摘要:
Disclosed is a method for detaching cultured cells that can selectively detach cultured adhered cells. The scaffold to which the cells adhere is configured from at least a cell adhesion factor containing carbon nanotubes, and by means of radiating laser light in a spot shape on the scaffold in a region where cells are adhered, a shock wave is generated by the heat arising by means of the photothermal conversion of the carbon nanotubes, and by means of this shock wave, the cells are caused to be in a non-adhered state.
摘要:
A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and, and an acid generator:Chemical Formula 1: wherein R1 is a hydrogen atom, a chlorine atom, a fluorine atom, an alkyl group or an alkyl group including a fluorine atom; and R2 is a protecting group released by an acid.
摘要翻译:本发明的图案形成材料含有包含由化学式1表示的单元的基础聚合物和酸产生剂:化学式1:其中R 1是氢原子,氯原子, 氟原子,烷基或含氟原子的烷基; R 2是由酸释放的保护基。
摘要:
Disclosed is a method for detaching cultured cells that can selectively detach cultured adhered cells. The scaffold to which the cells adhere is configured from at least a cell adhesion factor containing carbon nanotubes, and by means of radiating laser light in a spot shape on the scaffold in a region where cells are adhered, a shock wave is generated by the heat arising by means of the photothermal conversion of the carbon nanotubes, and by means of this shock wave, the cells are caused to be in a non-adhered state.
摘要:
A pattern formation material of this invention contains a base polymer including a first unit represented by Chemical Formula 1 and a second unit represented by Chemical Formula 2 and, and an acid generator: wherein R1 and R3 are the same or different and are a hydrogen atom, a chlorine atom, a fluorine atom, an alkyl group or an alkyl group including a fluorine atom; R2 is an atom or a group that is not released by an acid and is selected from the group consisting of a hydrogen atom, an alkyl group, a cyclic aliphatic group, an aromatic group, a heterocycle, an ester group and an ether group; R4 is a protecting group released by an acid; m is an integer of 0 through 5; and a and b satisfy 0
摘要:
A pattern formation material of this invention contains a base polymer including a first unit represented by Chemical Formula 1 and a second unit represented by Chemical Formula 2, and an acid generator: wherein R1 and R2 are the same or different and selected from the group consisting of a hydrogen atom, a chlorine atom, a fluorine atom, an alkyl group and an alkyl group including a fluorine atom; R3 is a protecting group released by an acid; m is an integer of 0 through 5; and a and b satisfy 0