Abstract:
The invention proposes to equip the tip of a surgical instrument such as a needle or catheter or any other instrument with an ultrasound transducer array to measure flow just in front of the tip by means of time and frequency differences between the sent and received pulses. Since no image is required, only a few transducer elements are required. The transducer elements generate a pressure pulses in specific directions and receives its echo's without the use of imaging techniques and complex driving electronics. Using the frequency shift and time delay of the received signals the proximity and lateral direction of the blood flow may be detected, thus identifying blood vessels.
Abstract:
The invention refers to a multifunction sensor system and a corresponding method for supervising room conditions, comprising a temperature sensor, a humidity sensor, an ultrasonic transducer for emitting ultrasonic waves and being positioned in a fixed distance to a reflecting fixed reflective surface. For calculating the CO2 concentration in the supervised room, the time of flight of ultrasonic waves between the transducer and the fixed reflective surface is measured, and the CO2 concentration is calculated from the output values of the temperature sensor, the humidity sensor and the measured time of flight.
Abstract:
A CMUT transducer cell suitable for use in an ultrasonic CMUT transducer array has a membrane with a first electrode, a substrate with a second electrode, and a cavity between the membrane and the substrate. The CMUT is operated in a precollapsed state by biasing the membrane to a collapsed condition with the floor of the cavity, and a lens is cast over the collapsed membrane. When the lens material has polymerized or is of a sufficient stiffness, the bias voltage is removed and the lens material retains the membrane in the collapsed state.
Abstract:
A sensor chip (1030) for gas has cells (200) for emitting and receiving ultrasound and is configured for a sufficiently large frequency range and for measuring concentration of at least one of the gas components based on at least two responses within the range. The frequency range can be achieved by varying the size of cell membranes (230), varying bias voltages, and/or varying air pressure for an array (205) of cMUTs or MEMS microphones. The sensor chip can be applied in, for example, capnography. A measurement air chamber (515) is implemented in the respiratory pathway (400), and it and/or the pathway may be designed to reduce turbulence in the exhaled breath (120) subject to ultrasound interrogation. The chip (1030) can be implemented as self-contained in the monitoring of parameters, obviating the need for off-chip sensors.
Abstract:
The patent application discloses a capacitive micromachined ultrasound transducer, comprising a silicon substrate; a cavity; a first electrode, which is arranged between the silicon substrate and the cavity; wherein the first electrode is arranged under the cavity; a membrane, wherein the membrane is arranged above the cavity and opposite to the first electrode; a second electrode, wherein the second electrode is arranged above the cavity and opposite to the first electrode; wherein the second electrode is arranged in or close to the membrane, wherein the first electrode and the second electrode are adapted to be supplied by a voltage; and a first isolation layer, which is arranged between the first electrode and the second electrode, wherein the first isolation layer comprises a dielectric. It is also described a system for generating or detecting ultrasound waves, wherein the system comprises a transducer according to the patent application. Further, it is disclosed a method for manufacturing a transducer according to the patent application, wherein the transducer is manufactured with the help of a CMOS manufacturing process, wherein the transducer can be manufactured as a post-processing feature during a CMOS process.
Abstract:
Methods are provided for production of pre-collapsed capacitive micro-machined ultrasonic transducers (cMUTs). Methods disclosed generally include the steps of obtaining a nearly completed traditional cMUT structure prior to etching and sealing the membrane, defining holes through the membrane of the cMUT structure for each electrode ring fixed relative to the top face of the membrane, applying a bias voltage across the membrane and substrate of the cMUT structure so as to collapse the areas of the membrane proximate to the holes to or toward the substrate, fixing and sealing the collapsed areas of the membrane to the substrate by applying an encasing layer, and discontinuing or reducing the bias voltage. CMUT assemblies are provided, including packaged assemblies, integrated assemblies with an integrated circuit/chip (e.g., a beam-steering chip) and a cMUT/lens assembly. Advantageous cMUT-based applications utilizing the disclosed pre-collapsed cMUTs are also provided, e.g., ultrasound transducer-based applications, catheter-based applications, needle-based applications and flowmeter applications.
Abstract:
A sensor arrangement may be used to measure properties, such as optical properties, of a device arranged to process substrates. The sensor arrangement includes a substrate having the following: a plurality of sensor elements provided as an integrated circuit in the substrate, for each one of the plurality of sensor elements associated electronic circuitry comprising a processing circuit connected to the sensor element and an input/output interface connected to the processing circuit, and a power supply unit configured to supply operating power only to the electronic circuitry associated with one or more of the plurality of sensor elements which are in use. The at least one sensor element and possibly the processing electronics, the input/output unit, and/or the power supply unit may be provided as one or more integrated circuits or other structures in the substrate.
Abstract:
The invention relates to a device comprising a first material (10) and a second material. (20) whereby the first and the second material are so provided towards each other as to form at least one focusing microstructure with a focal point (30) located outside of the first material.
Abstract:
For lithographically manufacturing a device with a very high density, a design mask pattern (120) is distributed on a number of sub-patterns (120a, 120b, 120c) by means of a new method. The sub-patterns do not comprise “forbidden” structures (135) and can be transferred by conventional apparatus to a substrate layer to be patterned. For the transfer, a new stack of layers is used, which comprise a pair of a processing layer (22; 26) and an inorganic anti-reflection layer (24; 28) for each sub-pattern. After a first processing layer (26) has been patterned with a first sub-pattern, it is coated with a new resist layer (30) which is exposed with a second sub-pattern, and a second processing layer (22) under the first processing layer is processed with the second sub-pattern.
Abstract:
Aberrations of an imaging system (PL) can be detected in an accurate and reliable way by imaging, by means of the imaging system, a test object having circular phase structure (22) on a photoresist (PR), developing the resis and scanning it with a scanning detection device (SEM) which is coupled to an image processor (IP). The circular phase structure is imaged in a ring structure (25) and each of several possible aberrations, like coma, astigmatism, three-point aberration, etc. causes a specific change in the shape of the inner contour (CI) and the outer contour (CE) of the ring and/or a change in the distance between these contours, so that the aberrations can be detected independently of each other.