摘要:
The present invention relates to an integrated device (10) comprising at least one inorganic photovoltaic cell (16), a substrate supporting the at least one inorganic photovoltaic cell, a prefabricated thin battery (34) coupled to the at least one inorganic photovoltaic cell, and an encapsulation for sealing the integrated device, wherein one of the substrate and the encapsulation is formed by the prefabricated thin battery. The present invention also relates to a method for the manufacturing of such a integrated device.
摘要:
A system and method for heat treating castings and removing sand cores therefrom. The castings are initially located in indexed positions with their x, y, and z coordinates known. The castings are passed through a heat treatment station typically having a series of nozzles mounted in preset positions corresponding to the known indexed positions of the castings passing through the heat treatment station. The nozzles apply fluid to the castings for heat treating the castings and degrading the sand cores for removal from the castings.
摘要:
A co-planar thin film transistor, TFT (22), and a method of fabricating the same, in which an additional insulating layer is provided on the source contact (30) and the drain contact (32) and defined such that a first region (34) of the additional insulating layer occupies substantially the same area as the source contact (30) and a second region (36) of the additional insulating layer occupies substantially the same area as the drain contact (32). This tends to provide a reduction in the gate (62) to source capacitance, and the gate (62) to drain capacitance. In some geometries this can be achieved without any additional masks or defining steps.
摘要:
A display device has a plurality of pixels, each pixel having a current-driven display element (2) coupled between a first conductive layer (28) and a second conductive layer (27), the second conductive layer (27) being coupled to a current supply (26) via a switchable device (12) having a thin film component (122) on a first area of a substrate (120). Each pixel further has a first capacitive device having a first capacitor plate (132) on a second area of the substrate (120), the first capacitor plate (120) being conductively coupled to the thin film component, a second capacitor plate (133) and a first insulating layer (130) between the first capacitor plate (132) and the second capacitor plate (133). Stacked on top of the first capacitive device is a second capacitive device sharing the second capacitor plate (133) with the first capacitive device, the second capacitive device further comprising a third capacitor plate comprising at least a part of the second conductive layer (27), and a second insulating layer (140) between the second capacitor plate and the third capacitor plate. This arrangement benefits from larger capacitances for the first capacitive device and the second capacitive device, making them more robust against the influences of parasitic capacitances.
摘要:
A method of forming shaped structures in liquid crystal display cells, comprises applying a photosensitive layer (6) to a transistor plate (2), and forming the shaped structures on the photosensitive layer in a photolithographic process using a grey-tone photo mask (7, 21). This mask comprises at least one region of semi-transparent material (8, 16, 18), the degree of transparency of which is dependent on the optical band gap of the material.
摘要:
An electronic device (70) comprises a thin film transistor (TFT) (9,59), the TFT including a channel (16) defined in a layer of polycrystalline semiconductor material (10,48). The polycrystalline semiconductor material is produced by crystallising amorphous semiconductor material (2) using metal atoms (6) to promote the crystallisation process. The polycrystalline semiconductor material (10) includes an average concentration of metal atoms in the range 1.3×1018 to 7.5×1018 atoms/cm3. This enables polycrystalline semiconductor TFTs to be formed with leakage properties acceptable for use in active matrix displays using a metal induced crystallisation process of duration significantly less that previously thought necessary. Furthermore, this process duration reduction facilitates the reliable fabrication of poly-Si TFTs having bottom gates formed of metal.
摘要翻译:电子器件(70)包括薄膜晶体管(TFT)(9,59),TFT包括限定在多晶半导体材料层(10,48)中的沟道(16)。 通过使用金属原子(6)使非晶半导体材料(2)结晶以促进结晶过程来生产多晶半导体材料。 多晶半导体材料(10)包括在1.3×10 18至7.5×10 18原子/ cm 3之间的金属原子的平均浓度。 这使得多晶半导体TFT可以形成为可用于有源矩阵显示器中的泄漏特性,其使用的金属诱导结晶过程的持续时间明显少于以前认为必要的时间。 此外,该工艺持续时间缩短有助于可靠地制造具有由金属形成的底部栅极的多晶硅TFT。