公开(公告)号：US07569323B2

公开(公告)日：2009-08-04

申请号：US11492957

申请日：2006-07-26

申请人： Jun Hatakeyama ,  Yuji Harada ,  Yoshio Kawai ,  Masayuki Endo ,  Masaru Sasago ,  Haruhiko Komoriya ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kazuhiko Maeda

发明人： Jun Hatakeyama ,  Yuji Harada ,  Yoshio Kawai ,  Masayuki Endo ,  Masaru Sasago ,  Haruhiko Komoriya ,  Michitaka Ootani ,  Satoru Miyazawa ,  Kazuhiko Maeda

IPC分类号： G03F7/30

CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.

摘要翻译： 提供抗蚀剂保护涂层材料，其包含具有环状全氟烷基的α-三氟甲基丙烯酸/降冰片烯共聚物作为侧基。 在图案形成过程中，材料在抗蚀剂膜上形成保护性涂层，其是不溶于水的，可溶于碱性显影剂中并且与抗蚀剂膜不混溶，从而有​​效地实施浸渍光刻。

公开(公告)号：US07666967B2

公开(公告)日：2010-02-23

申请号：US11606069

申请日：2006-11-30

申请人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

发明人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

IPC分类号： C08F214/18

CPC分类号： C07D307/93 ,  C07D409/12 ,  G03F7/0046 ,  G03F7/0397

摘要： A polymer comprising recurring units (2) obtained through polymerization of an ester compound of formula (1) is used to form a resist composition. R1 is F or C1-C6 fluoroalkyl, R2 is H or C1-C8 alkyl, R3 is O or C1-C6 alkylene, R4 and R5 each are H or C1-C10 alkyl or fluoroalkyl, and R6 is H or an acid labile group. The resist composition, when processed by ArF lithography, has advantages including improved resolution, transparency, minimal line edge roughness, and etch resistance. The resist composition exhibits better performance when processed by ArF immersion lithography with liquid interposed between a projection lens and a wafer.

摘要翻译： 使用包含通过聚合式（1）的酯化合物获得的重复单元（2）的聚合物来形成抗蚀剂组合物。 R 1是F或C 1 -C 6氟代烷基，R 2是H或C 1 -C 8烷基，R 3是O或C 1 -C 6亚烷基，R 4和R 5各自是H或C 1 -C 10烷基或氟代烷基，R 6是H或酸不稳定基团 。 当通过ArF光刻处理时，抗蚀剂组合物具有改进的分辨率，透明度，最小的线边缘粗糙度和耐蚀刻性的优点。 当通过ArF浸没式光刻法处理介于投影透镜和晶片之间的液体时，抗蚀剂组合物表现出更好的性能。

公开(公告)号：US07488567B2

公开(公告)日：2009-02-10

申请号：US11440126

申请日：2006-05-25

申请人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

发明人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： A polymer comprising recurring units of formula (1) wherein R1 is F or fluoroalkyl, R2 is alkylene or fluoroalkylene, and R3 is an acid labile group and having a Mw of 1,000-500,000 is used to formulate a resist composition, which is processed by the lithography involving ArF exposure and offers many advantages including resolution, minimal line edge roughness, etch resistance, and minimal surface roughness after etching. The composition performs well when processed by the ArF immersion lithography with liquid interposed between the projection lens and the wafer.

摘要翻译： 一种包含式（1）的重复单元的聚合物，其中R1是F或氟代烷基，R2是亚烷基或氟代亚烷基，R3是酸不稳定基团，Mw为1,000-500,000，用于配制抗蚀剂组合物， 涉及ArF曝光的光刻技术提供许多优点，包括分辨率，最小线边缘粗糙度，耐蚀刻性和蚀刻后的最小表面粗糙度。 当通过ArF浸没式光刻法处理介于投影透镜和晶片之间的液体时，组合物表现良好。

公开(公告)号：US20070128555A1

公开(公告)日：2007-06-07

申请号：US11606069

申请日：2006-11-30

申请人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

发明人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

IPC分类号： C08L31/00 ,  G03C5/00 ,  C07D307/94

CPC分类号： C07D307/93 ,  C07D409/12 ,  G03F7/0046 ,  G03F7/0397

摘要： A polymer comprising recurring units (2) obtained through polymerization of an ester compound of formula (1) is used to form a resist composition. R1 is F or C1-C6 fluoroalkyl, R2 is H or C1-C8 alkyl, R3 is O or C1-C6 alkylene, R4 and R5 each are H or C1-C10 alkyl or fluoroalkyl, and R6 is H or an acid labile group. The resist composition, when processed by ArF lithography, has advantages including improved resolution, transparency, minimal line edge roughness, and etch resistance. The resist composition exhibits better performance when processed by ArF immersion lithography with liquid interposed between a projection lens and a wafer.

摘要翻译： 使用包含通过聚合式（1）的酯化合物获得的重复单元（2）的聚合物来形成抗蚀剂组合物。 R 1是F或C 1 -C 6氟代烷基，R 2是H或C 1 C 3 -C 8烷基，R 3是O或C 1 -C 6亚烷基，R 4和5以及R 5各自为H或C 1 -C 10烷基或氟代烷基，R“ 6是H或酸不稳定基团。 当通过ArF光刻处理时，抗蚀剂组合物具有改进的分辨率，透明度，最小的线边缘粗糙度和耐蚀刻性的优点。 当通过ArF浸没式光刻法处理介于投影透镜和晶片之间的液体时，抗蚀剂组合物表现出更好的性能。

公开(公告)号：US07378218B2

公开(公告)日：2008-05-27

申请号：US11345325

申请日：2006-02-02

申请人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

发明人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

IPC分类号： G03F7/004 ,  G03F7/32

CPC分类号： G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/26 ,  C08F220/28 ,  C08F232/08 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0

摘要翻译： 提供了包含式（1a）至（1d）的重复单元并且Mw为1,000-500,000的含氟聚合物。 R 1是酸不稳定基团，R 2是单键或亚甲基，a1，a2，a3和a4是大于0至小于1的数， 并且0

公开(公告)号：US20060269871A1

公开(公告)日：2006-11-30

申请号：US11440126

申请日：2006-05-25

申请人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

发明人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

IPC分类号： G03C1/00

CPC分类号： G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： A polymer comprising recurring units of formula (1) wherein R1 is F or fluoroalkyl, R2 is alkylene or fluoroalkylene, and R3 is an acid labile group and having a Mw of 1,000-500,000 is used to formulate a resist composition, which is processed by the lithography involving ArF exposure and offers many advantages including resolution, minimal line edge roughness, etch resistance, and minimal surface roughness after etching. The composition performs well when processed by the ArF immersion lithography with liquid interposed between the projection lens and the wafer.

摘要翻译： 包含式（1）的重复单元的聚合物，其中R 1是F或氟代烷基，R 2是亚烷基或氟代亚烷基，R 3是 使用Mw为1,000-500,000的酸不稳定基团来配制抗蚀剂组合物，其通过涉及ArF曝光的光刻进行处理，并提供许多优点，包括分辨率，最小线边缘粗糙度，耐蚀刻性和蚀刻后的最小表面粗糙度 。 当通过ArF浸没式光刻法处理介于投影透镜和晶片之间的液体时，组合物表现良好。

公开(公告)号：US20060177765A1

公开(公告)日：2006-08-10

申请号：US11345325

申请日：2006-02-02

申请人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

发明人： Yuji Harada ,  Jun Hatakeyama ,  Yoshio Kawai ,  Masaru Sasago ,  Masayuki Endo ,  Kazuhiko Maeda ,  Haruhiko Komoriya ,  Michitaka Ootani

IPC分类号： G03C1/76

CPC分类号： G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/26 ,  C08F220/28 ,  C08F232/08 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0

摘要翻译： 提供了包含式（1a）至（1d）的重复单元并且Mw为1,000-500,000的含氟聚合物。 R 1是酸不稳定基团，R 2是单键或亚甲基，a1，a2，a3和a4是大于0至小于1的数， 并且0

公开(公告)号：US07166418B2

公开(公告)日：2007-01-23

申请号：US10932316

申请日：2004-09-02

申请人： Shinji Kishimura ,  Masayuki Endo ,  Masaru Sasago ,  Mitsuru Ueda ,  Hirokazu Imori ,  Toshiaki Fukuhara

发明人： Shinji Kishimura ,  Masayuki Endo ,  Masaru Sasago ,  Mitsuru Ueda ,  Hirokazu Imori ,  Toshiaki Fukuhara

IPC分类号： G03F7/30

CPC分类号： C08F220/18 ,  C08F212/02 ,  C08F228/02 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/108 ,  Y10S430/111

摘要： A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3: wherein R1, R2 and R3 are the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; and R5 and R6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group, a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid.

公开(公告)号：US20050074693A1

公开(公告)日：2005-04-07

申请号：US10954373

申请日：2004-10-01

申请人： Shinji Kishimura ,  Masayuki Endo ,  Masaru Sasago ,  Mitsuru Ueda ,  Hirokazu Imori ,  Toshiaki Fukuhara

发明人： Shinji Kishimura ,  Masayuki Endo ,  Masaru Sasago ,  Mitsuru Ueda ,  Hirokazu Imori ,  Toshiaki Fukuhara

IPC分类号： C08F12/20 ,  C08G75/30 ,  G03C1/492 ,  G03F7/004 ,  G03F7/039 ,  G03F7/04 ,  G03F7/20

CPC分类号： G03F7/0046 ,  C08F12/20 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

摘要： The base polymer of a resist material contains a polymer compound including a first unit represented by a general formula of the following Chemical Formula 5 and a second unit represented by a general formula of the following Chemical Formula 6: wherein R1, R2, R3, R7, R8 and R9 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5, R6 and R11 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; R12 is a fluorine atom, or a straight-chain fluoridated alkyl group or a branched or cyclic fluoridated alkyl group with a carbon number not less than 1 and not more than 20; 0

摘要翻译： 抗蚀剂材料的基础聚合物含有包含由以下化学式5的通式表示的第一单元和由以下化学式6的通式表示的第二单元的聚合物化合物：其中R 1， R 2，R 3，R 7，R 8和R 9相同或不同，为氢原子，氟原子或直链烷基，支链或环状烷基 基团或碳数不小于1且不大于20的氟化烷基; R 4是直链亚烷基或碳数不小于0且不大于20的支链或环状亚烷基; R 5，R 6和R 11相同或不同，为氢原子，直链烷基，支链或环状烷基或碳数不少于的氟化烷基 1，不大于20，或被酸释放的保护基; R 12为碳原子数为1以上且20以下的氟原子或直链氟化烷基或支链或环状氟化烷基， 0

公开(公告)号：US06830869B2

公开(公告)日：2004-12-14

申请号：US10415434

申请日：2003-04-29

申请人： Shinji Kishimura ,  Masayuki Endo ,  Masaru Sasago ,  Mitsuru Ueda ,  Tsuyohiko Fujigaya

发明人： Shinji Kishimura ,  Masayuki Endo ,  Masaru Sasago ,  Mitsuru Ueda ,  Tsuyohiko Fujigaya

IPC分类号： G03F7004

CPC分类号： G03F7/0046 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： A pattern formation material of this invention contains a base polymer including a first unit represented by Chemical Formula 1 and a second unit represented by Chemical Formula 2 and, and an acid generator: wherein R1 and R3 are the same or different and are a hydrogen atom, a chlorine atom, a fluorine atom, an alkyl group or an alkyl group including a fluorine atom; R2 is an atom or a group that is not released by an acid and is selected from the group consisting of a hydrogen atom, an alkyl group, a cyclic aliphatic group, an aromatic group, a heterocycle, an ester group and an ether group; R4 is a protecting group released by an acid; m is an integer of 0 through 5; and a and b satisfy 0

摘要翻译： 本发明的图案形成材料含有包含由化学式1表示的第一单元和由化学式2表示的第二单元的基础聚合物和酸产生剂：其中R1和R3相同或不同，为氢原子 氯原子，氟原子，烷基或含有氟原子的烷基; R2是不被酸释放并选自氢原子，烷基，环脂族基，芳基，杂环，酯基和醚基的原子或基团; R4是由酸释放的保护基; m为0〜5的整数。 a和b满足0