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1.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07459690B2
公开(公告)日：2008-12-02
申请号：US11432365
申请日：2006-05-12
申请人： Jan Evert Van Der Werf , Mark Kroon , Wilhelmus Cornelis Keur , Vadim Yevgenyevich Banine , Hans Van Der Laan , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra
发明人： Jan Evert Van Der Werf , Mark Kroon , Wilhelmus Cornelis Keur , Vadim Yevgenyevich Banine , Hans Van Der Laan , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra
IPC分类号： G01J1/42
CPC分类号： G03F7/70558 , G01J1/58 , G03F7/70741 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： A radiation sensor for use with a lithographic apparatus is disclosed, the radiation sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting the secondary radiation emerging from said layer.
摘要翻译： 公开了一种用于光刻设备的辐射传感器，辐射传感器包括将波长λ1的入射辐射转换成次级辐射的辐射敏感材料; 以及能够检测从所述层出现的二次辐射的感测装置。
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2.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07075620B2
公开(公告)日：2006-07-11
申请号：US10820103
申请日：2004-04-08
申请人： Jan Evert Van Der Werf , Mark Kroon , Wilhelmus Cornelis Keur , Vadim Yevgenyevich Banine , Hans Van Der Laan , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra
发明人： Jan Evert Van Der Werf , Mark Kroon , Wilhelmus Cornelis Keur , Vadim Yevgenyevich Banine , Hans Van Der Laan , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra
IPC分类号： G01B11/00
CPC分类号： G03F7/70558 , G01J1/58 , G03F7/70741 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength λ1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.
摘要翻译： 光刻投影设备包括用于提供具有小于50nm的波长λ1的辐射的投影光束的辐射系统; 用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构; 用于保持衬底的衬底台; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。 该装置还包括辐射传感器，其被定位成能够将辐射从投影光束中接收，所述传感器包括辐射敏感材料，其将波长λ1的入射辐射转换成二次辐射 ; 以及能够检测从所述层出射的所述次级辐射的感测装置。
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3.发明授权Device manufacturing method, device manufactured thereby and a mask for use in the method 有权装置制造方法，由此制造的装置和用于该方法的掩模公开(公告)号：US07492443B2
公开(公告)日：2009-02-17
申请号：US11023359
申请日：2004-12-29
申请人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
发明人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
CPC分类号： G03F7/707 , G03F7/70233 , G03F7/70258 , G03F7/70283 , G03F7/703
摘要： A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
摘要翻译： 根据本发明的一个实施例的器件制造方法包括定位反射图案形成结构以将辐射束的至少一部分反射为在其横截面中具有图案的图案化辐射束。 该方法还包括使用投影系统投影图案化的辐射束以在辐射敏感材料层的目标部分上形成图像。 定位包括根据失真值相对于投影系统的标称物平面移动和倾斜反射图案形成结构的标称反射表面中的至少一个。
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4.发明申请Device manufacturing method, device manufactured thereby and a mask for use in the method 有权装置制造方法，由此制造的装置和用于该方法的掩模公开(公告)号：US20050146703A1
公开(公告)日：2005-07-07
申请号：US11023359
申请日：2004-12-29
申请人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
发明人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
IPC分类号： G03F1/16 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/707 , G03F7/70233 , G03F7/70258 , G03F7/70283 , G03F7/703
摘要： A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of raditaion as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
摘要翻译： 根据本发明的一个实施例的器件制造方法包括定位反射图案形成结构，以将辐射束的至少一部分反射为在其横截面中具有图案的图案化的辐射束。 该方法还包括使用投影系统投影图案化的辐射束以在辐射敏感材料层的目标部分上形成图像。 定位包括根据失真值相对于投影系统的标称物平面移动和倾斜反射图案形成结构的标称反射表面中的至少一个。
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5.发明授权Device manufacturing method, device manufactured thereby and a mask for use in the method 有权装置制造方法，由此制造的装置和用于该方法的掩模公开(公告)号：US06879374B2
公开(公告)日：2005-04-12
申请号：US10173559
申请日：2002-06-18
申请人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
发明人： Jan Evert Van Der Werf , Erik Roelof Loopstra , Hans Meiling , Johannes Hubertus Josephina Moors , Martinus Hendrikus Antonius Leenders
CPC分类号： G03F7/707 , G03F7/70233 , G03F7/70258 , G03F7/70283 , G03F7/703
摘要： A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.
摘要翻译： 根据本发明的一个实施例的器件制造方法包括定位反射图案形成结构以将辐射束的至少一部分反射为在其横截面中具有图案的图案化辐射束。 该方法还包括使用投影系统投影图案化的辐射束以在辐射敏感材料层的目标部分上形成图像。 定位包括根据失真值相对于投影系统的标称物平面移动和倾斜反射图案形成结构的标称反射表面中的至少一个。
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公开(公告)号：US08373846B2
公开(公告)日：2013-02-12
申请号：US12553368
申请日：2009-09-03
申请人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
发明人： Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
CPC分类号： H05G2/006 , G03F7/70033 , G03F7/70891 , G03F7/70916 , G21K1/06 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.
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7.发明申请Lithographic Apparatus, Spectral Purity Filter and Device Manufacturing Method 有权光刻设备，光谱纯化过滤器和器件制造方法公开(公告)号：US20140085619A1
公开(公告)日：2014-03-27
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。
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8.发明授权Lithographic apparatus, spectral purity filter and device manufacturing method 有权平版印刷设备，光谱纯度滤光片和器件制造方法公开(公告)号：US09594306B2
公开(公告)日：2017-03-14
申请号：US14002000
申请日：2011-12-21
申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
发明人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。
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公开(公告)号：US08507882B2
公开(公告)日：2013-08-13
申请号：US12543578
申请日：2009-08-19
申请人： Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors
发明人： Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors
CPC分类号： G03F7/70916 , G03F7/70033 , G03F7/70858 , G03F7/70983 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a droplet generator constructed and arranged to generate fuel droplets, a heater constructed and arranged to heat the fuel droplets following generation of the fuel droplets by the droplet generator, and reduce the mass of fuel present in the fuel droplets and/or reduce the density of the fuel droplets, and a radiation emitter constructed and arranged to direct radiation onto the fuel droplets that have been heated by the heater to generate the extreme ultraviolet radiation.
摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括构造和布置成产生燃料液滴的液滴发生器，被构造和布置成在液滴发生器产生燃料液滴之后加热燃料液滴的加热器，并且减少燃料液滴中存在的燃料质量和/或 降低燃料液滴的密度，以及被构造和布置成将辐射引导到已被加热器加热以产生极紫外辐射的燃料液滴上的辐射发射器。
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公开(公告)号：US20090090877A1
公开(公告)日：2009-04-09
申请号：US12197693
申请日：2008-08-25
申请人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriel Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
发明人： Tjarko Adriaan Rudolf Van Empel , Vadim Yevgenyevich Banine , Vladimir Vitalevich Ivanov , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriel Van De Vijver , Gerardus Hubertus Petrus Maria Swinkels , Hendrikus Gijsbertus Schimmel , Dzmitry Labetski
CPC分类号： H05G2/008 , G03F7/70175 , G03F7/70891 , G03F7/70916 , G03F7/70983 , H05G2/003 , H05G2/006 , H05K7/2039
摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.
摘要翻译： 用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于 在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。 此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。 流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。
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