PHASE SHIFT MASK BLANK AND METHOD OF MANUFACTURING PHASE SHIFT MASK
    41.
    发明申请
    PHASE SHIFT MASK BLANK AND METHOD OF MANUFACTURING PHASE SHIFT MASK 有权
    相移屏蔽层和制造相移片的方法

    公开(公告)号:US20090253054A1

    公开(公告)日:2009-10-08

    申请号:US12416468

    申请日:2009-04-01

    IPC分类号: G03F1/00

    CPC分类号: G03F1/32

    摘要: Disclosed is a phase shift mask blank (11) that can prevent the occurrence of a loading effect. The phase shift mask blank (11) includes a phase shift film (5) containing silicon, a light-shielding film (2) made of a material resistant to etching of the phase shift film (5), and an etching mask film (3) made of an inorganic material resistant to etching of the light-shielding film (2), which are formed in this order on a substrate (1) transparent to exposure light. Assuming that the thickness of the phase shift film (5) is t1, the etching rate of the phase shift film (5) by dry etching with an etchant using the etching mask film (3) and the light-shielding film (2) as a mask is v1, the thickness of the etching mask film (3) is t2, and the etching rate of the etching mask film (3) by dry etching with the above etchant is v2, (t1/v1)≦(t2/v2) is satisfied.

    摘要翻译: 公开了能够防止发生负载效应的相移掩模坯料(11)。 相移掩模空白(11)包括含有硅的相移膜(5),由耐相变膜(5)的蚀刻材料制成的遮光膜(2)和蚀刻掩模膜(3) )由能够对透光的基板(1)上的遮光膜(2)的蚀刻的无机材料制成。 假设相移膜(5)的厚度为t1,通过使用蚀刻掩模膜(3)和遮光膜(2)的蚀刻剂进行干蚀刻的相移膜(5)的蚀刻速率为 掩模为v1,蚀刻掩模膜(3)的厚度为t2,用上述蚀刻剂通过干蚀刻蚀刻掩模膜(3)的蚀刻速率为v2,(t1 / v1)<=(t2 / v2)满足。

    Method for manufacturing cellulose ester film, and cellulose ester film, optical film, polarizing plate and liquid crystal display device using the same
    42.
    发明申请
    Method for manufacturing cellulose ester film, and cellulose ester film, optical film, polarizing plate and liquid crystal display device using the same 审中-公开
    纤维素酯薄膜的制造方法,纤维素酯薄膜,光学薄膜,偏振片及使用其的液晶显示装置

    公开(公告)号:US20080213512A1

    公开(公告)日:2008-09-04

    申请号:US12075765

    申请日:2008-03-13

    IPC分类号: C09K19/30 B32B23/20

    摘要: A method for manufacturing a cellulose ester film comprising the steps of 1) mixing a cellulose ester exhibiting a water content of not greater than 3.0 weight %, at least one plasticizer selected from the groups A and B in an amount of one to thirty weight % of the cellulose ester, and at least one additive selected from the groups of C and D in an amount of 0.01 to 5 weight % of the cellulose ester to obtain a mixture, group A: ester plasticizers formed from a polyhydric alcohol and a monohydric carboxylic acid; group B: ester plasticizers formed from a polyhydric carboxylic acid and a monohydric alcohol; group C: hindered phenol anti-oxidants; group D: hindered amine light stabilizers, 2) heating to melt the mixture at a temperature (Tm) of between 150 and 300° C., and 3) forming a cellulose ester film with a melt casting method employing the melted mixture.

    摘要翻译: 一种纤维素酯薄膜的制造方法,其特征在于,包括以下步骤:1)将含水率为3.0重量%以下的纤维素酯与选自A,B组中的至少1种增塑剂混合1〜30重量% 的纤维素酯和至少一种选自C和D组的添加剂,其量为纤维素酯的0.01至5重量%,以获得混合物,组A:由多元醇和一元羧酸形成的酯增塑剂 酸; B组:由多元羧酸和一元醇形成的酯增塑剂; C组:受阻酚抗氧化剂; D组:受阻胺光稳定剂,2)在150〜300℃的温度(Tm)下加热熔融混合物,和3)使用熔融混合物的熔融浇铸法形成纤维素酯薄膜。

    Photomask producing method and photomask blank
    43.
    发明授权
    Photomask producing method and photomask blank 有权
    光掩模生产方法和光掩模坯料

    公开(公告)号:US07314690B2

    公开(公告)日:2008-01-01

    申请号:US10820785

    申请日:2004-04-09

    IPC分类号: G03F1/00

    CPC分类号: G03F1/80

    摘要: In a method of producing a photomask (10) in which a light-transmissive substrate (1) is formed thereon with a chromium pattern (21) having a global opening ratio difference in its plane on the light-transmissive substrate (1), use is made, as an etching mask for a chromium film (2), of an etching mask pattern (31) made of an inorganic-based material having a resistance against etching of the chromium film (2). Dry etching of the chromium film (2) is carried out under a condition selected from conditions that cause damage to a resist pattern (41) to a degree which is unallowable when etching the chromium film (2) using the resist pattern (41) as a mask.

    摘要翻译: 在其上形成透光性基板(1)的光掩模(10)的制造方法中,在透光性基板(1)上形成有在其透光性基板(1)的平面上具有全局开口率差的铬图案(21),使用 作为铬膜(2)的蚀刻掩模,制成由具有耐蚀刻铬膜(2)的无机基材料制成的蚀刻掩模图案(31)。 铬膜(2)的干法蚀刻在选自使用抗蚀图案(41)蚀刻铬膜(2)时对抗蚀剂图案(41)造成损伤的条件下至不能允许的程度的条件下进行, 一个面具

    Mask blank, mask blank manufacturing method, transfer mask manufacturing method, and semiconductor device manufacturing method
    44.
    发明申请
    Mask blank, mask blank manufacturing method, transfer mask manufacturing method, and semiconductor device manufacturing method 有权
    掩模坯料,掩模坯料制造方法,转印掩模制造方法和半导体器件制造方法

    公开(公告)号:US20070111490A1

    公开(公告)日:2007-05-17

    申请号:US10551136

    申请日:2004-03-31

    IPC分类号: G03F1/00 H01L21/20

    CPC分类号: G03F7/2028 G03F1/50

    摘要: In the photomask blank 100, which is an original plate of a transfer mask having a transfer pattern to be transferred to the body to be subjected to transfer on the substrate 10, the photomask blank 100 includes a light shielding film 20 becoming the transfer pattern and a resist film 30 on the substrate 10, and the resist film 30 formed on the peripheral edge of the main surface of the substrate 10 is removed in a predetermined region in a supported region 31 of the photomask blank 100 supported by the substrate holding member of the exposure device, so that a desired pattern positional accuracy and a desired focus accuracy are obtained, when the transfer mask having the transfer pattern obtained by patterning the light shielding film 20 is supported by the substrate holding member of the exposure device. With this structure, when a reticle is mounted on the substrate holding member of a stepper, the deformation of the reticle is suppressed, and lowering of a positional accuracy of the transfer pattern and the lowering of a focus accuracy can be suppressed to minimum.

    摘要翻译: 在作为要传送到主体的转印图案的转印掩模的原始板的光掩模坯料100中,在基板10上进行转印,光掩模坯料100包括成为转印图案的遮光膜20和 基板10上的抗蚀剂膜30和形成在基板10的主表面的周缘上的抗蚀膜30在由基板保持构件支撑的光掩模坯料100的支撑区域31中的预定区域中被去除 当通过曝光装置的基板保持部件支撑具有通过图案化遮光膜20获得的转印图案的转印掩模时,获得期望的图案位置精度和期望的焦点精度。 利用这种结构,当将标线片安装在步进机的基板保持部件上时,可以抑制掩模版的变形,并且能够将转印图案的位置精度和聚焦精度的降低降低到最小。

    Method for manufacturing cellulose ester film, and cellulose ester film, optical film, polarizing plate and liquid crystal display device using the same
    48.
    发明申请
    Method for manufacturing cellulose ester film, and cellulose ester film, optical film, polarizing plate and liquid crystal display device using the same 审中-公开
    纤维素酯薄膜的制造方法,纤维素酯薄膜,光学薄膜,偏振片及使用其的液晶显示装置

    公开(公告)号:US20060069192A1

    公开(公告)日:2006-03-30

    申请号:US11227782

    申请日:2005-09-15

    IPC分类号: C08K5/10 C08K5/13

    摘要: A method for manufacturing a cellulose ester film comprising the steps of 1) mixing a cellulose ester exhibiting a water content of not greater than 3.0 weight %, at least one plasticizer selected from the groups A and B in an amount of one to thirty weight % of the cellulose ester, and at least one additive selected from the groups of C and D in an amount of 0.01 to 5 weight % of the cellulose ester to obtain a mixture, group A: ester plasticizers formed from a polyhydric alcohol and a monohydric carboxylic acid; group B: ester plasicizers formed from a polyhydlic carboxylic acid and a monohydric alcohol; group C: hindered phenol anti-oxidants; group D: hindered amine light stabilizers, 2) heating to melt the mixture at a temperature (Tm) of between 150 and 300° C., and 3) forming a cellulose ester film with a melt casting method employing the melted mixture.

    摘要翻译: 一种纤维素酯薄膜的制造方法,其特征在于,包括以下步骤:1)将含水率为3.0重量%以下的纤维素酯与选自A,B组中的至少1种增塑剂混合1〜30重量% 的纤维素酯和至少一种选自C和D组的添加剂,其量为纤维素酯的0.01至5重量%,以获得混合物,组A:由多元醇和一元羧酸形成的酯增塑剂 酸; B组:由多羟基羧酸和一元醇形成的酯类改性剂; C组:受阻酚抗氧化剂; D组:受阻胺光稳定剂,2)在150〜300℃的温度(Tm)下加热熔融混合物,和3)使用熔融混合物的熔融浇铸法形成纤维素酯薄膜。