Nanoparticle-based memristor structure
    42.
    发明授权
    Nanoparticle-based memristor structure 有权
    基于纳米颗粒的忆阻器结构

    公开(公告)号:US09035272B2

    公开(公告)日:2015-05-19

    申请号:US13742939

    申请日:2013-01-16

    Abstract: A memristor structure has two electrodes sandwiching an insulating region, and includes a nanoparticle providing a conducting path between the two electrodes, wherein either the insulating region comprises an inorganic material and nanoparticle comprises a solid nanoparticle or a core/shell nanoparticle or the insulating region comprises an inorganic or organic material and the nanoparticle comprises a core/shell nanoparticle.

    Abstract translation: 忆阻器结构具有夹着绝缘区域的两个电极,并且包括在两个电极之间提供导电路径的纳米颗粒,其中绝缘区域包括无机材料,并且纳米颗粒包含固体纳米颗粒或核/壳纳米颗粒,或绝缘区域包括 无机或有机材料,纳米颗粒包含核/壳纳米颗粒。

    DYE SUBLIMATION INKJET INK SET
    47.
    发明申请

    公开(公告)号:US20210388226A1

    公开(公告)日:2021-12-16

    申请号:US17417484

    申请日:2019-07-12

    Abstract: An example dye sublimation inkjet ink set includes a first dye sublimation inkjet ink and a second dye sublimation inkjet ink. The first dye sublimation inkjet ink includes a disperse dye colorant dispersion including a first disperse dye having absorption at a radiation wavelength ranging from about 360 nm to about 410 nm; an additive to absorb energy at the radiation wavelength ranging from about 360 nm to about 410 nm and to dissipate at least some of the absorbed energy as fluorescence; a co-solvent; and a balance of water. The additive is selected from the group consisting of a compound containing from 3 to 5 fused benzene rings and and a coumarin derivative. The second dye sublimation inkjet ink includes a disperse dye colorant dispersion including a second disperse dye having less absorption at the radiation wavelength than the first disperse dye; a co-solvent; and a balance of water.

    TEXTILE PRINTING
    48.
    发明申请

    公开(公告)号:US20210363695A1

    公开(公告)日:2021-11-25

    申请号:US17058686

    申请日:2018-11-13

    Abstract: The present disclosure includes a textile printing system including a fabric substrate and an ink composition. The ink composition can include water, organic co-solvent, from 0.5 wt % to 15 wt % pigment with a dispersant associated with a surface thereof, and from 0.1 wt % to 30 wt % of polyurethane particles including sulfonated- or carboxylated-diamine groups and isocyanate-generated amine groups.

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