公开(公告)号：US20060147201A1

公开(公告)日：2006-07-06

申请号：US11294877

申请日：2005-12-06

申请人： Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Koji Kaneyama ,  Tsuyoshi Okumura

发明人： Toru Asano ,  Yukio Toriyama ,  Takashi Taguchi ,  Tsuyoshi Mitsuhashi ,  Koji Kaneyama ,  Tsuyoshi Okumura

IPC分类号： G03D5/00

CPC分类号： G03F7/70991 ,  G03F7/70341

摘要： An interface transport mechanism employs an upper hand during the transport of a substrate to an exposure device, and employs a lower hand during the transport of the substrate that has been carried out of the exposure device. A fifth central robot employs a lower hand during the transport of a substrate after the exposure processing by an exposure device, and employs an upper hand during the transport of a substrate after the drying processing that has been carried out of a drying processing group. That is, the upper hand is employed to transport a substrate to which no liquid is attached, and the lower hand is employed to transport a substrate to which a liquid is attached after the exposure processing.

摘要翻译： 接口传送机构在将基板传送到曝光装置期间采用上手，并且在已经从曝光装置执行的基板的传送期间使用下手。 第五中央机器人在通过曝光装置进行曝光处理之后的基板传送期间使用下手，并且在从干燥处理组进行的干燥处理之后的基板的输送过程中采用上手。 也就是说，上面用于输送没有附着液体的基板，并且在曝光处理之后使用下手来输送附着有液体的基板。

公开(公告)号：US20060098977A1

公开(公告)日：2006-05-11

申请号：US11273441

申请日：2005-11-10

申请人： Koji Kaneyama

发明人： Koji Kaneyama

IPC分类号： G03D5/00

CPC分类号： G03F7/70741 ,  G03F7/7075

摘要： An interface transport mechanism uses an upper hand when transporting a substrate from a substrate platform to an exposure device before exposure processing by an exposure device, and uses a lower hand when transporting the substrate from the exposure device to the substrate platform after the exposure processing by the exposure device. That is, the lower hand is used to transport a substrate to which a liquid is attached after exposure processing, and the upper hand is used to transport a substrate to which no liquid is attached before exposure processing.

摘要翻译： 接口传送机构在曝光装置进行曝光处理之前将基板从基板平台传送到曝光装置时使用上手，并且在曝光处理之后将基板从曝光装置传送到基板平台时使用下手， 曝光装置。 也就是说，下表用于在曝光处理之后传送附着有液体的基板，并且在曝光处理之前用上手来输送不附着液体的基板。

公开(公告)号：US06760190B2

公开(公告)日：2004-07-06

申请号：US10075988

申请日：2002-02-15

申请人： Atsushi Kato ,  Koji Kaneyama ,  Kiyonori Shiraki

发明人： Atsushi Kato ,  Koji Kaneyama ,  Kiyonori Shiraki

IPC分类号： G11B5147

CPC分类号： G11B5/3116 ,  G11B5/012 ,  G11B5/313 ,  G11B5/3163 ,  G11B5/3967 ,  Y10S428/90 ,  Y10T428/11 ,  Y10T428/1143

摘要： A magnetic head comprises: an induction type head for recording including a lower magnetic core, a writing gap film formed on the lower magnetic core, an upper magnetic core having a track portion and a portion spreading from the track portion, a plurality of insulating films laminated between the lower magnetic core and the upper magnetic core, and a coil formed between the plurality of insulating films. One of the plurality of insulating films is an insulating film determining a zero throat level position. The track portion of the upper magnetic core extends to an air bearing surface. A magnetoresistance effect type head for reproducing includes a lower shielding film and a magnetoresistance effect sensor film between the lower shielding film and the lower magnetic core. The position where the upper magnetic core spreads is located nearer to the air bearing surface than the tip end position arranged nearest to the air bearing surface among the tip end positions of the insulating films formed on the insulating film determining the zero throat level position. This can provide a magnetic head having good magnetic characteristics and improved accuracy in the width of a track on the air bearing surface.

摘要翻译： 磁头包括：用于记录的感应型头，包括下磁芯，形成在下磁芯上的书写间隙膜，具有轨道部分的上磁芯和从轨道部分扩展的部分，多个绝缘膜 层叠在下磁芯和上磁芯之间，以及形成在多个绝缘膜之间的线圈。 多个绝缘膜中的一个是确定零喉部位置的绝缘膜。 上磁芯的轨道部分延伸到空气轴承表面。 用于再现的磁阻效应型头包括下屏蔽膜和下屏蔽膜和下磁芯之间的磁阻效应传感器膜。 在形成在绝缘膜上的绝缘膜的顶端位置中，最靠近空气轴承表面布置的顶端位置比上磁芯扩展的位置更靠近空气轴承表面，从而确定零喉位置。 这可以提供具有良好的磁特性和提高空气轴承表面上的轨道的宽度精度的磁头。

公开(公告)号：US08635968B2

公开(公告)日：2014-01-28

申请号：US13019711

申请日：2011-02-02

申请人： Koji Kaneyama

发明人： Koji Kaneyama

IPC分类号： B05C13/02 ,  G03D5/00

CPC分类号： G03F7/70975 ,  G03B27/58 ,  G03F7/70741 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/67745 ,  H01L21/68707 ,  Y10S134/902

摘要： A substrate subjected to back surface cleaning by a back surface cleaning processing unit is held by a hand of an interface transport mechanism and transported to a cooling unit. The substrate whose temperature has been adjusted by the cooling unit is held by a hand of the interface transport mechanism and transported to an exposure device. The substrate subjected to exposure processing by the exposure device is held by a hand of the interface transport mechanism and transported from the exposure device to a substrate platform.

摘要翻译： 通过背面清洁处理单元进行后表面清洁的基板由界面输送机构的手保持并被输送到冷却单元。 温度由冷却单元调节的基板由界面输送机构的手保持并被输送到曝光装置。 通过曝光装置进行曝光处理的基板由界面输送机构的手保持并从曝光装置传送到基板平台。

公开(公告)号：US20050220985A1

公开(公告)日：2005-10-06

申请号：US11130376

申请日：2005-05-16

申请人： Koji Kaneyama ,  Akihiro Hisai

发明人： Koji Kaneyama ,  Akihiro Hisai

IPC分类号： B05C11/00 ,  B05D1/00 ,  G03F7/16 ,  G11B7/26 ,  H01L21/00

CPC分类号： H01L21/67253 ,  G03F7/16 ,  G11B7/261

摘要： A substrate processing apparatus is provided with a film quality measuring device that measures the density of a resist film on a substrate as the film quality. Measurement of the density of the resist film is performed after resist-coating or during or after heat-treatment followed by the resist-coating. The film quality measuring device also measures the thickness of the resist film on the substrate before exposure after the heat-treatment followed by the resist-coating. A controller controls a processing condition in a coater or a heating device so that each of the density and thickness of the resist film on the substrate falls within an acceptable range.

摘要翻译： 基板处理装置设置有膜质量测量装置，其测量作为膜质量的基板上的抗蚀剂膜的密度。 抗蚀剂膜的密度的测量在抗蚀涂层之后或在热处理之后或之后进行抗蚀剂涂覆。 膜质量测量装置还测量在热处理之后的抗蚀剂涂层之前的曝光之前的基板上的抗蚀剂膜的厚度。 控制器控制涂布机或加热装置中的处理条件，使得基板上的抗蚀剂膜的密度和厚度各自在可接受的范围内。

公开(公告)号：US06436560B1

公开(公告)日：2002-08-20

申请号：US09343724

申请日：1999-06-30

申请人： Atsushi Kato ,  Koji Kaneyama ,  Kiyonori Shiraki

发明人： Atsushi Kato ,  Koji Kaneyama ,  Kiyonori Shiraki

IPC分类号： G11B566

CPC分类号： G11B5/3116 ,  G11B5/012 ,  G11B5/313 ,  G11B5/3163 ,  G11B5/3967 ,  Y10S428/90 ,  Y10T428/11 ,  Y10T428/1143

摘要： A magnetic head comprises: an induction type head for recording including a lower magnetic core, a writing gap film formed on the lower magnetic core, an upper magnetic core having a track portion and a portion spreading from the track portion, a plurality of insulating films laminated between the lower magnetic core and the upper magnetic core, and a coil formed between the plurality of insulating films. One of the plurality insulating films is an insulating film determining a zero throat level position. The track portion of the upper magnetic core is an air bearing surface. A magnetoresistance effect type head for reproducing includes a lower shielding film and a magnetoresistance effect sensor film is formed between the lower shielding film and the lower magnetic core. The position where the upper magnetic core spreads is located nearer to the air bearing surface than the tip end position arranged nearest to the air bearing surface among the tip end positions of the insulating films formed on the insulating film determining the zero throat level position. This can provide a magnetic head having good magnetic characteristics and improved accuracy in the width of a track on the air bearing surface.

摘要翻译： 磁头包括：用于记录的感应型头，包括下磁芯，形成在下磁芯上的书写间隙膜，具有轨道部分的上磁芯和从轨道部分扩展的部分，多个绝缘膜 层叠在下磁芯和上磁芯之间，以及形成在多个绝缘膜之间的线圈。 多个绝缘膜中的一个是确定零喉部位置的绝缘膜。 上磁芯的轨道部分是空气轴承表面。 用于再现的磁阻效应型头包括下屏蔽膜，并且在下屏蔽膜和下磁芯之间形成磁阻效应传感器膜。 在形成在绝缘膜上的绝缘膜的顶端位置中，最靠近空气轴承表面布置的顶端位置比上磁芯扩展的位置更靠近空气轴承表面，从而确定零喉位置。 这可以提供具有良好的磁特性和提高空气轴承表面上的轨道的宽度精度的磁头。

公开(公告)号：US07658560B2

公开(公告)日：2010-02-09

申请号：US11273441

申请日：2005-11-10

申请人： Koji Kaneyama

发明人： Koji Kaneyama

IPC分类号： G03D5/00 ,  G03B27/52

CPC分类号： G03F7/70741 ,  G03F7/7075

摘要： An interface transport mechanism uses an upper hand when transporting a substrate from a substrate platform to an exposure device before exposure processing by an exposure device, and uses a lower hand when transporting the substrate from the exposure device to the substrate platform after the exposure processing by the exposure device. That is, the lower hand is used to transport a substrate to which a liquid is attached after exposure processing, and the upper hand is used to transport a substrate to which no liquid is attached before exposure processing.

摘要翻译： 接口传送机构在曝光装置进行曝光处理之前将基板从基板平台传送到曝光装置时使用上手，并且在曝光处理之后将基板从曝光装置传送到基板平台时使用下手， 曝光装置。 也就是说，下表用于在曝光处理之后传送附着有液体的基板，并且在曝光处理之前用上手来传送不附着液体的基板。

公开(公告)号：US20060104635A1

公开(公告)日：2006-05-18

申请号：US11273439

申请日：2005-11-10

申请人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi

发明人： Koji Kaneyama ,  Akihiro Hisai ,  Toru Asano ,  Hiroshi Kobayashi

IPC分类号： G03D5/00

CPC分类号： G03F7/70991 ,  Y10S414/135

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate in the resist film processing block. A resist cover film is formed on the resist film in the resist cover film processing block before the substrate is subjected to exposure processing by the exposure device.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块和界面块。 曝光装置设置在接口块附近。 在抗蚀剂膜处理块中的基板上形成抗蚀剂膜。 在通过曝光装置对基板进行曝光处理之前，在抗蚀剂覆盖膜处理块的抗蚀剂膜上形成抗蚀剂覆盖膜。

公开(公告)号：US06913781B2

公开(公告)日：2005-07-05

申请号：US10170776

申请日：2002-06-12

申请人： Koji Kaneyama ,  Akihiro Hisai

发明人： Koji Kaneyama ,  Akihiro Hisai

IPC分类号： B05C11/00 ,  B05C11/08 ,  B05D1/40 ,  B05D3/00 ,  B05D3/02 ,  G03F7/16 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  B05C9/14 ,  B05D11/00

CPC分类号： H01L21/67253 ,  B05D3/0254 ,  G03F7/162

摘要： A substrate processing apparatus is provided with five inspection devices that perform inspections of different kinds to a substrate. Among the five kinds of inspections, the film quality is measured after resist coating, and before post-coating heat-treatment. As the film quality, the amount of solvent remaining in a resist film is measured. The film thickness is measured after heat-treatment following resist coating and before exposure. Meanwhile, the line width and the superposition precision are measured and macroscopic defect inspection is performed after post-development heat-treatment and before the substrate is returned to an indexer.

摘要翻译： 基板处理装置设置有五个检查装置，其对基板执行不同种类的检查。 在五种检查中，电影质量在抗蚀涂层后和涂布前热处理后进行测量。 作为膜质量，测定保留在抗蚀剂膜中的溶剂量。 在抗蚀涂层和曝光前的热处理后测量膜厚度。 同时，测量线宽和叠加精度，并且在显影后热处理之后并且在将基板返回到分度器之前进行宏观缺陷检查。