摘要:
Disclosed is a phase shift mask blank (11) that can prevent the occurrence of a loading effect. The phase shift mask blank (11) includes a phase shift film (5) containing silicon, a light-shielding film (2) made of a material resistant to etching of the phase shift film (5), and an etching mask film (3) made of an inorganic material resistant to etching of the light-shielding film (2), which are formed in this order on a substrate (1) transparent to exposure light. Assuming that the thickness of the phase shift film (5) is t1, the etching rate of the phase shift film (5) by dry etching with an etchant using the etching mask film (3) and the light-shielding film (2) as a mask is v1, the thickness of the etching mask film (3) is t2, and the etching rate of the etching mask film (3) by dry etching with the above etchant is v2, (t1/v1)≦(t2/v2) is satisfied.
摘要:
A method for manufacturing a cellulose ester film comprising the steps of 1) mixing a cellulose ester exhibiting a water content of not greater than 3.0 weight %, at least one plasticizer selected from the groups A and B in an amount of one to thirty weight % of the cellulose ester, and at least one additive selected from the groups of C and D in an amount of 0.01 to 5 weight % of the cellulose ester to obtain a mixture, group A: ester plasticizers formed from a polyhydric alcohol and a monohydric carboxylic acid; group B: ester plasticizers formed from a polyhydric carboxylic acid and a monohydric alcohol; group C: hindered phenol anti-oxidants; group D: hindered amine light stabilizers, 2) heating to melt the mixture at a temperature (Tm) of between 150 and 300° C., and 3) forming a cellulose ester film with a melt casting method employing the melted mixture.
摘要:
In a method of producing a photomask (10) in which a light-transmissive substrate (1) is formed thereon with a chromium pattern (21) having a global opening ratio difference in its plane on the light-transmissive substrate (1), use is made, as an etching mask for a chromium film (2), of an etching mask pattern (31) made of an inorganic-based material having a resistance against etching of the chromium film (2). Dry etching of the chromium film (2) is carried out under a condition selected from conditions that cause damage to a resist pattern (41) to a degree which is unallowable when etching the chromium film (2) using the resist pattern (41) as a mask.
摘要:
In the photomask blank 100, which is an original plate of a transfer mask having a transfer pattern to be transferred to the body to be subjected to transfer on the substrate 10, the photomask blank 100 includes a light shielding film 20 becoming the transfer pattern and a resist film 30 on the substrate 10, and the resist film 30 formed on the peripheral edge of the main surface of the substrate 10 is removed in a predetermined region in a supported region 31 of the photomask blank 100 supported by the substrate holding member of the exposure device, so that a desired pattern positional accuracy and a desired focus accuracy are obtained, when the transfer mask having the transfer pattern obtained by patterning the light shielding film 20 is supported by the substrate holding member of the exposure device. With this structure, when a reticle is mounted on the substrate holding member of a stepper, the deformation of the reticle is suppressed, and lowering of a positional accuracy of the transfer pattern and the lowering of a focus accuracy can be suppressed to minimum.
摘要:
A transparent film for display substrate containing a cellulose ester, a plasticizer content in an amount of less than 1 percent, the aformentioned film being drawn 3 through 100 percent both in the direction of conveyance and across the width.
摘要:
A film substrate of an electronic displaying element, an electronic optical element, a touch panel, or a solar battery is disclosed which is composed mainly of an organic polymer having water solubility of 0 to 5 g based on 100 g of 25° C. water and having acetone solubility of 25 to 100 g based on 100 g of 25° C. acetone and an inorganic condensation polymer of a reactive metal compound capable of being condensed.
摘要:
A plasticizer comprising an ester compound produced by a condensation reaction of an organic acid represented by Formula (1) with a polyhydric alcohol having at least 3 hydroxyl groups in the molecule.
摘要:
A method for manufacturing a cellulose ester film comprising the steps of 1) mixing a cellulose ester exhibiting a water content of not greater than 3.0 weight %, at least one plasticizer selected from the groups A and B in an amount of one to thirty weight % of the cellulose ester, and at least one additive selected from the groups of C and D in an amount of 0.01 to 5 weight % of the cellulose ester to obtain a mixture, group A: ester plasticizers formed from a polyhydric alcohol and a monohydric carboxylic acid; group B: ester plasicizers formed from a polyhydlic carboxylic acid and a monohydric alcohol; group C: hindered phenol anti-oxidants; group D: hindered amine light stabilizers, 2) heating to melt the mixture at a temperature (Tm) of between 150 and 300° C., and 3) forming a cellulose ester film with a melt casting method employing the melted mixture.
摘要:
Disclosed are an organic-inorganic hybrid film comprising a cellulose derivative and a polycondensation product of a condensation polymerizable reactive metal compound, wherein the film contains a plasticizer in an amount of 1 to 20% by weight and its manufacturing method.
摘要:
Disclosed is an organic photoelectric conversion element which has a reverse layer structure wherein at least a first electrode, a photoelectric conversion layer and a second electrode are arranged on a substrate in this order. The organic photoelectric conversion element is characterized in that: the photoelectric conversion layer is a bulk heterojunction layer that is composed of a p-type organic semiconductor material and an n-type organic semiconductor material; and a compound that has a linear or branched fluorinated alkyl group having 6-20 carbon atoms is contained as the p-type organic semiconductor material.