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56 条记录 (耗时 0.192 秒)

    Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound
    47.
    发明授权
    Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound 失效
    含有特定量的四羟基二苯硫醚和多羟基化合物的萘醌二叠氮磺酰酯的光致抗蚀剂组合物

    公开(公告)号：US5200293A

    公开(公告)日：1993-04-06

    申请号：US793494

    申请日：1991-11-14

    申请人： Reinhard Schulz ,  Horst Munzel ,  Ekkehard Bartmann

    发明人： Reinhard Schulz ,  Horst Munzel ,  Ekkehard Bartmann

    IPC分类号： G03F7/022

    CPC分类号： G03F7/022

    摘要： Positive-working photoresist compositions containing 23-27%, based on said composition, of at least one compound of formula (I) ##STR1## wherein one of the substituents X is hydrogen or a group of formula II ##STR2## and the other substituents X are a group of formula II; and 6-11%, based on said composition, of at least one polyhydroxy compound of formula III ##STR3## wherein X is a direct bond, --O--, --S--, --SO.sub.2 --, --CO-- or C(R.sub.6 (R.sub.7)--, and R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or hydroxy, and R.sub.6 and R.sub.7 are each independently of the other hydrogen, --CH.sub.3 or --CF.sub.3.These compositions have particularly good profile contrast and exhibit insignificant fluctuations in line width.

    摘要翻译： 基于所述组合物含有至少一种式（I）化合物（I）的23-27％的正性光致抗蚀剂组合物，其中一个取代基X为氢或式II的基团 II），其它取代基X是式II的基团; 基于所述组合物的至少一种式III III的多羟基化合物（III）的6-11％，其中X是直接键，-O - ， - S - ， - SO 2 - ， - CO-或C （R 6（R 7） - ，R 1，R 2，R 3，R 4和R 5各自独立地为氢，卤素，C 1 -C 4烷基，C 1 -C 4烷氧基或羟基，R 6和R 7各自独立地为氢， CH3或-CF3。这些组合物具有特别好的轮廓对比度，并且在线宽上显示出不显着的波动。

    Negative photoresists of the polyimide type containing 1,2-disulfones
    49.
    发明授权
    Negative photoresists of the polyimide type containing 1,2-disulfones 失效
    含有1,2-二砜的聚酰亚胺类型的负型光致抗蚀剂

    公开(公告)号：US4980268A

    公开(公告)日：1990-12-25

    申请号：US321432

    申请日：1989-03-09

    申请人： Ekkehard Bartmann ,  Rudolf Klug ,  Reinhard Schulz ,  Hartmut Hartner

    发明人： Ekkehard Bartmann ,  Rudolf Klug ,  Reinhard Schulz ,  Hartmut Hartner

    IPC分类号： C08L79/08 ,  C08G73/10 ,  C08K5/42 ,  G03F7/031

    CPC分类号： G03F7/031 ,  Y10S430/122 ,  Y10S430/128

    摘要： The invention relates to negative photoresists of the polyimide type essentially containing, in an organic solvent, in each case at least(a) one polyamide-acid or polyamide-acid derivative prepolymer which can be converted into a highly heat-resistant polyimide polymer,(b) a photoinitiator, and, if appropriate, further customary additives which contain, as the photoinitiator, a compound of the formula IR.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 I in which R.sup.1 and R.sup.2 are as defined.

    摘要翻译： 本发明涉及聚酰亚胺类型的负型光致抗蚀剂，其基本上在有机溶剂中含有至少（a）一种聚酰胺酸或聚酰胺 - 酸衍生物预聚物，其可以转化为高耐热聚酰亚胺聚合物（ b）光引发剂，以及如果合适的话，还含有作为光引发剂的式Ⅰ化合物R1-SO2-SO2-R2Ⅰ的其它常规添加剂，其中R 1和R 2如所定义。