Projection display apparatus
    41.
    发明授权
    Projection display apparatus 失效
    投影显示装置

    公开(公告)号:US06176586B1

    公开(公告)日:2001-01-23

    申请号:US09274910

    申请日:1999-03-23

    IPC分类号: G03B2114

    CPC分类号: H04N9/3105 H04N9/3167

    摘要: A projection display apparatus has at least two dichroic reflecting surfaces, a wavelength plate, a polarizing beam splitter, and two reflection-type liquid crystal display devices. The first dichroic reflecting surface separates a polarized light beam into light beams of two different wavelength ranges. The wavelength plate rotates the polarization plane of the light beam of the first wavelength range. The second dichroic reflecting surface integrates together the light beam of the first wavelength range after the rotation of its polarization plane and the light beam of the second wavelength range. The polarizing beam splitter reflects one and transmits the other of the light beams of the first and second wavelength ranges after the integration by the second dichroic reflecting surface. The reflection-type liquid crystal display devices modulate and reflect the light beams reflected from and transmitted through the polarizing beam splitter, respectively. The polarizing beam splitter transmits the light beam coming from the first reflection-type liquid crystal display device and reflects the light beam coming from the second reflection-type liquid crystal display device so as to integrate together those two light beams.

    摘要翻译: 投影显示装置具有至少两个二向色反射面,波长板,偏振光束分离器和两个反射型液晶显示装置。 第一分色反射表面将偏振光束分成两个不同波长范围的光束。 波长板旋转第一波长范围的光束的偏振面。 第二分色反射表面在其偏振面旋转和第二波长范围的光束之后将第一波长范围的光束聚集在一起。 偏振分束镜反射一个,并且在通过第二二向色反射表面积分之后透射第一和第二波长范围的另一个光束。 反射型液晶显示装置分别对从偏光分束器反射并透射的光束进行调制和反射。 偏振光束分离器透射来自第一反射型液晶显示装置的光束,并且反射来自第二反射型液晶显示装置的光束,以将这两个光束整合在一起。

    Apparatus for microwave processing in a magnetic field
    42.
    发明授权
    Apparatus for microwave processing in a magnetic field 失效
    磁场微波处理装置

    公开(公告)号:US5302226A

    公开(公告)日:1994-04-12

    申请号:US892710

    申请日:1992-05-29

    IPC分类号: H01J37/32 H01L21/00

    摘要: A microwave-assisted plasma processing apparatus has a reaction chamber in which a substrate holder is provided to support a substrate to be treated. The holder is formed congruent with the inside of reaction chamber and located to substantially separate a reaction space in the reaction chamber save for a narrow clearance therebetween through which exhausted gas passes from said reaction space into said auxiliary space. By this structure, high density plasmas can be formed in the reaction chamber without substantial loss of input microwave energy.

    摘要翻译: 微波辅助等离子体处理装置具有反应室,在该反应室中设置有用于支撑被处理基板的基板支架。 保持器与反应室的内部形成一致并且被设置为基本上分离反应室中的反应空间,除了其间的窄间隙,排出的气体从所述反应空间通过所述反应空间进入所述辅助空间。 通过这种结构,可以在反应室中形成高密度等离子体,而不会大量损失输入的微波能量。

    Microwave plasma etching and deposition method employing first and
second magnetic fields
    43.
    发明授权
    Microwave plasma etching and deposition method employing first and second magnetic fields 失效
    采用第一和第二磁场的微波等离子体蚀刻和沉积方法

    公开(公告)号:US5203959A

    公开(公告)日:1993-04-20

    申请号:US766283

    申请日:1991-09-27

    IPC分类号: C23C16/511 H01J37/32

    摘要: A plasma processing apparatus and method is equipped with a vacuum chamber, helmoltz coils, Ioffe bars, a microwave generator and gas feeding systems. An auxiliary magnet is further provided in order to strengthen the magnetic field in the vacuum chamber to produce centrifugal drifting force which confine the plasma gas about the center position of the vacuum chamber. Specifically, the method includes establishing a first magnetic field in the vacuum chamber substantially parallel to the direction of propagation of microwaves emitted in the chamber and establishing a second magnetic field substantially perpendicular to the first magnetic field. A substrate in the chamber for plasma processing is placed so that a surface of the substrate is substantially perpendicular to the direction of the first magnetic field and parallel to the direction of the second.

    摘要翻译: 等离子体处理装置和方法配备有真空室,赫尔兹兹线圈,Ioffe棒,微波发生器和气体供给系统。 进一步提供辅助磁体以加强真空室中的磁场,以产生围绕真空室的中心位置限制等离子体气体的离心漂移力。 具体地,该方法包括在真空室中建立基本上平行于在室中发射的微波的传播方向的第一磁场,并建立基本上垂直于第一磁场的第二磁场。 放置用于等离子体处理的室中的衬底,使得衬底的表面基本上垂直于第一磁场的方向并且平行于第二磁场的方向。