分类号： G03F7/20 ,  G01B11/14

CPC分类号： G03F7/70625

摘要： A method for modeling diffraction includes constructing a theoretical model of the subject. A numerical method is then used to predict the output field that is created when an incident field is diffracted by the subject. The numerical method begins by computing the output field at the upper boundary of the substrate and then iterates upward through each of the subject's layers. Structurally simple layers are evaluated directly. More complex layers are discretized into slices. A finite difference scheme is performed for these layers using a recursive expansion of the field-current ratio that starts (or has a base case) at the lowermost slice. The combined evaluation, through all layers, creates a scattering matrix that is evaluated to determine the output field for the subject.

摘要翻译： 用于建模衍射的方法包括构建主体的理论模型。 然后使用数字方法来预测当事件场被对象衍射时创建的输出字段。 数值方法通过计算衬底上边界处的输出场开始，然后向上遍历每个受试者的层。 直接对结构简单的层进行评估。 更复杂的层被离散成切片。 使用在最下面的切片处开始（或具有基本情况）的场电流比率的递归展开，对这些层执行有限差分方案。 通过所有层的组合评估创建了一个散射矩阵，该散射矩阵被评估以确定主体的输出场。