公开(公告)号：US07459690B2

公开(公告)日：2008-12-02

申请号：US11432365

申请日：2006-05-12

申请人： Jan Evert Van Der Werf ,  Mark Kroon ,  Wilhelmus Cornelis Keur ,  Vadim Yevgenyevich Banine ,  Hans Van Der Laan ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra

发明人： Jan Evert Van Der Werf ,  Mark Kroon ,  Wilhelmus Cornelis Keur ,  Vadim Yevgenyevich Banine ,  Hans Van Der Laan ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra

IPC分类号： G01J1/42

CPC分类号： G03F7/70558 ,  G01J1/58 ,  G03F7/70741 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

摘要： A radiation sensor for use with a lithographic apparatus is disclosed, the radiation sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting the secondary radiation emerging from said layer.

摘要翻译： 公开了一种用于光刻设备的辐射传感器，辐射传感器包括将波长λ1的入射辐射转换成次级辐射的辐射敏感材料; 以及能够检测从所述层出现的二次辐射的感测装置。

公开(公告)号：US07274434B2

公开(公告)日：2007-09-25

申请号：US10995525

申请日：2004-11-24

申请人： Hans Van Der Laan ,  Manfred Bernhard Suddendorf

发明人： Hans Van Der Laan ,  Manfred Bernhard Suddendorf

IPC分类号： G03B27/68 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/7025 ,  G03F7/70091

摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation of radiation; a support configured to support a patterning device configured to impart a pattern to the beam of radiation; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate, the projection system and/or illumination system including a focusing element; a plurality of stop discs each having an aperture therethrough different from the size and/or shape of the apertures of the other stop discs; and a mechanism configured to exchangeably place a selected one of the stop discs adjacent to the focusing element.

摘要翻译： 光刻设备包括被配置为提供辐射辐射束的照明系统; 支撑件，被配置为支撑构造成将图案赋予所述辐射束的图案形成装置; 被配置为保持基板的基板台; 投影系统，被配置为将图案化的光束投影到基板的目标部分上，投影系统和/或照明系统包括聚焦元件; 多个止动盘，每个止动盘各自具有与其它止动盘的孔的尺寸和/或形状不同的孔; 以及被配置为可交换地将选定的一个止动盘放置在与聚焦元件相邻的机构。

公开(公告)号：US20060109436A1

公开(公告)日：2006-05-25

申请号：US10995525

申请日：2004-11-24

申请人： Hans Van Der Laan ,  Manfred Suddendorf

发明人： Hans Van Der Laan ,  Manfred Suddendorf

IPC分类号： G03B27/68

CPC分类号： G03F7/7025 ,  G03F7/70091

摘要： A lithographic apparatus includes an illumination system configured to provide a beam of radiation of radiation; a support configured to support a patterning device configured to impart a pattern to the beam of radiation; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate, the projection system and/or illumination system including a focusing element; a plurality of stop discs each having an aperture therethrough different from the size and/or shape of the apertures of the other stop discs; and a mechanism configured to exchangeably place a selected one of the stop discs adjacent to the focusing element.

摘要翻译： 光刻设备包括被配置为提供辐射辐射束的照明系统; 支撑件，被配置为支撑构造成将图案赋予所述辐射束的图案形成装置; 被配置为保持基板的基板台; 投影系统，被配置为将图案化的光束投影到基板的目标部分上，投影系统和/或照明系统包括聚焦元件; 多个止动盘，每个止动盘各自具有与其它止动盘的孔的尺寸和/或形状不同的孔; 以及被配置为可交换地将选定的一个止动盘放置在与聚焦元件相邻的机构。

公开(公告)号：US20050280795A1

公开(公告)日：2005-12-22

申请号：US11202195

申请日：2005-08-12

申请人： Jan Van Der Werf ,  George Fockert ,  Hans Van Der Laan

发明人： Jan Van Der Werf ,  George Fockert ,  Hans Van Der Laan

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G03B27/54

CPC分类号： G03F7/70258 ,  G03F7/70233 ,  G03F7/70591 ,  G03F9/7015 ,  G03F9/7088

摘要： A reflector alignment system uses an alignment beam propagating through a projection system that includes a mirror group to measure the apparent relative positions of two reference marks fixed to a reference frame on opposite sides of the projection system. Any movement of mirrors in the projection system will be detected as a shift in the apparent position of the reference marks.