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公开(公告)号：US20110181859A1
公开(公告)日：2011-07-28
申请号：US13082038
申请日：2011-04-07
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号： G03B27/54
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US07936444B2
公开(公告)日：2011-05-03
申请号：US12068546
申请日：2008-02-07
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译： 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。
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43.发明授权Lithographic apparatus, immersion projection apparatus and device manufacturing method 有权平版印刷装置，浸没投影装置及装置的制造方法公开(公告)号：US07859644B2
公开(公告)日：2010-12-28
申请号：US12000774
申请日：2007-12-17
申请人： Jan-Gerard Cornelis Van Der Toorn , Hans Butler , Henrikus Herman Marie Cox , Evert Hendrik Jan Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Hermanus Frencken , Martijn Houkes , Antonius Henricus Arends , Minne Cuperus
发明人： Jan-Gerard Cornelis Van Der Toorn , Hans Butler , Henrikus Herman Marie Cox , Evert Hendrik Jan Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Hermanus Frencken , Martijn Houkes , Antonius Henricus Arends , Minne Cuperus
CPC分类号： G03F7/70341
摘要： A control system configured to control a position of a fluid supply system, the fluid supply system constructed and arranged to supply a fluid between a substrate and a projection system, the substrate positioned with a substrate stage, the control system including a controller configured to determine a desired position of the fluid supply system based on a position signal to be provided to the substrate stage and a position offset, the position offset added to the position signal to be provided to the substrate stage.
摘要翻译： 控制系统，被配置为控制流体供应系统的位置，所述流体供应系统构造和布置成在基板和投影系统之间提供流体，所述基板定位在基板台上，所述控制系统包括控制器，所述控制器被配置为确定 基于要提供给衬底台的位置信号和位置偏移的流体供应系统的期望位置，位置偏移被添加到要提供给衬底台的位置信号。
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公开(公告)号：US07817243B2
公开(公告)日：2010-10-19
申请号：US10822139
申请日：2004-04-12
IPC分类号： G03B27/42
摘要： A vibration isolation system isolates a body from its surroundings with respect to vibrations. The vibration isolation system includes active isolator devices that isolate and damp the body in unstable directions. However, such active isolators may exert damping forces not only in the unstable direction, but simultaneously in other stable directions due to mechanical coupling of the stable and unstable directions. As a result the damping and isolation in the other stable directions may be deteriorated due to the active isolation and damping. Employing modal decoupling, i.e. decomposing any vibration into independent directions, and isolating and damping in the independent directions, enables compensation of any vibration in an unstable direction without influencing the isolation and damping performance in any other, possibly stable, direction.
摘要翻译： 振动隔离系统将身体与其周围环境相隔离。 隔振系统包括主动隔离装置，可在不稳定的方向隔离和潮湿身体。 然而，这种有源隔离器不仅可以在不稳定的方向施加阻尼力，而且可以由于稳定和不稳定方向的机械耦合而在其它稳定的方向上施加阻尼力。 结果，由于主动隔离和阻尼，其它稳定方向的阻尼和隔离可能会恶化。 采用模态去耦，即将任何振动分解为独立的方向，以及在独立方向上进行隔离和阻尼，可以补偿不稳定方向上的任何振动，而不会影响任何其他可能稳定的方向的隔离和阻尼性能。
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公开(公告)号：US07701550B2
公开(公告)日：2010-04-20
申请号：US10921348
申请日：2004-08-19
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译： 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号：US07352434B2
公开(公告)日：2008-04-01
申请号：US10844575
申请日：2004-05-13
申请人： Bob Streefkerk , Levinus Pieter Bakker , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob Streefkerk , Levinus Pieter Bakker , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译： 在光刻设备中，将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度，以将液体供应系统保持在基板表面上方的预定高度。
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