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    Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection
    42.
    发明申请
    Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权
    用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查

    公开(公告)号：US20060012873A1

    公开(公告)日：2006-01-19

    申请号：US10917626

    申请日：2004-08-13

    申请人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

    发明人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

    IPC分类号： G02B21/06

    CPC分类号： G03F7/70566 ,  G02B5/3025 ,  G02B21/0016 ,  G03F7/70666 ,  Y10S359/90

    摘要： The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects by means of inspection microscopes in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems. Realistic images of the scanner systems can be generated by emulating the occurring vector effects.

    摘要翻译： 本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。 利用所提出的解决方案，尽管越来越小的结构和成像系统的图像侧数值孔径越来越高，但是可以通过检查显微镜检查用于缺陷的光刻掩模。 可以通过模拟出现的矢量效应来生成扫描仪系统的现实图像。

    Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method
    44.
    发明授权
    Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method 失效
    适用于不同浸入液体或液体的投影物镜，转换方法及生产方法

    公开(公告)号：US07589903B2

    公开(公告)日：2009-09-15

    申请号：US11420103

    申请日：2006-05-24

    申请人： Susanne Beder ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Wolfgang Singer ,  Toralf Gruner

    发明人： Susanne Beder ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Wolfgang Singer ,  Toralf Gruner

    IPC分类号： G02B3/00 ,  G02B3/12

    CPC分类号： G02B13/143 ,  G03F7/70341

    摘要： The invention relates to a projection objective (6), in particular for applications in microlithography, serving to project an image of an object (3) arranged in an object plane (4) onto a substrate (18) arranged in an image plane (7). The projection objective (6) has an object-side-oriented part (10) which is arranged adjacent to the object plane (4) and includes a plurality of optical elements, and it also has an image-side-oriented part (11) of the objective which is arranged adjacent to the image plane (7) and includes a free space (16) serving to receive a fluid (13) and further includes at least a part of an optical end-position element (14) serving to delimit the free space (16) towards the object side. The projection objective (6) is operable in different modes of operation in which the free space (16) is filled with fluids (13) that differ in their respective indices of refraction.

    摘要翻译： 本发明涉及一种投影物镜（6），特别是用于微光刻中的用于将布置在物平面（4）中的物体（3）的图像投影到布置在图像平面（7）中的基底（18）上的投影物镜 ）。 投影物镜（6）具有与物平面（4）相邻配置并具有多个光学元件的物体侧取向部（10），还具有图像侧取向部（11） 所述物镜布置成邻近所述图像平面（7）并且包括用于接收流体（13）的自由空间（16），并且还包括用于界定光学终点位置元件（14）的至少一部分 朝向物体侧的自由空间（16）。 投影物镜（6）可在不同的操作模式中操作，其中自由空间（16）填充有各自折射率不同的流体（13）。

    PROJECTION OBJECTIVE ADAPTED FOR USE WITH DIFFERENT IMMERSION FLUIDS OR LIQUIDS, METHOD OF CONVERSION OF SUCH AND PRODUCTION METHOD
    45.
    发明申请
    PROJECTION OBJECTIVE ADAPTED FOR USE WITH DIFFERENT IMMERSION FLUIDS OR LIQUIDS, METHOD OF CONVERSION OF SUCH AND PRODUCTION METHOD 失效
    投影目标适用于不同浸入液或液体的方法，转换方法和生产方法

    公开(公告)号：US20080273248A1

    公开(公告)日：2008-11-06

    申请号：US11420103

    申请日：2006-05-24

    申请人： Susanne Beder ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Wolfgang Singer ,  Toralf Gruner

    发明人： Susanne Beder ,  Wilhelm Ulrich ,  Heiko Feldmann ,  Wolfgang Singer ,  Toralf Gruner

    IPC分类号： G02B3/12

    CPC分类号： G02B13/143 ,  G03F7/70341

    摘要： The invention relates to a projection objective (6), in particular for applications in microlithography, serving to project an image of an object (3) arranged in an object plane (4) onto a substrate (18) arranged in an image plane (7). The projection objective (6) has an object-side-oriented part (10) which is arranged adjacent to the object plane (4) and includes a plurality of optical elements, and it also has an image-side-oriented part (11) of the objective which is arranged adjacent to the image plane (7) and includes a free space (16) serving to receive a fluid (13) and further includes at least a part of an optical end-position element (14) serving to delimit the free space (16) towards the object side. The projection objective (6) is operable in different modes of operation in which the free space (16) is filled with fluids (13) that differ in their respective indices of refraction.

    摘要翻译： 本发明涉及一种投影物镜（6），特别是用于微光刻中的用于将布置在物平面（4）中的物体（3）的图像投影到布置在图像平面（7）中的基底（18）上的投影物镜 ）。 投影物镜（6）具有与物平面（4）相邻配置并具有多个光学元件的物体侧取向部（10），还具有图像侧取向部（11） 所述物镜布置成邻近所述图像平面（7）并且包括用于接收流体（13）的自由空间（16），并且还包括用于界定光学终点位置元件（14）的至少一部分 朝向物体侧的自由空间（16）。 投影物镜（6）可在不同的操作模式中操作，其中自由空间（16）填充有各自折射率不同的流体（13）。

    METHOD OF MANUFACTURING A PROJECTION OBJECTIVE AND PROJECTION OBJECTIVE
    49.
    发明申请
    METHOD OF MANUFACTURING A PROJECTION OBJECTIVE AND PROJECTION OBJECTIVE 有权
    制作投影目标和投影目标的方法

    公开(公告)号：US20120134016A1

    公开(公告)日：2012-05-31

    申请号：US13364565

    申请日：2012-02-02

    申请人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

    发明人： Heiko Feldmann ,  Toralf Gruner ,  Alexander Epple

    IPC分类号： G02B17/08

    CPC分类号： G03F7/70891 ,  G03F7/70225 ,  G03F7/70275 ,  G03F7/705 ,  G03F7/70983

    摘要： The disclosure relates to a method of manufacturing a projection objective, and a projection objective, such as a projection objective configured to be used in a microlithographic process. The method can include defining an initial design for the projection objective and optimizing the design using a merit function. The method can be used in the manufacturing of projection objectives which may be used in a microlithographic process of manufacturing miniaturized devices.

    摘要翻译： 本公开涉及一种制造投影物镜的方法，以及投影物镜，例如被配置为在微光刻工艺中使用的投影物镜。 该方法可以包括定义投影物镜的初始设计，并使用优值函数优化设计。 该方法可用于制造可用于制造小型化装置的微光刻工艺中的投影物镜。

    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    50.
    发明申请
    MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
    微波投影曝光装置

    公开(公告)号：US20110134403A1

    公开(公告)日：2011-06-09

    申请号：US11573628

    申请日：2005-09-16

    申请人： Heiko Feldmann ,  Alexander Epple ,  Vladan Blahnik

    发明人： Heiko Feldmann ,  Alexander Epple ,  Vladan Blahnik

    IPC分类号： G03B27/52 ,  G03F7/20

    CPC分类号： G03F7/70258 ,  G03F7/70341

    摘要： A microlithographic projection exposure apparatus contains a projection objective, whose last optical element on the image side is a dry terminating element that has no refractive power and is designed for dry operation of the projection objective. According to the invention, the projection exposure apparatus furthermore contains an immersion terminating element that has no refractive power and is designed for immersed operation of the projection objective. The immersion terminating element is replaceable with the dry terminating element. Preferably, the dry terminating element and/or the immersion terminating element is composed of a plurality of plates, which are made of materials having different refractive indices.

    摘要翻译： 微光刻投影曝光装置包括投影物镜，其投影物镜的最后一个光学元件是干的终端元件，其不具有屈光力并被设计用于投射物镜的干燥操作。 根据本发明，投影曝光装置还包含没有屈光力的浸没终端元件，并且被设计用于投影物镜的浸入操作。 浸没终端元件可用干端接元件替换。 优选地，干端接元件和/或浸没终端元件由多个由折射率不同的材料制成的板组成。