公开(公告)号：US20180039188A1

公开(公告)日：2018-02-08

申请号：US15694537

申请日：2017-09-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria MERTENS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Antonius Johannus VAN DER NET ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Edwin Augustinus Matheus VAN GOMPEL

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

公开(公告)号：US20180011029A1

公开(公告)日：2018-01-11

申请号：US15641579

申请日：2017-07-05

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen

IPC: G01N21/88 ,  G02F1/35 ,  G01N21/47 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/4788 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/0697 ,  G02F1/353 ,  G03F7/70008 ,  G03F7/70616

Abstract: Disclosed is an illumination source for generating measurement radiation for an inspection apparatus. The source generates at least first measurement radiation and second measurement radiation such that the first measurement radiation and the second measurement radiation interfere to form combined measurement radiation modulated with a beat component. The illumination source may be a HHG source. Also disclosed is an inspection apparatus comprising such a source and an associated inspection method.

公开(公告)号：US20170315055A1

公开(公告)日：2017-11-02

申请号：US15494056

申请日：2017-04-21

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Simon Gijsbert Josephus MATHIJSSEN ,  Sander Bas ROOBOL ,  Nan LIN

IPC: G01N21/47 ,  G01N21/88 ,  G03F7/20

CPC classification number: G03F7/70616 ,  G01N21/47 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/4704 ,  G01N2021/4735 ,  G01N2021/8822 ,  G01N2021/95615 ,  G01N2201/12 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70683 ,  G03F9/7003 ,  H01L22/12

Abstract: A structure of interest (T) is irradiated with radiation for example in the x-ray or EUV waveband, and scattered radiation is detected by a detector (19, 274, 908, 1012). A processor (PU) calculates a property such as linewidth (CD) or overlay (OV), for example by simulating (S16) interaction of radiation with a structure and comparing (S17) the simulated interaction with the detected radiation. The method is modified (S14a, S15a, S19a) to take account of changes in the structure which are caused by the inspection radiation. These changes may be for example shrinkage of the material, or changes in its optical characteristics. The changes may be caused by inspection radiation in the current observation or in a previous observation.

公开(公告)号：US20160370714A1

公开(公告)日：2016-12-22

申请号：US15251915

申请日：2016-08-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Johannes Sophia Maria MERTENS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Roelof Frederik DE GRAAF ,  Christiaan Alexander HOOGENDAM ,  Antonius Johannus VAN DER NET ,  Franciscus Johannes Herman Maria TEUNISSEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Edwin Augustinus Matheus VAN GOMPEL

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

公开(公告)号：US20160048085A1

公开(公告)日：2016-02-18

申请号：US14882241

申请日：2015-10-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Erik Roelof LOOPSTRA ,  Aschwin Lodewijk Hendricus Johannes VERMEER ,  Jeroen Johannes Sophia Maria MERTENS ,  Christianus Gerardus Maria DE MOL ,  Marcel Johannus Elisabeth Hubertus MUITJENS ,  Antonius Johannus VAN DER NET ,  Joost Jeroen OTTENS ,  Johannes Anna QUAEDACKERS ,  Maria Elisabeth REUHMAN-HUISKEN ,  Marco Koert STAVENGA ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPA Y ,  Frederik Eduard DE JONG ,  Koen GOORMAN ,  Boris MENCHTCHIKOV ,  Herman BOOM ,  Stoyan NIHTIANOV ,  Richard MOERMAN ,  Martin Frans Pierre SMEETS ,  Bart Leonard Peter SCHOONDERMARK ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Abstract translation: 描述了一种光刻设备，其具有液体供应系统，其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件和加热器。