摘要:
A method for improving computation efficiency for diffraction signals in optical metrology is described. The method includes simulating a set of diffraction orders for a three-dimensional structure. The diffraction orders within the set of diffraction orders are then prioritized. The set of diffraction orders is truncated to provide a truncated set of diffraction orders based on the prioritizing. Finally, a simulated spectrum is provided based on the truncated set of diffraction orders.
摘要:
A method for improving computation efficiency for diffraction signals in optical metrology is described. The method includes simulating a set of diffraction orders for a three-dimensional structure. The diffraction orders within the set of diffraction orders are then prioritized. The set of diffraction orders is truncated to provide a truncated set of diffraction orders based on the prioritizing. Finally, a simulated spectrum is provided based on the truncated set of diffraction orders.
摘要:
Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model including a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A measured diffraction signal adjusted by the simulated approximation diffraction signal is input into the trained machine learning system and generates the corresponding profile parameters.
摘要:
Systems and techniques are described for scheduling communication by half-duplex devices. One or more half-duplex devices informs a base station that it is capable only of half-duplex operation. For each such device, the base station configures a transmit/receive pattern comprising sequences of uplink and downlink subframes and applies the pattern to the device. The half-duplex device may receive during a downlink subframe and may transmit during an uplink subframe. Uplink and downlink subframes within a pattern are separated by an offset based at least in part on a number of hybrid automatic repeat request processes.
摘要:
A method and system for interference reduction for telecommunication systems are disclosed. The system comprises a base station control device (BCD) for configuring one or more parameters for operating one or more base stations (BSs), a first BS covering a first cell having one or more mobile terminals therein, a second BS covering a second cell neighboring to the first cell and sharing a predetermined frequency band with the first cell, wherein one or more radio frames constructed for communications between the first BS and any mobile terminal of the first cell and one or more radio frames constructed for communications between the second BS and any mobile terminal of the second cell are distinguishable by defining different channel configuration sets having one or more operation parameters, wherein the parameters includes a training sequence, a spreading code, and a channel observation window position.
摘要:
Methods of determining a material optical property for optical metrology of a structure is described. One method includes simulating a set of diffraction orders for a grating structure based on two or more azimuth angles and on one or more angles of incidence. A simulated spectrum is provided based on the set of diffraction orders. Another method includes simulating a set of diffraction orders for a grating structure based on two or more angles of incidence. A simulated spectrum is provided based on the set of diffraction orders.
摘要:
A tent is provided. The tent includes a tarp having a plurality of walls and a platform oriented substantially perpendicularly to at least one of the walls. At least a portion of the platform is coupled to the tarp.
摘要:
A method and system for reducing interference in a wireless communication network is disclosed. The wireless communication network has at least one base station using an antenna array and one or more code channels to receive or transmit one or more communication signals from or to a plurality of terminals used by one or more users. A signal received by the antenna array carries one or more training sequences and a traffic signal in a frame. After estimating a spatial signature and joint channel response model per user based on the training sequences, one or more spatial weights are found based on the estimated spatial signature and joint channel response model to maximize a signal to noise ratio. A joint detection matrix is then formed based on the estimated spatial weights, the joint channel response model, and a user code channel assignment. After code correlating a traffic signal to obtain one or more user specific multi-antenna signals, a spatial combining is performed on one or more multi-antenna signals associated with each user to generate scalar symbol estimates. Thereafter, a joint detection is done based on the scalar symbol estimates using the joint detection matrix. Similar techniques can be used for downlink communications.
摘要:
A diffraction based overlay metrology system produces the overlay error independent of effects caused by local process variations. Generally, overlay patterns include process variations that provide spectral contributions, along with the overlay shift, to the measured overlay error. The contributions from process variations are removed from the determined overlay error. In one embodiment, the local process variations are removed by measuring the overlay pattern before and after the top diffraction gratings are formed. A plurality of differential spectra from the measurement locations of the completed overlay pattern can then be used with a plurality of ratios of differential spectra from measurement locations of the incomplete overlay pattern can then be used to determine the overlay error by either direct calculation or by fitting techniques. In another embodiment, the local process variations are removed with no premeasurement but with careful construction of the overlay patterns.