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    HYDROPHILIC COATINGS, METHODS FOR DEPOSITING HYDROPHILIC COATINGS AND IMPROVED DEPOSITION TECHNOLOGY FOR THIN FILMS
    41.
    发明申请
    HYDROPHILIC COATINGS, METHODS FOR DEPOSITING HYDROPHILIC COATINGS AND IMPROVED DEPOSITION TECHNOLOGY FOR THIN FILMS 审中-公开
    水解涂料，沉积水解涂料的方法和改进的薄膜沉积技术

    公开(公告)号：US20110165413A1

    公开(公告)日：2011-07-07

    申请号：US13036155

    申请日：2011-02-28

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： B32B17/00 ,  B32B17/06

    CPC分类号： C23C14/08 ,  C03C17/36 ,  C03C17/366 ,  C03C2217/71 ,  C03C2217/75 ,  C03C2217/78 ,  C03C2218/154 ,  C03C2218/365 ,  C23C14/3464 ,  Y10T428/252 ,  Y10T428/266

    摘要： The invention provides certain embodiments that involve sputtering techniques for applying a mixed oxide film comprising silica and titania. In these embodiments, the techniques involve sputtering at least two targets in a common chamber (e.g., in a shared gaseous atmosphere). A first of these targets includes silicon, while a second of the targets includes titanium. Further, the invention provides embodiments involving a substrate bearing a hydrophilic coating, which can be deposited by sputtering or any other suitable thin film deposition technique. The invention also provides techniques and apparatuses useful for depositing a wide variety of coating types. For example, the invention provides thin film deposition technologies in which sputtering apparatuses or other thin film deposition apparatuses are employed.

    摘要翻译： 本发明提供了涉及用于施加包含二氧化硅和二氧化钛的混合氧化物膜的溅射技术的某些实施方案。 在这些实施例中，这些技术涉及在公共室中（例如，在共享气体气氛中）溅射至少两个靶。 这些目标中的第一个包括硅，而第二个目标包括钛。 此外，本发明提供了涉及具有亲水涂层的基底的实施例，其可以通过溅射或任何其它合适的薄膜沉积技术进行沉积。 本发明还提供了用于沉积各种涂层类型的技术和装置。 例如，本发明提供了使用溅射装置或其它薄膜沉积装置的薄膜沉积技术。

    Coater having interrupted conveyor system
    42.
    发明授权
    Coater having interrupted conveyor system 有权
    涂布机中断输送系统

    公开(公告)号：US07749364B2

    公开(公告)日：2010-07-06

    申请号：US11214663

    申请日：2005-08-29

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： C23C14/34 ,  C23C16/00

    CPC分类号： C23C14/0652 ,  C03C17/002 ,  C03C2218/365 ,  C23C14/086 ,  C23C14/10 ,  C23C14/185 ,  C23C14/56 ,  C23C14/568

    摘要： Methods and coaters for applying films onto a substrate (e.g., a large-area glass substrate) are disclosed. Certain embodiments involve a coater for applying thin films onto a sheet-like substrate. The coater in some embodiments has a transport system adapted for conveying the substrate along a path of substrate travel extending through the coater. The substrate transport system in certain embodiments includes an upward coating deposition gap. The coater preferably has a source of coating material adapted for delivering coating material upwardly through such gap and onto a bottom major surface of the substrate as the substrate is conveyed along a desired portion of the path of substrate travel, which portion of the path of substrate travel extends over the upward coating deposition gap.

    摘要翻译： 公开了将膜施加到基板（例如，大面积玻璃基板）上的方法和涂布机。 某些实施方案涉及用于将薄膜施加到片状基底上的涂布机。 一些实施例中的涂布机具有适于沿着延伸穿过涂布机的基板行程的路径输送基板的输送系统。 在某些实施方案中，基底输送系统包括向上的涂层沉积间隙。 涂布机优选地具有涂层材料源，其适于将涂层材料向上输送通过这样的间隙并且沿着衬底行进的路径的期望部分输送衬底的底部主表面，衬底的路径的哪个部分 行进延伸超过向上的涂层沉积间隙。

    CORROSION-RESISTANT LOW-EMISSIVITY COATINGS
    46.
    发明申请
    CORROSION-RESISTANT LOW-EMISSIVITY COATINGS 审中-公开
    耐腐蚀低电感涂层

    公开(公告)号：US20070248791A1

    公开(公告)日：2007-10-25

    申请号：US11759339

    申请日：2007-06-07

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： B32B7/00

    CPC分类号： C03C17/3613 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/366 ,  C03C17/3681 ,  C03C2217/78 ,  Y10T428/24 ,  Y10T428/265

    摘要： A corrosion-resistant low-emissivity coating is provided. The low-emissivity coating comprises, in sequence outwardly, a corrosion-resistant inner infrared-reflective layer, a transparent dielectric middle coat, and an outer infrared-reflective layer. The outer infrared-reflective layer consists essentially of silver and the corrosion-resistant inner infrared-reflective layer has a different composition than the outer infrared-reflective layer. Also provided are methods for depositing coatings of this nature, as well as substrates bearing these coatings.

    摘要翻译： 提供耐腐蚀的低辐射涂层。 低辐射涂层依次向外包括耐腐蚀的内部红外反射层，透明电介质中间涂层和外部红外反射层。 外部红外反射层基本上由银组成，耐腐蚀的内部红外反射层具有与外部红外反射层不同的组成。 还提供了用于沉积这种性质的涂层以及承载这些涂层的基材的方法。

    Concentration-modulated coatings
    50.
    发明授权
    Concentration-modulated coatings 有权
    浓度调制涂层

    公开(公告)号：US07192647B2

    公开(公告)日：2007-03-20

    申请号：US10876254

    申请日：2004-06-24

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： B32B17/06

    CPC分类号： C03C17/3613 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3694 ,  C23C14/086 ,  C23C14/352 ,  C23C14/568 ,  Y10T428/265

    摘要： The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type low-emissivity coating. The graded film region has a substantially continuously decreasing concentration of a first dielectric material and a substantially continuously increasing concentration of a second dielectric material. Also provided are methods of depositing such low-emissivity coatings and substrates bearing these coatings.

    摘要翻译： 本发明提供一种承载低发射率涂层的基片。 低辐射涂层包括至少一个分级膜区域。 在某些实施例中，在双型低辐射率涂层的两个红外反射层之间提供至少一个分级膜区域。 分级膜区域具有基本上连续降低的第一介电材料的浓度和基本上连续增加的第二介电材料的浓度。 还提供了沉积这种低辐射率涂层和承载这些涂层的基材的方法。