摘要:
By applying a drive voltage Vf [V] between first and second conductive films, when electrons are emitted by the first conductive film, an equipotential line of 0.5 Vf [V] is inclined toward the first conductive film, rather than toward the second conductive film, in the vicinity of the electron emitting portion of the first conductive film, in a cross section extending across the electron emitting portion and the portion of the second conductive film located nearest the electron emitting portion. The present invention improves electron emission efficiency.
摘要:
Provided is a manufacturing method capable of manufacturing an electron-emitting device in which a variation in device current at the time of manufacturing is suppressed and thus uniformity thereof is high. The electron-emitting device includes a substrate, a first conductor, and a second conductor. The substrate is composed of: a member which contains silicon oxide as a main ingredient, Na2O, and K2O and in which a molar ratio of K2O to Na2O is 0.5 to 2.0; and a film which contains silicon oxide as a main component and is stacked on the member. The first conductor and the second conductor are located on the substrate. In a forming step and/or an activation step, a quiescent period (interval) of a pulse voltage applying repeatedly applied between the first conductor and the second conductor is set equal to or longer than 10 msec.
摘要翻译:提供了一种能够制造电子发射器件的制造方法,其中制造时的器件电流的变化被抑制并因此其均匀性高。 电子发射器件包括衬底,第一导体和第二导体。 基板由以下部分构成:以氧化硅为主要成分的成分,Na 2 O和K 2 O 2,其中K < 2 O 2至Na 2 O为0.5至2.0; 以及含有氧化硅作为主要成分并层叠在该部件上的膜。 第一导体和第二导体位于基板上。 在形成步骤和/或激活步骤中,重复施加在第一导体和第二导体之间的脉冲电压的静止周期(间隔)被设置为等于或大于10毫秒。
摘要:
In a manufacturing process of an image forming apparatus (electron beam device) using electron emission elements, particularly, surface conduction type electron emission elements, wirings on an electron source substrate on which the wirings and element electrodes are formed are opposite to electrodes for a face plate, and a given voltage is applied between the wirings and the electrodes to thereby generate a discharge phenomenon in advance, thus removing a protrusion or the like. In this way, when an electric field applying process is conducted on the electron source substrate, a factor such as a protrusion in an electron source which induces a discharge phenomenon in driving an electron beam device represented by an image forming apparatus is removed, thus realizing an image forming apparatus excellent in display characteristic with no defective pixel even in image display for a long period of time.
摘要:
When high luminance is obtained by increasing an anode voltage in an image-forming apparatus constructed by anode and cathode substrates, a surface discharge (flash over) is generated between anode electrodes at a generating time of an abnormal discharge and an anode is broken. Therefore, as shown in FIG. 3B, the electric potential of an anode electrode on an anode substrate (51) is set to a uniform electric potential V1 by a first power source (53). Thereafter, the first power source (53) is separated from the anode electrode. Subsequently, the electric potential of one of the anode electrodes arranged in proximity to each other through an insulating face is set to an electric potential V2 by a second power sourced (54) to apply a voltage to a cut-in portion (52) (see FIG. 3C). Thus, a voltage Vc equal to or greater than an electric potential difference Ve generated at the generating time of the abnormal discharge is applied to the cut-in portion (52). Thus, the generation of a surface discharge (flash over) in the anode substrate can be prevented at the generating time of the abnormal discharge.
摘要:
An image forming apparatus includes a cathode substrate on which an electron emitting device is disposed, and an anode substrate disposed opposite to the cathode substrate. The anode substrate includes an anode electrode including a plurality of conductive films connected in series and arranged to form gaps between neighboring films.