摘要:
A projection display apparatus has at least two dichroic reflecting surfaces, a wavelength plate, a polarizing beam splitter, and two reflection-type liquid crystal display devices. The first dichroic reflecting surface separates a polarized light beam into light beams of two different wavelength ranges. The wavelength plate rotates the polarization plane of the light beam of the first wavelength range. The second dichroic reflecting surface integrates together the light beam of the first wavelength range after the rotation of its polarization plane and the light beam of the second wavelength range. The polarizing beam splitter reflects one and transmits the other of the light beams of the first and second wavelength ranges after the integration by the second dichroic reflecting surface. The reflection-type liquid crystal display devices modulate and reflect the light beams reflected from and transmitted through the polarizing beam splitter, respectively. The polarizing beam splitter transmits the light beam coming from the first reflection-type liquid crystal display device and reflects the light beam coming from the second reflection-type liquid crystal display device so as to integrate together those two light beams.
摘要:
A microwave-assisted plasma processing apparatus has a reaction chamber in which a substrate holder is provided to support a substrate to be treated. The holder is formed congruent with the inside of reaction chamber and located to substantially separate a reaction space in the reaction chamber save for a narrow clearance therebetween through which exhausted gas passes from said reaction space into said auxiliary space. By this structure, high density plasmas can be formed in the reaction chamber without substantial loss of input microwave energy.
摘要:
A plasma processing apparatus and method is equipped with a vacuum chamber, helmoltz coils, Ioffe bars, a microwave generator and gas feeding systems. An auxiliary magnet is further provided in order to strengthen the magnetic field in the vacuum chamber to produce centrifugal drifting force which confine the plasma gas about the center position of the vacuum chamber. Specifically, the method includes establishing a first magnetic field in the vacuum chamber substantially parallel to the direction of propagation of microwaves emitted in the chamber and establishing a second magnetic field substantially perpendicular to the first magnetic field. A substrate in the chamber for plasma processing is placed so that a surface of the substrate is substantially perpendicular to the direction of the first magnetic field and parallel to the direction of the second.