公开(公告)号：US20210132512A1

公开(公告)日：2021-05-06

申请号：US16962940

申请日：2018-12-14

Applicant: ASML Netherlands B.V.

Inventor： Gudrun Ghilaine Agnes DE GERSEM

IPC: G03F7/20

Abstract: The invention relates to a lithographic apparatus comprising: an actuation system for positioning an object; a control unit (CU) for controlling the actuation system; and a cooling system for cooling the actuation system, wherein the actuation system comprises a coil assembly (CA) including one or more coils (CO) as force generating members, wherein the cooling system comprises cooling element (CE) interacting with the coil assembly for cooling the coil assembly, and wherein the control unit is configured to control a temperature of the one or more coils to keep a magnitude of cyclic stress below a predetermined value.

公开(公告)号：US20210132507A1

公开(公告)日：2021-05-06

申请号：US16629480

申请日：2018-06-12

Applicant: ASML Netherlands B.V.

Inventor： Paulus Hubertus Petrus KOLLER ,  Johannes Jacobus Matheus BASELMANS ,  Bartolomeus Petrus RIJPERS

IPC: G03F7/20

Abstract: Method of determining a photodetector contribution to a measurement of apodization of a projection system of an immersion lithography apparatus, the method comprising providing a beam of radiation, illuminating an object with the beam of radiation, using the projection system to project an image of the object through a liquid layer and onto a photodetector, performing a first set of measurements of radiation intensity across a pupil plane of the projection system at a first liquid layer thickness, performing a second set of measurements of radiation intensity across the pupil plane of the projection system at a different liquid layer thickness, determining a set of intensity differences from the first set of measurements and the second set of measurements, comparing the determined set of intensity differences to an expected set of intensity difference, and using the results of the comparison to determine the photodetector contribution to a measurement of apodization.

公开(公告)号：US20210132505A1

公开(公告)日：2021-05-06

申请号：US16959702

申请日：2018-11-29

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER

IPC: G03F7/20

Abstract: A lithographic apparatus comprises a projection system comprising position sensors to measure a position of optical elements of the projection system. The positions sensors are referenced to a sensor frame. Damping actuators damp vibrations of the sensor frame. A control device drives the actuators and is configured to derive sensor frame damping force signals from at least one of the acceleration signals and the sensor frame position signals, derive an estimated line of sight error from the position signals, determine actuator drive signals from the sensor frame damping force signals and the estimated line of sight error, drive the actuators using the actuator drive signals to dampen the sensor frame and to at least partly compensate the estimated line of sight error.

公开(公告)号：US10996573B2

公开(公告)日：2021-05-04

申请号：US16474692

申请日：2017-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Peter Ten Berge ,  David Frans Simon Deckers ,  Peter Hanzen Wardenier

IPC: G03B27/42 ,  G03F7/20 ,  G03F1/70 ,  G03F1/74

Abstract: A method including: obtaining error information indicative of accuracy of positioning a pattern formed on a layer on a substrate relative to a target position, wherein the pattern has been formed by irradiating the layer with a radiation beam patterned by a patterning device; and producing modification information including a map of positional shifts across the patterning device so as to increase the accuracy of positioning the pattern formed using the patterning device modified according to the modification information, the modification information based on the error information, wherein the error information is independent of any other layer on the substrate.

公开(公告)号：US10996570B2

公开(公告)日：2021-05-04

申请号：US16594613

申请日：2019-10-07

Applicant: ASML Netherlands B.V.

Inventor： Zili Zhou ,  Nitesh Pandey ,  Olger Victor Zwier ,  Patrick Warnaar ,  Maurits Van Der Schaar ,  Elliott Gerard McNamara ,  Arie Jeffrey Den Boef ,  Paul Christiaan Hinnen ,  Murat Bozkurt ,  Joost Jeroen Ottens ,  Kaustuve Bhattacharyya ,  Michael Kubis

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G03F9/00

Abstract: A method of measuring overlay uses a plurality of asymmetry measurements from locations (LOI) on a pair of sub-targets (1032, 1034) formed on a substrate (W). For each sub-target, the plurality of asymmetry measurements are fitted to at least one expected relationship (1502, 1504) between asymmetry and overlay, based on a known bias variation deigned into the sub-targets. Continuous bias variation in one example is provided by varying the pitch of top and bottom gratings (P1/P2). Bias variations between the sub-targets of the pair are equal and opposite (P2/P1). Overlay (OV) is calculated based on a relative shift (xs) between the fitted relationships for the two sub-targets. The step of fitting asymmetry measurements to at least one expected relationship includes wholly or partially discounting measurements (1506, 1508, 1510) that deviate from the expected relationship and/or fall outside a particular segment of the fitted relationship.

公开(公告)号：US10996567B2

公开(公告)日：2021-05-04

申请号：US16622250

申请日：2018-05-31

Applicant: ASML Netherlands B.V.

Inventor： Johannes Jacobus Matheus Baselmans ,  Bart Smeets ,  Cristina Ioana Toma

IPC: G03F7/20

Abstract: A method for quantifying the effect of pupil function variations on a lithographic effect within a lithographic apparatus is disclosed. The method comprises: determining a discrete, two-dimensional sensitivity map in a pupil plane of the lithographic apparatus, wherein the lithographic effect is given by the inner product of said sensitivity map with a discrete, two-dimensional pupil function variation map of a radiation beam in the pupil plane. The pupil plane of a lithographic apparatus generally refers to the exit pupil of a projection system of the lithographic apparatus. Pupil function variations may comprise: relative phase variations within the pupil plane and/or relative intensity variations within the pupil plane.

公开(公告)号：US20210124276A1

公开(公告)日：2021-04-29

申请号：US17254601

申请日：2019-06-05

Applicant: ASML Netherlands B.V.

Inventor： Sebastianus Adrianus Goorden ,  Simon Reinald Huisman ,  Duygu Akbulut ,  Alessandro Polo ,  Johannes Antonius Gerardus Akkermans ,  Arie Jeffrey Den Boef

IPC: G03F9/00

Abstract: The invention provides a position sensor (300) which comprises an optical system (305, 306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.

公开(公告)号：US10990015B2

公开(公告)日：2021-04-27

申请号：US16318303

申请日：2017-06-22

Applicant: ASML Netherlands B.V.

Inventor： Michel Riepen ,  Paul Peter Anna Antonius Brom ,  Ronald Johannes Hultermans

IPC: G03F7/00 ,  G03F7/20 ,  H05G2/00

Abstract: A debris mitigation system for use in a radiation source. The debris mitigation system comprises a contamination trap. The contamination trap comprises a debris receiving surface arranged to receive liquid metal fuel debris emitted from a plasma formation region of the radiation source. The debris receiving surface is constructed from a material that reacts with the liquid metal fuel debris to form an intermetallic layer on the debris receiving surface.

公开(公告)号：USRE48515E1

公开(公告)日：2021-04-13

申请号：US15596843

申请日：2017-05-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Jacobus Hermanus Maria Neijzen ,  Helmar Van Santen

IPC: G01G5/00 ,  G03B27/52 ,  G02B27/42 ,  G03C5/00 ,  G11B7/26 ,  G11B7/1374 ,  B82Y10/00 ,  G03F7/20 ,  G11B7/122

Abstract: For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.

公开(公告)号：US10969695B2

公开(公告)日：2021-04-06

申请号：US16570382

申请日：2019-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Johannes Cornelis Paulus Melman ,  Han Henricus Aldegonda Lempens ,  Miao Yu ,  Cornelius Maria Rops ,  Ruud Olieslagers ,  Artunç Ulucan ,  Theodorus Wilhelmus Polet ,  Patrick Johannes Wilhelmus Spruytenburg

IPC: H01L21/027 ,  G03F7/20

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.