公开(公告)号：US20060013988A1

公开(公告)日：2006-01-19

申请号：US11158079

申请日：2005-06-22

申请人： Yuuki Tauchi ,  Junichi Nakai ,  Katsutoshi Takagi

发明人： Yuuki Tauchi ,  Junichi Nakai ,  Katsutoshi Takagi

IPC分类号： B32B3/02

CPC分类号： C23C14/3414 ,  C23C14/185 ,  G11B7/00736 ,  G11B7/258 ,  G11B7/259 ,  Y10T428/21

摘要： A Ag alloy reflective film for an optical information recording medium contains Ag as a main component, and at least one selected from Nd, Sn, Gd and In in a total amount of more than 3.0 atomic percent and less than or equal to 10 atomic percent. The reflective film can further contain 0.01 to 3 atomic percent of at least one of Bi and Sb, and/or can further contain comprising 20 atomic percent or less of at least one of Mn, Cu, La and Zn. An optical information recording medium includes the Ag alloy reflective film and can be subjected to laser marking. A Ag alloy sputtering target has a similar composition to that of the Ag alloy reflective film.

摘要翻译： 用于光学信息记录介质的Ag合金反射膜包含Ag作为主要成分，并且选自Nd，Sn，Gd和In中的至少一种总量大于3.0原子％且小于或等于10原子％ 。 反射膜还可以含有0.01〜3原子％的Bi和Sb中的至少一种，和/或可以进一步含有包含20原子％以下的Mn，Cu，La和Zn中的至少一种。 光学信息记录介质包括Ag合金反射膜，并可进行激光打标。 Ag合金溅射靶具有与Ag合金反射膜相似的组成。

公开(公告)号：US20050238839A1

公开(公告)日：2005-10-27

申请号：US11103615

申请日：2005-04-12

申请人： Katsutoshi Takagi ,  Junichi Nakai ,  Yuuki Tauchi

发明人： Katsutoshi Takagi ,  Junichi Nakai ,  Yuuki Tauchi

IPC分类号： C22C5/06 ,  C23C14/14 ,  G11B7/253 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/258 ,  G11B7/259 ,  B32B3/02

CPC分类号： G11B7/258 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/259 ,  Y10T428/21

摘要： The present invention has been completed in view of such situation, and an object of the present invention is to find a Ag based alloy which exhibits high cohesion resistance, high light resistance, high heat resistance, high reflectivity, high transmissivity, low absorptivity, and high thermal conductivity of the level which had not been realized by the pure Ag or by the conventional Ag alloys, and on the bases of such alloy, to provide a semi-reflective film and a reflective film for an optical information recording medium provided with excellent writing/reading properties and long term reliability; sputtering target for an optical information recording medium used in depositing such semi-reflective film and the reflective film; and an optical information recording medium provided with such semi-reflective film or the reflective film. A semi-reflective film or reflective film for an optical information recording medium comprising a Ag based alloy, wherein the Ag based alloy comprises 0.005 to 0.40% (at % unless otherwise noted) of Bi and 0.05 to 5% in total of at least one element selected from Zn, Al, Ga, In, Si, Ge, and Sn.

摘要翻译： 发明内容本发明是鉴于这种情况而完成的，其目的在于找到具有高内聚力，高耐光性，高耐热性，高反射率，高透射率，低吸收率的Ag系合金，以及 通过纯Ag或常规Ag合金未实现的水平的高导热性，并且在这种合金的基础上，提供半反射膜和用于光学信息记录介质的反射膜，其提供优异的光学信息记录介质 写/读性能和长期可靠性; 用于沉积这种半反射膜和反射膜的光学信息记录介质的溅射靶; 以及设置有这种半反射膜或反射膜的光学信息记录介质。 一种用于光学信息记录介质的半反射膜或反射膜，其包括Ag基合金，其中所述Ag基合金包含Bi的0.005至0.40％（除非另有说明）为0.005至0.40％，并且总共为至少一种为0.05至5％ 元素选自Zn，Al，Ga，In，Si，Ge和Sn。

公开(公告)号：US07695790B2

公开(公告)日：2010-04-13

申请号：US11158079

申请日：2005-06-22

申请人： Yuuki Tauchi ,  Junichi Nakai ,  Katsutoshi Takagi

发明人： Yuuki Tauchi ,  Junichi Nakai ,  Katsutoshi Takagi

IPC分类号： B32B3/02

CPC分类号： C23C14/3414 ,  C23C14/185 ,  G11B7/00736 ,  G11B7/258 ,  G11B7/259 ,  Y10T428/21

摘要： A Ag alloy reflective film for an optical information recording medium contains Ag as a main component, and at least one selected from Nd, Sn, Gd and In in a total amount of more than 3.0 atomic percent and less than or equal to 10 atomic percent. The reflective film can further contain 0.01 to 3 atomic percent of at least one of Bi and Sb, and/or can further contain comprising 20 atomic percent or less of at least one of Mn, Cu, La and Zn. An optical information recording medium includes the Ag alloy reflective film and can be subjected to laser marking. A Ag alloy sputtering target has a similar composition to that of the Ag alloy reflective film.

摘要翻译： 用于光学信息记录介质的Ag合金反射膜包含Ag作为主要成分，并且选自Nd，Sn，Gd和In中的至少一种总量大于3.0原子％且小于或等于10原子％ 。 反射膜还可以含有0.01〜3原子％的Bi和Sb中的至少一种，和/或可以进一步含有包含20原子％以下的Mn，Cu，La和Zn中的至少一种。 光学信息记录介质包括Ag合金反射膜，并可进行激光打标。 Ag合金溅射靶具有与Ag合金反射膜相似的组成。

公开(公告)号：US20060169577A1

公开(公告)日：2006-08-03

申请号：US10564502

申请日：2004-07-14

申请人： Katsutoshi Takagi ,  Junichi Nakai ,  Yuuki Tauchi ,  Hitoshi Matsuzaki ,  Hideo Fujii

发明人： Katsutoshi Takagi ,  Junichi Nakai ,  Yuuki Tauchi ,  Hitoshi Matsuzaki ,  Hideo Fujii

IPC分类号： C23C14/00

CPC分类号： C22C5/06 ,  C22F1/14 ,  C23C14/3414

摘要： An Ag sputtering target 6 has three-dimensional fluctuation of grain sizes of not more than 18%. The fluctuation is determined by exposing plural sputtering surfaces by slicing the sputtering target 6 in planes to initial sputtering surface, selecting plural locations on each of the exposed sputtering surfaces, calculating values A1 and B1 using the formula below, and selecting larger one of the values A1 and B1 as the three-dimensional fluctuation of the grain sizes. A1=(Dmax−Dave)/Dave×100(%) B1=(Dave−Dmin)/Dave×100(%) Dmax: maximum value among the grain sizes D at all the selected locations Dmin: minimum value among the grain sizes D at all the selected locations Dave: average value of the grain sizes D at all the selected locations

摘要翻译： Ag溅射靶6具有不大于18％的晶粒尺寸的三维波动。 通过将溅射靶6在平面内切割成初始溅射表面，在每个暴露的溅射表面上选择多个位置，使用下面的公式计算值A1和B1，并且选择较大值之一来确定多个溅射表面的波动 A1和B1作为晶粒尺寸的三维波动。 <？in-line-formula description =“In-line Formulas”end =“lead”？> A1 =（D ave x100（％）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead “？”B1 =（D＆lt; ave＆lt; /＆gt; -D＆lt; min＆gt;）/ D大于x100（％）<？in-line-formula description = 所有选定位置的粒度D中的最大值D ：粒度范围内的最小值 D在所有选定位置D ：所有选定位置的粒度D的平均值

公开(公告)号：US20110165016A1

公开(公告)日：2011-07-07

申请号：US13062384

申请日：2009-09-03

申请人： Norihiro Jiko ,  Junichi Nakai ,  Yuuki Tauchi

发明人： Norihiro Jiko ,  Junichi Nakai ,  Yuuki Tauchi

IPC分类号： C22C21/00 ,  C23C14/34

CPC分类号： C23C14/205 ,  G11B7/2585

摘要： Provided is an Al-based alloy reflective film which reduces noise on an optical information recording medium by having a reflective film surface accurately reproduce grooves, pits and the like formed on a substrate, and has high reflectivity. A sputtering target which is effective for forming such a reflective film is also provided. The reflective film to be used for the optical information recording medium is substantially composed of an Al-based alloy containing 2.0-15.0 atm % of a rare-earth element, and has a crystallite size of 30 nm or smaller in the thickness direction of the reflective film.

摘要翻译： 提供一种铝基合金反射膜，其通过使反射膜表面精确地再现形成在基板上的凹槽，凹坑等，并且具有高反射率来降低光信息记录介质上的噪声。 还提供了对形成这种反射膜有效的溅射靶。 用于光学信息记录介质的反射膜基本上由含有2.0-15.0atm％的稀土元素的Al基合金构成，并且在厚度方向上的微晶尺寸为30nm以下 反光膜。

公开(公告)号：US20130233706A1

公开(公告)日：2013-09-12

申请号：US13878334

申请日：2011-10-05

申请人： Katsushi Matsumoto ,  Katsutoshi Takagi ,  Yuichi Taketomi ,  Junichi Nakai ,  Hidetada Makino ,  Toshiaki Takagi

发明人： Katsushi Matsumoto ,  Katsutoshi Takagi ,  Yuichi Taketomi ,  Junichi Nakai ,  Hidetada Makino ,  Toshiaki Takagi

IPC分类号： C23C14/34

CPC分类号： C23C14/3414 ,  B22F3/115 ,  B22F3/15 ,  B22F3/24 ,  C22C1/0416 ,  C22C21/00 ,  C22F1/04 ,  C23C16/45504 ,  C23C16/4585 ,  C23C16/4586

摘要： There is provided an Al-based alloy sputtering target, which can provide an enhanced deposition rate (or sputtering rate) when the sputtering target is used, and which can preferably prevent the occurrence of splashes. The Al-based alloy sputtering target of the present invention includes Ta and may preferably include an Al—Ta-based intermetallic compound containing Al and Ta, which compound has a mean particle diameter of from 0.005 μm to 1.0 μm and a mean interparticle distance of from 0.01 μm to 10.0 μm.

摘要翻译： 提供了一种Al系合金溅射靶，其可以在使用溅射靶时提供增强的沉积速率（或溅射速率），并且可以优选地防止飞溅的发生。 本发明的Al系合金溅射靶包括Ta，并且优选包括含有Al和Ta的Al-Ta系金属间化合物，该化合物的平均粒径为0.005〜1.0μm，平均粒子间距离为 从0.01毫米到10.0毫米。

公开(公告)号：US20100065425A1

公开(公告)日：2010-03-18

申请号：US12625022

申请日：2009-11-24

申请人： Hitoshi Matsuzaki ,  Katsutoshi Takagi ,  Junichi Nakai ,  Yasuo Nakane

发明人： Hitoshi Matsuzaki ,  Katsutoshi Takagi ,  Junichi Nakai ,  Yasuo Nakane

IPC分类号： C23C14/34 ,  C22F1/14

CPC分类号： C23C14/3414 ,  C22C5/06 ,  C22C5/08

摘要： A silver alloy sputtering target is provided which is useful in forming a thin silver-alloy film of a uniform thickness by the sputtering method. When crystal orientation strengths are determined at four arbitrary positions by the X-ray diffraction method, the orientation which exhibits the highest crystal orientation strength (Xa) is the same at the four measurement positions, and variations in strength ratio (Xb/Xa) between the highest crystal orientation strength (Xa) and the second highest crystal orientation strength (Xb) is 20% ore less.

摘要翻译： 提供了通过溅射法形成厚度均匀的薄银合金膜的银合金溅射靶。 当通过X射线衍射法在四个任意位置确定晶体取向强度时，在四个测量位置处具有最高晶体取向强度（Xa）的取向相同，并且强度比（Xb / Xa）在 最高的晶体取向强度（Xa）和第二高的晶体取向强度（Xb）为20％以下。

公开(公告)号：US20060091792A1

公开(公告)日：2006-05-04

申请号：US11235196

申请日：2005-09-27

申请人： Toshihiro Kugimiya ,  Katsufumi Tomihisa ,  Katsutoshi Takagi ,  Junichi Nakai

发明人： Toshihiro Kugimiya ,  Katsufumi Tomihisa ,  Katsutoshi Takagi ,  Junichi Nakai

IPC分类号： H01J1/62 ,  H01J63/04

CPC分类号： H01L23/53233 ,  C23C14/185 ,  G02F2001/136295 ,  H01J29/02 ,  H01J2211/225 ,  H01L27/124 ,  H01L2924/0002 ,  Y10T428/31678 ,  H01L2924/00

摘要： A Cu alloy thin film contains Fe and P with the balance being substantially Cu, in which the contents of Fe and P satisfy all the following conditions (1) to (3), and in which Fe2P is precipitated at grain boundaries of Cu after heat treatment at 200° C. to 500° C. for 1 to 120 minutes: 1.4NFe+8NP 1.0  (2) 12NFe+NP>0.5  (3) wherein NFe represents the content of Fe (atomic percent); and NP represents the content of P (atomic percent).

摘要翻译： Cu合金薄膜含有Fe和P，余量基本上为Cu，其中Fe和P的含量满足以下所有条件（1）至（3），其中Fe 2 P 在200℃至500℃热处理1〜120分钟后，在Cu的晶界处析出：<？在线公式描述=“在线公式”末端=“铅”→> 1.4N ＆lt;＆lt;＆lt;＆lt;＆lt;＆lt; 3＆gt;＆lt; 1.3（1）＆lt; -formulae description =“In-line Formulas”end =“lead”？> N＆lt;＆lt;＆lt;＆lt;＆lt; P＆lt; “In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> 12N + N > 0.5（3）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中N Fe表示Fe含量（原子百分数） ; N P表示P（原子百分比）的含量。

公开(公告)号：US07022384B2

公开(公告)日：2006-04-04

申请号：US10223368

申请日：2002-08-20

申请人： Hideo Fujii ,  Junichi Nakai ,  Takashi Onishi ,  Katsutoshi Takagi

发明人： Hideo Fujii ,  Junichi Nakai ,  Takashi Onishi ,  Katsutoshi Takagi

IPC分类号： C22C5/06

CPC分类号： G02B5/08 ,  G02F1/133553 ,  Y10T428/10 ,  Y10T428/1095

摘要： A reflective film used as a reflective electrode or a reflector, comprising an Ag-based alloy containing rare earth metals. The reflective film has high reflectivity and high durability.

摘要翻译： 用作反射电极或反射器的反射膜包括含有稀土金属的Ag基合金。 反射膜具有高反射率和高耐久性。

公开(公告)号：US06689444B2

公开(公告)日：2004-02-10

申请号：US09983305

申请日：2001-10-24

申请人： Junichi Nakai ,  Takashi Onishi ,  Hideo Fujii ,  Katsutoshi Takagi

发明人： Junichi Nakai ,  Takashi Onishi ,  Hideo Fujii ,  Katsutoshi Takagi

IPC分类号： B32B302

CPC分类号： G11B7/259 ,  C22C5/08 ,  C23C14/205 ,  C23C14/3414 ,  G02B5/0808 ,  G11B7/243 ,  G11B7/258 ,  G11B7/2595 ,  Y10T428/21 ,  Y10T428/31678

摘要： A novel reflective layer or semi-transparent reflective layer for use in optical information recording media with suppressed growth of Ag crystal grains and having a high reflectivity and excellent structural stability comprising an Ag based alloy containing from 0.1 to 3.0% of Nd in total of at least one element selected from the group consisting of Nd, Sn and Ge; and/or containing 0.1% or more of at least one rare earth element.

摘要翻译： 一种用于光学信息记录介质的新颖的反射层或半透明反射层，其具有抑制Ag晶粒生长并且具有高反射率和优异的结构稳定性，其包括总共含有0.1-3.0％Nd的Ag基合金 选自Nd，Sn和Ge中的至少一种元素; 和/或含有0.1％以上的至少一种稀土元素。