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公开(公告)号：US20090057267A1
公开(公告)日：2009-03-05
申请号：US11896750
申请日：2007-09-05
申请人： Sander Frederik Wuister , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Ivar Schram , Jeroen Herman Lammers , Richard Joseph Marinus Schroeders
发明人： Sander Frederik Wuister , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Ivar Schram , Jeroen Herman Lammers , Richard Joseph Marinus Schroeders
CPC分类号： H01L21/683 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S269/903
摘要： A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion.
摘要翻译： 所公开的用于保持基板的卡盘装置。 卡盘装置包括第一表面部分和第二表面部分，第二表面部分邻近第一表面部分并且至少部分地围绕第一表面部分的边缘延伸并且在使用中被设置成偏转 第一表面部分上的气体，从而被保持在第一表面部分上的基底。
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公开(公告)号：US08845320B2
公开(公告)日：2014-09-30
申请号：US12781225
申请日：2010-05-17
申请人： Catharinus De Schiffart , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen
发明人： Catharinus De Schiffart , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen
CPC分类号： G03F7/0002 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： An arrangement suitable for use in an imprint lithography apparatus is disclosed. The arrangement includes a support structure arranged to support an imprint template arrangement, a first actuator configured to apply a force to the imprint template arrangement, and a second actuator attached to the support structure, and arranged in use to extend between the support structure and the imprint template arrangement, the second actuator configured to apply a force to the imprint template arrangement, a range of movement of the second actuator being greater than a range of movement of the first actuator.
摘要翻译： 公开了适用于压印光刻设备的布置。 该布置包括布置成支撑压印模板布置的支撑结构，被配置为向压印模板布置施加力的第一致动器和附接到支撑结构的第二致动器，并且在使用中布置成在支撑结构和 压印模板布置，所述第二致动器被配置为向所述压印模板布置施加力，所述第二致动器的移动范围大于所述第一致动器的移动范围。
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公开(公告)号：US08319968B2
公开(公告)日：2012-11-27
申请号：US12556818
申请日：2009-09-10
申请人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Pascal Antonius Smits , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Catharinus De Schiffart
发明人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Pascal Antonius Smits , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Catharinus De Schiffart
IPC分类号： G01B11/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7049
摘要： A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.
摘要翻译： 描述了确定衬底相对于压印模板的位置的方法，其中压印模板具有至少三个光栅，并且衬底具有至少三个定位的光栅，使得每个压印模板光栅与相关联的衬底光栅形成复合光栅 ，所述至少三个压印模板光栅和相关联的衬底光栅相对于彼此具有偏移。 该方法包括检测由三个复合光栅反射的辐射强度，并且使用检测到的强度来确定基板或压印模板从位置的位移。
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公开(公告)号：US08043085B2
公开(公告)日：2011-10-25
申请号：US12468743
申请日：2009-05-19
申请人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister , Raymond Wilhelmus Louis Lafarre , Catharinus De Schiffart , Norbert Erwin Therenzo Jansen
发明人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister , Raymond Wilhelmus Louis Lafarre , Catharinus De Schiffart , Norbert Erwin Therenzo Jansen
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography apparatus is disclosed that has a first support structure arranged to support an imprint template, and a first actuator attached to the first support structure, and arranged in use to be located between the first support structure and the imprint template. The first actuator is configured to apply a force to the imprint template. The imprint lithography apparatus further includes a second support structure and a second actuator located between the second support structure and the first support structure. The second actuator is configured to apply a force to the second support structure, wherein a range of movement of the second actuator is greater than a range of movement of the first actuator.
摘要翻译： 公开了一种压印光刻设备，其具有布置成支撑压印模板的第一支撑结构，以及附接到第一支撑结构的第一致动器，并且被布置为位于第一支撑结构和压印模板之间。 第一个致动器被配置为向压印模板施加力。 压印光刻设备还包括位于第二支撑结构和第一支撑结构之间的第二支撑结构和第二致动器。 第二致动器构造成向第二支撑结构施加力，其中第二致动器的运动范围大于第一致动器的移动范围。
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公开(公告)号：US09535322B2
公开(公告)日：2017-01-03
申请号：US13579544
申请日：2011-01-11
申请人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
发明人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
摘要： A method of determining a position of an imprint template in an imprint lithography apparatus. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
摘要翻译： 一种在压印光刻设备中确定压印模板的位置的方法。 在一个实施例中，该方法包括通过扫描在该区域上的对准辐射束来照射其中期望找到对准标记的压印模板的区域，检测从该区域反射或发射的辐射的强度，以及识别对准 通过分析检测到的强度来标记。
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公开(公告)号：US20100297282A1
公开(公告)日：2010-11-25
申请号：US12781225
申请日：2010-05-17
申请人： Catharinus De Schiffart , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen
发明人： Catharinus De Schiffart , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F9/00
摘要： An arrangement suitable for use in an imprint lithography apparatus is disclosed. The arrangement includes a support structure arranged to support an imprint template arrangement, a first actuator configured to apply a force to the imprint template arrangement, and a second actuator attached to the support structure, and arranged in use to extend between the support structure and the imprint template arrangement, the second actuator configured to apply a force to the imprint template arrangement, a range of movement of the second actuator being greater than a range of movement of the first actuator.
摘要翻译： 公开了适用于压印光刻设备的布置。 该布置包括布置成支撑压印模板布置的支撑结构，被配置为向压印模板布置施加力的第一致动器和附接到支撑结构的第二致动器，并且在使用中布置成在支撑结构和 压印模板布置，所述第二致动器被配置为向所述压印模板布置施加力，所述第二致动器的移动范围大于所述第一致动器的移动范围。
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公开(公告)号：US20100065987A1
公开(公告)日：2010-03-18
申请号：US12556818
申请日：2009-09-10
申请人： Arie Jeffrey DEN BOEF , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Pascal Antonius Smits , Sander Frederik Wuister , Yvonne Wandela Kruijt-Stegeman , Catharinus De Schiffart
发明人： Arie Jeffrey DEN BOEF , Andre Bernardus Jeunink , Johannes Petrus Martinus Bernardus Vermeulen , Pascal Antonius Smits , Sander Frederik Wuister , Yvonne Wandela Kruijt-Stegeman , Catharinus De Schiffart
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7049
摘要： A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.
摘要翻译： 描述了确定衬底相对于压印模板的位置的方法，其中压印模板具有至少三个光栅，并且衬底具有至少三个定位的光栅，使得每个压印模板光栅与相关联的衬底光栅形成复合光栅 ，所述至少三个压印模板光栅和相关联的衬底光栅相对于彼此具有偏移。 该方法包括检测由三个复合光栅反射的辐射强度，并且使用检测到的强度来确定基板或压印模板从位置的位移。
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公开(公告)号：US20100044917A1
公开(公告)日：2010-02-25
申请号：US12468743
申请日：2009-05-19
申请人： Yvonne Wendela KRUIJT-STEGEMAN , Andre Bernardus Jeunink , Johannes Petrus, Martinus Bernardus, Vermeulen , Sander Frederik Wuister , Raymond Wilhelmus, Louis Lafarre , Catharinus DE SCHIFFART , Norbert Erwin Therenzo JANSEN
发明人： Yvonne Wendela KRUIJT-STEGEMAN , Andre Bernardus Jeunink , Johannes Petrus, Martinus Bernardus, Vermeulen , Sander Frederik Wuister , Raymond Wilhelmus, Louis Lafarre , Catharinus DE SCHIFFART , Norbert Erwin Therenzo JANSEN
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography apparatus is disclosed that has a first support structure arranged to support an imprint template, and a first actuator attached to the first support structure, and arranged in use to be located between the first support structure and the imprint template. The first actuator is configured to apply a force to the imprint template. The imprint lithography apparatus further includes a second support structure and a second actuator located between the second support structure and the first support structure. The second actuator is configured to apply a force to the second support structure, wherein a range of movement of the second actuator is greater than a range of movement of the first actuator.
摘要翻译： 公开了一种压印光刻设备，其具有布置成支撑压印模板的第一支撑结构，以及附接到第一支撑结构的第一致动器，并且被布置为位于第一支撑结构和压印模板之间。 第一个致动器被配置为向压印模板施加力。 压印光刻设备还包括位于第二支撑结构和第一支撑结构之间的第二支撑结构和第二致动器。 第二致动器构造成向第二支撑结构施加力，其中第二致动器的运动范围大于第一致动器的移动范围。
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公开(公告)号：US08579625B2
公开(公告)日：2013-11-12
申请号：US12285698
申请日：2008-10-10
申请人： Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Wilhelmus Knaapen , Johan Frederik Dijksman , Sander Frederik Wuister , Ivar Schram , Raymond Wilhelmus Louis LaFarre
发明人： Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Wilhelmus Knaapen , Johan Frederik Dijksman , Sander Frederik Wuister , Ivar Schram , Raymond Wilhelmus Louis LaFarre
CPC分类号： B29C59/002 , B29C59/02 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.
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公开(公告)号：US08486485B2
公开(公告)日：2013-07-16
申请号：US13194630
申请日：2011-07-29
申请人： Johan Frederik Dijksman , Anke Pierik , Martin Maurice Vernhout , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Ivar Schram
发明人： Johan Frederik Dijksman , Anke Pierik , Martin Maurice Vernhout , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Ivar Schram
CPC分类号： B41J2/1429 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprintable medium dispenser includes a chamber, a nozzle, and an actuator connected to the chamber and configured to be actuated and thereby generate a pressure wave within the chamber such that imprintable medium is dispensed from the nozzle. The imprintable medium dispenser is provided with a control circuit which includes a monitoring apparatus configured to receive a transient oscillation signal generated when the actuator is actuated, and to monitor the operation of the imprintable medium dispenser by monitoring the transient oscillation signal.
摘要翻译： 可压印的介质分配器包括腔室，喷嘴和连接到腔室并被构造成致动的致动器，从而在腔室内产生压力波，使得可压缩介质从喷嘴分配。 可压印介质分配器设置有控制电路，该控制电路包括被配置为接收致动器致动时产生的瞬态振荡信号的监视装置，并且通过监视瞬时振荡信号来监视可压印介质分配器的操作。
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