公开(公告)号：US20140349223A1

公开(公告)日：2014-11-27

申请号：US14451814

申请日：2014-08-05

Applicant: FUJIFILM CORPORATION

Inventor： Takeshi KAWABATA ,  Hideaki TSUBAKI ,  Hiroo TAKIZAWA

IPC: G03F7/027 ,  G03F7/20 ,  G03F7/038

CPC classification number: G03F7/027 ,  C08K5/42 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/2059

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a compound that when exposed to actinic rays or radiation, generates any of acids of general formula (I) below.

Abstract translation: 本发明提供一种光化学射线或辐射敏感性树脂组合物，其包括当暴露于光化射线或辐射时产生下列通式（I）的任何酸的化合物。

公开(公告)号：US20140272692A1

公开(公告)日：2014-09-18

申请号：US14289718

申请日：2014-05-29

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Takeshi KAWABATA ,  Hiroo TAKIZAWA ,  Hideaki TSUBAKI ,  Shuji HIRANO

IPC: G03F7/038

CPC classification number: G03F7/0388 ,  C08F8/00 ,  C08F212/00 ,  C08F222/10 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive composition comprising (P) a compound having a phenolic hydroxyl group and a group formed by substituting for the hydrogen atom in a phenolic hydroxyl group by a group represented by the specific formula, a resist film formed using the specific actinic ray-sensitive or radiation-sensitive composition, a pattern forming method containing steps of exposing and developing the resist film, a manufacturing method of an electronic device, containing the pattern forming method, and an electronic device manufactured by the specific manufacturing method of an electronic device.

Abstract translation: 提供了光化射线敏感或辐射敏感性组合物，其包含（P）具有酚羟基的化合物和通过用特定式表示的基团取代酚羟基中的氢原子形成的基团，抗蚀剂 使用特定的光化射线敏感或辐射敏感组合物形成的膜，包含曝光和显影抗蚀剂膜的步骤的图案形成方法，包含图案形成方法的电子器件的制造方法和由 电子设备的具体制造方法。