公开(公告)号：US5200293A

公开(公告)日：1993-04-06

申请号：US793494

申请日：1991-11-14

申请人： Reinhard Schulz ,  Horst Munzel ,  Ekkehard Bartmann

发明人： Reinhard Schulz ,  Horst Munzel ,  Ekkehard Bartmann

IPC分类号： G03F7/022

CPC分类号： G03F7/022

摘要： Positive-working photoresist compositions containing 23-27%, based on said composition, of at least one compound of formula (I) ##STR1## wherein one of the substituents X is hydrogen or a group of formula II ##STR2## and the other substituents X are a group of formula II; and 6-11%, based on said composition, of at least one polyhydroxy compound of formula III ##STR3## wherein X is a direct bond, --O--, --S--, --SO.sub.2 --, --CO-- or C(R.sub.6 (R.sub.7)--, and R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are each independently of the other hydrogen, halogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or hydroxy, and R.sub.6 and R.sub.7 are each independently of the other hydrogen, --CH.sub.3 or --CF.sub.3.These compositions have particularly good profile contrast and exhibit insignificant fluctuations in line width.

摘要翻译： 基于所述组合物含有至少一种式（I）化合物（I）的23-27％的正性光致抗蚀剂组合物，其中一个取代基X为氢或式II的基团 II），其它取代基X是式II的基团; 基于所述组合物的至少一种式III III的多羟基化合物（III）的6-11％，其中X是直接键，-O - ， - S - ， - SO 2 - ， - CO-或C （R 6（R 7） - ，R 1，R 2，R 3，R 4和R 5各自独立地为氢，卤素，C 1 -C 4烷基，C 1 -C 4烷氧基或羟基，R 6和R 7各自独立地为氢， CH3或-CF3。这些组合物具有特别好的轮廓对比度，并且在线宽上显示出不显着的波动。

公开(公告)号：US5106718A

公开(公告)日：1992-04-21

申请号：US648954

申请日：1991-02-01

申请人： Ekkehard Bartmann ,  Reinhard Schulz ,  Horst Munzel

发明人： Ekkehard Bartmann ,  Reinhard Schulz ,  Horst Munzel

IPC分类号： G03F7/004 ,  G03F7/022 ,  H01L21/027

CPC分类号： G03F7/0226

摘要： The invention relates to positive photoresists based on alkali-soluble phenolic resin and photosensitive quinonediazide compounds which, by means of particular additives, give relief structures produced therewith an increased stability towards changes due to thermal effects.

摘要翻译： 本发明涉及基于碱溶性酚醛树脂和光敏醌二叠氮化物化合物的阳性光致抗蚀剂，其通过特定的添加剂赋予由其产生的对由热效应引起的变化的稳定性提高的浮雕结构。

公开(公告)号：US5104768A

公开(公告)日：1992-04-14

申请号：US430760

申请日：1989-11-02

申请人： Jorg Sassmannshausen ,  Reinhard Schulz ,  Ekkehard Bartmann

发明人： Jorg Sassmannshausen ,  Reinhard Schulz ,  Ekkehard Bartmann

IPC分类号： G03F7/022 ,  G03F7/023 ,  H01L21/027

CPC分类号： G03F7/0233 ,  Y10S430/106 ,  Y10S430/107

摘要： The invention relates to positive working photoresists for producing relief structures of high-temperature resistant polyimide prepolymers, which photoresists can be developed in aqueous-alkaline medium and which contain, in an organic solvent, essentially at leasta) one prepolymer which is convertible into a polyimide,b) one radiation-sensitive quinonediazide compound, and further optional components, said prepolymer being a completely esterified polyamic acid polymer.

摘要翻译： 本发明涉及用于生产耐高温聚酰亚胺预聚物的浮雕结构的正性工作光致抗蚀剂，该光致抗蚀剂可在含水 - 碱性介质中显影，并且在有机溶剂中含有至少一种可转化为 聚酰亚胺，b）一种辐射敏感性醌二叠氮化合物，以及另外任选的组分，所述预聚物是完全酯化的聚酰胺酸聚合物。

公开(公告)号：US4980268A

公开(公告)日：1990-12-25

申请号：US321432

申请日：1989-03-09

申请人： Ekkehard Bartmann ,  Rudolf Klug ,  Reinhard Schulz ,  Hartmut Hartner

发明人： Ekkehard Bartmann ,  Rudolf Klug ,  Reinhard Schulz ,  Hartmut Hartner

IPC分类号： C08L79/08 ,  C08G73/10 ,  C08K5/42 ,  G03F7/031

CPC分类号： G03F7/031 ,  Y10S430/122 ,  Y10S430/128

摘要： The invention relates to negative photoresists of the polyimide type essentially containing, in an organic solvent, in each case at least(a) one polyamide-acid or polyamide-acid derivative prepolymer which can be converted into a highly heat-resistant polyimide polymer,(b) a photoinitiator, and, if appropriate, further customary additives which contain, as the photoinitiator, a compound of the formula IR.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 I in which R.sup.1 and R.sup.2 are as defined.

摘要翻译： 本发明涉及聚酰亚胺类型的负型光致抗蚀剂，其基本上在有机溶剂中含有至少（a）一种聚酰胺酸或聚酰胺 - 酸衍生物预聚物，其可以转化为高耐热聚酰亚胺聚合物（ b）光引发剂，以及如果合适的话，还含有作为光引发剂的式Ⅰ化合物R1-SO2-SO2-R2Ⅰ的其它常规添加剂，其中R 1和R 2如所定义。

公开(公告)号：US5219701A

公开(公告)日：1993-06-15

申请号：US771083

申请日：1991-10-02

申请人： Reinhard Schulz ,  Horst Munzel

发明人： Reinhard Schulz ,  Horst Munzel

IPC分类号： G03F7/022

CPC分类号： G03F7/022

摘要： Structures of high resolution in the near UV range and of high sharpness of edge and steepness of edge can be obtained by means of positive photoresists containing, in an organic solvent, in each case essentially at least(a) an alkali-soluble resin(b) a 1,2-naphthoquinone-diazide-5-sulfonyl ester of a trihydroxybenzene isomer(c) an aromatic hydroxy compoundand also, if appropriate, further customary additives, and in which the result of component (b) is to give an absorption coefficient of at least 0.5 .mu.m.sup.-1 for the photobleachable absorption, and component (c) is present in a concentration of 15-30% by weight, relative to the total solids content.

摘要翻译： 通过在有机溶剂中，在每种情况下，至少包含（a）碱溶性树脂（b）的阳性光致抗蚀剂可以获得在近紫外范围内的高分辨率和边缘边缘和陡峭度的高锐度的结构 ）三羟基苯异构体的1,2-萘醌 - 二叠氮化物-5-磺酰基酯（c）芳香族羟基化合物，并且如果合适，还可以使用其它常规添加剂，并且其中组分（b）的结果是给出吸收 对于可光漂白吸收，系数至少为0.5μm-1，组分（c）相对于总固体含量为15-30重量％。

公开(公告)号：US5077173A

公开(公告)日：1991-12-31

申请号：US649271

申请日：1991-01-30

申请人： Reinhard Schulz ,  Horst Munzel

发明人： Reinhard Schulz ,  Horst Munzel

IPC分类号： G03F7/023 ,  G03F7/022

CPC分类号： G03F7/0226

摘要： Structures of high resolution in the near UV range and of high sharpness of edge and steepness of edge can be obtained by means of positive photoresists containing, in an organic solvent, in each case essentially at least(a) an alkali-soluble resin(b) a 1,2-naphthoquinone-diazide-5-sulfonyl ester of a trihydroxybenzene isomer(c) an aromatic hydroxy compoundand also, if appropriate, further customary additives, and in which the result of component (b) is to give an absorption coefficient of at least 0.5 .mu.m.sup.-1 for the photobleachable absorption, and component (c) is present in a concentration of 15-30% by weight, relative to the total solids content.

摘要翻译： 通过在有机溶剂中，在每种情况下，至少包含（a）碱溶性树脂（b）的阳性光致抗蚀剂可以获得在近紫外范围内的高分辨率和边缘边缘和陡峭度的高锐度的结构 ）三羟基苯异构体的1,2-萘醌 - 二叠氮化物-5-磺酰基酯（c）芳香族羟基化合物，并且如果合适，还可以使用其它常规添加剂，并且其中组分（b）的结果是给出吸收 对于可光漂白吸收，系数至少为0.5μm-1，组分（c）相对于总固体含量为15-30重量％。

公开(公告)号：US20100224380A1

公开(公告)日：2010-09-09

申请号：US12697066

申请日：2010-01-29

申请人： Alexander JOHN ,  Reinhard Schulz ,  Eduard Pfeiffer

发明人： Alexander JOHN ,  Reinhard Schulz ,  Eduard Pfeiffer

IPC分类号： B25D11/06

CPC分类号： B25D11/125 ,  B25D11/005 ,  B25D2250/245

摘要： A pneumatic hammer mechanism is disclosed. The hammer mechanism features: a flying mass, which is movable along an impact axis; an impact surface, which limits a movement of the flying mass along the impact axis in the impact direction; a hammer piston, which limits a movement of the flying mass along the impact axis opposite from the impact direction; a pneumatic chamber between the flying mass and hammer piston; a drive for periodically moving the hammer piston with a stroke along the impact axis, wherein the flying mass is excited to a periodic movement between the impact surface and hammer piston. The stroke is selected as a function of a maximum length of the pneumatic chamber such that the periodic movement of the flying mass on the path between an impact on the impact surface and a minimum approach of the hammer piston intermittently has a velocity of zero.

摘要翻译： 公开了一种气动锤机构。 锤子机构具有：可沿着冲击轴线移动的飞行质量块; 撞击表面，其限制飞行质量沿冲击轴线在冲击方向上的运动; 一个锤子活塞，其限制飞行质量块沿冲击轴线与冲击方向相反的运动; 飞行质量块和锤式活塞之间的气动室; 驱动器，用于沿着冲击轴线周期性地移动锤子活塞，其中飞行质量被激发以在冲击表面和锤形活塞之间的周期性运动。 作为气动室的最大长度的函数来选择行程，使得飞行质量在冲击表面上的冲击和锤式活塞的最小接近之间的路径上的周期性运动具有零速度。

公开(公告)号：US5650262A

公开(公告)日：1997-07-22

申请号：US417119

申请日：1995-04-05

申请人： Norbert Munzel ,  Reinhard Schulz ,  Heinz Holzwarth

发明人： Norbert Munzel ,  Reinhard Schulz ,  Heinz Holzwarth

IPC分类号： C07C39/04 ,  G03F7/004 ,  G03F7/038 ,  H01L21/027

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/0382 ,  Y10S430/106 ,  Y10S430/122

摘要： The invention relates to a chemically amplified negative photoresist which can be developed in aqueous alkaline media, which contains a radiation-sensitive acid generator and a compound which reduces the solubility of the resist in aqueous alkaline solutions in the presence of acid, and a polyhydroxyl compound of the formula I ##STR1## in which n is an integer between 2 and 6,R is hydrogen, halogen, C.sub.1 -C.sub.4 alkoxy or C.sub.1 -C.sub.4 alkyl, andZ is an n-valent radical which is unsubstituted or substituted by one or more substituents from the group consisting of hydroxyl, halogen and C.sub.1 -C.sub.4 alkoxy, and is selected from the group consisting of:a) aliphatic radicals having 1 to 12 carbon atoms,b) cycloaliphatic radicals having 5 to 20 carbon atoms,c) aromatic radicals having 6 to 20 carbon atoms andd) radicals having 7 to 30 carbon atoms which comprise at least two different structural units selected from aliphatic, cycloaliphatic or aromatic groups. The resists described make it possible to reduce the demands made on the focusing accuracy during imagewise exposure.

摘要翻译： 本发明涉及一种可在含水碱性介质中显影的化学放大型负性光致抗蚀剂，其含有辐射敏感性酸产生剂和在酸存在下降低抗蚀剂在碱性水溶液中的溶解度的化合物，以及多羟基化合物 其中n是2和6之间的整数，R是氢，卤素，C 1 -C 4烷氧基或C 1 -C 4烷基，Z是未被取代或被一个取代的n价基团的式I 或更多的选自羟基，卤素和C 1 -C 4烷氧基的取代基，并且选自：a）具有1至12个碳原子的脂族基团，b）具有5至20个碳原子的脂环族基团，c）芳族 具有6至20个碳原子的基团和d）具有7至30个碳原子的基团，其包含至少两个选自脂肪族，脂环族或芳族基团的不同结构单元。 所描述的抗蚀剂使得可以降低在成像曝光期间对聚焦精度的要求。

公开(公告)号：US5296330A

公开(公告)日：1994-03-22

申请号：US932128

申请日：1992-08-15

申请人： Reinhard Schulz ,  Norbert Munzel ,  Martin Roth ,  Wilhelm Knobloch

发明人： Reinhard Schulz ,  Norbert Munzel ,  Martin Roth ,  Wilhelm Knobloch

IPC分类号： G03F7/004 ,  C07C39/15 ,  C07C309/71 ,  C07C309/76 ,  C08K5/42 ,  C08L101/00 ,  G03F7/022 ,  H01L21/027 ,  H05K3/00 ,  G03F7/023 ,  G03C1/61

CPC分类号： C07C309/76 ,  C07C39/15 ,  G03F7/0226

摘要： Positive photoresist compositions comprising, in an organic solvent, at leasta) one alkali-soluble resin,b) one photosensitive quinone diazide,c) one aromatic hydroxy compound of formula I ##STR1## wherein each R is --H, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, --OCH.sub.2 C.sub.6 H.sub.5, --OC.sub.6 H.sub.5 or --COOC.sub.1 -C.sub.4 alkyl, and R.sub.1 and R.sub.2 are each independently of the other H, C.sub.1 -C.sub.4 alkyl, --C.sub.6 H.sub.5 or a cycloaliphatic 5- or 6-membered ring, a is an integer from 0 to 4, and m and n are each independently of the other 0, 1 or 2, which compound enhances the photosensitivity and/or the rate of development, and optionallyd) additional customary modifiers,are eminently suitable for making relief structures.

摘要翻译： 正性光致抗蚀剂组合物，其在有机溶剂中包含至少一种碱溶性树脂，b）一种光敏醌二叠氮化物，c）一种式I的芳族羟基化合物（*化学结构*）（I），其中每个R是 - H，C 1 -C 4烷基，C 1 -C 4烷氧基，-OCH 2 C 6 H 5，-OC 6 H 5或-COOC 1 -C 4烷基，R 1和R 2各自独立地为H，C 1 -C 4烷基，-C 6 H 5或脂环族五元或六元环， a是0至4的整数，m和n各自独立地为0,1或2，该化合物增强光敏性和/或显影速率，以及任选地d）另外的常规改性剂，特别适用于 做救济结构。

公开(公告)号：US20100193211A1

公开(公告)日：2010-08-05

申请号：US12697075

申请日：2010-01-29

申请人： Alexander JOHN ,  Reinhard Schulz ,  Eduard Pfeiffer

发明人： Alexander JOHN ,  Reinhard Schulz ,  Eduard Pfeiffer

IPC分类号： B25D11/06

CPC分类号： B25D17/06 ,  B25D11/125 ,  B25D2250/065

摘要： A pneumatic hammer mechanism is disclosed. The hammer mechanism includes: a flying mass; an impact surface which limits a movement of the flying mass along the impact axis in the impact direction; a hammer piston which limits a movement of the flying mass opposite from the impact direction; a pneumatic chamber between the flying mass and hammer piston; and a drive for periodically moving the hammer piston with a stroke along the impact axis. The following inequality applies for the mass (m2) of the flying mass, a cross-sectional area (A) of the pneumatic chamber, the maximum length (L) of the pneumatic chamber, the stroke (H) of the hammer piston and an impact coefficient (q), if the hammer mechanism has an impact frequency (f) during percussive operation: L κ 2  ( L - H ) κ · κ L - H + ( L κ 2  ( L - H ) κ - 1 ) · 1 - q q  N 2  π   H  ≥ !  m 2 A · p 0 · N 2  f 2 where the parameter N is at least 4, po designates the ambient pressure and κ the isentropic coefficient of gas in the pneumatic chamber.

摘要翻译： 公开了一种气动锤机构。 锤击机构包括：飞行块; 撞击表面，其限制飞行质量沿冲击轴线在冲击方向上的运动; 锤击活塞，其限制飞行物体与冲击方向相反的运动; 飞行质量块和锤式活塞之间的气动室; 以及用于沿击球轴线周期性地移动锤式活塞的行程。 以下不等式适用于飞行质量的质量（m2），气动室的横截面积（A），气动室的最大长度（L），锤式活塞的行程（H）和 冲击系数（q），如果锤击机构在冲击操作期间具有冲击频率（f）：L＆kgr; 2（L-H）＆kgr; ·＆kgr L-H +（L＆Kgr; 2（L-H）＆kgr; - 1）·1 - q q N 2＆pgr ！ㄧ m 2 A·p 0·N 2 f 2其中参数N至少为4，po表示环境压力和kgr; 气动室中气体的等熵系数。