-
公开(公告)号：US07601479B2
公开(公告)日：2009-10-13
申请号：US10936753
申请日：2004-09-09
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38 , C08F224/00
CPC分类号： G03F7/0397 , Y10S430/111
摘要： A polymer comprising recurring units of formulae (1) to (4) wherein R1, R3, R4 and R7 are hydrogen or methyl, R2 is an acid labile group, R5 and R6 are hydrogen or hydroxyl, and R8 is a lactone structure group and having a Mw of 1,000-50,000 is provided. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and etching resistance and lends itself to lithographic micropatterning with electron beams or deep UV.
摘要翻译： 包含式（1）至（4）的重复单元的聚合物，其中R1，R3，R4和R7是氢或甲基，R2是酸不稳定基团，R5和R6是氢或羟基，R8是内酯结构基团， 提供Mw为1,000-50,000的Mw。 包含本发明聚合物的抗蚀剂组合物对高能量辐射具有敏感性，改进的分辨率和耐蚀刻性，并且使其自身适用于具有电子束或深紫外线的光刻微图案。
-
42.发明授权公开(公告)号：US08791290B2
公开(公告)日：2014-07-29
申请号：US13069824
申请日：2011-03-23
IPC分类号： C07C67/02
CPC分类号： C07C69/54 , C07C69/653 , C07C2603/68 , C07C2603/74 , C08F20/28 , C08F224/00 , G03F1/32 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325
摘要： The invention provides an acetal compound containing an adamantane ring having an alcoholic hydroxyl group which is protected with an acetal group having a carbonyl moiety of branched structure. A photoresist film comprising a polymer comprising recurring units derived from the acetal compound and an acid generator is characterized by a high dissolution contrast when it is subjected to exposure and organic solvent development to form an image via positive/negative reversal.
摘要翻译： 本发明提供了含有具有醇羟基的金刚烷环的缩醛化合物，该醇羟基被具有支链结构的羰基部分的缩醛基保护。 包含含有衍生自缩醛化合物的重复单元和酸产生剂的聚合物的光致抗蚀剂膜的特征在于当经受曝光和有机溶剂显影时，通过正/负反转形成图像时的高溶解度对比度。
-
43.发明授权Lactone-containing compound, polymer, resist composition, and patterning process 有权含内酯的化合物，聚合物，抗蚀剂组合物和图案化工艺公开(公告)号：US07678530B2
公开(公告)日：2010-03-16
申请号：US11649251
申请日：2007-01-04
CPC分类号： G03F7/0392 , C07D307/00 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： Lactone-containing compounds having formula (1) are novel wherein A1 is a polymerizable functional group having a double bond, R1 is a monovalent C1-C10 hydrocarbon group in which some or all hydrogen atoms are substituted by fluorine atoms, and W is CH2, O or S. They are useful as monomers to produce polymers for the formulation of radiation-sensitive resist compositions which have high transparency to radiation of up to 500 nm and exhibit good development properties. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography.
摘要翻译： 具有式（1）的含内酯化合物是新颖的，其中A1是具有双键的可聚合官能团，R1是其中一些或全部氢原子被氟原子取代的一价C1-C10烃基，W是CH2， O或S.它们可用作制备用于配制辐射敏感抗蚀剂组合物的聚合物的单体，其对高达500nm的辐射具有高透明度并且表现出良好的显影性能。 包含作为基础树脂的聚合物的辐射敏感性抗蚀剂组合物当通过浸渍光刻处理时表现出高分辨率并防止溶解在水中并渗入水中。
-
44.发明申请Lactone-containing compound, polymer, resist composition, and patterning process 有权含内酯的化合物，聚合物，抗蚀剂组合物和图案化工艺公开(公告)号：US20070160929A1
公开(公告)日：2007-07-12
申请号：US11649251
申请日：2007-01-04
IPC分类号： G03C1/00
CPC分类号： G03F7/0392 , C07D307/00 , C08F220/24 , C08F220/28 , G03F7/0046 , G03F7/0395 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： Lactone-containing compounds having formula (1) are novel wherein A1 is a polymerizable functional group having a double bond, R1 is a monovalent C1-C10 hydrocarbon group in which some or all hydrogen atoms are substituted by fluorine atoms, and W is CH2, O or S. They are useful as monomers to produce polymers for the formulation of radiation-sensitive resist compositions which have high transparency to radiation of up to 500 nm and exhibit good development properties. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography.
摘要翻译： 具有式（1）的含内酯的化合物是新颖的，其中A 1是具有双键的可聚合官能团，R 1是一价C 1 - 其中一些或全部氢原子被氟原子取代的烃基，W是CH 2，O或S.它们可用作单体， 生产用于配制辐射敏感抗蚀剂组合物的聚合物，其具有高达500nm的辐射的高透明度并且显示出良好的显影性能。 包含作为基础树脂的聚合物的辐射敏感性抗蚀剂组合物当通过浸渍光刻处理时表现出高分辨率并防止溶解在水中并渗入水中。
-
公开(公告)号：US07618765B2
公开(公告)日：2009-11-17
申请号：US12003834
申请日：2008-01-02
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator which is a specific sulfonium salt compound. The resin (A) is a polymer comprising tertiary alkyl protective group units having a hydrophobic tetracyclo[4.4.0.12,5.17,10]dodecane structure, di- or trihydroxyadamantyl units, and monocyclic lactone units.
摘要翻译： 正型抗蚀剂组合物包含（A）在酸的作用下变得可溶于碱性显影剂的树脂组分和（B）作为特定锍盐化合物的酸产生剂。 树脂（A）是包含具有疏水四环[4.4.0.12,5.17,10]十二烷结构的叔烷基保护基单元，二羟基金刚烷基单元和三羟基金刚烷基单元和单环内酯单元的聚合物。
-
公开(公告)号：US06835525B2
公开(公告)日：2004-12-28
申请号：US10073223
申请日：2002-02-13
IPC分类号： G03F7038
CPC分类号： C08F224/00 , C08F216/16 , C08F220/18 , C08F220/28 , C08F232/08 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/11 , Y10S430/111
摘要： A novel polymer is obtained by copolymerizing a (meth)acrylic acid derivative with a vinyl ether compound, an allyl ether compound and an oxygen-containing alicyclic olefin compound. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
摘要翻译： 通过使（甲基）丙烯酸衍生物与乙烯基醚化合物，烯丙基醚化合物和含氧脂环族烯烃化合物共聚得到新的聚合物。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率，耐腐蚀性和最小化的溶胀，并且使其自身具有电子束或深UV的微图形化。
-
公开(公告)号：US20080124652A1
公开(公告)日：2008-05-29
申请号：US11984614
申请日：2007-11-20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator. The resin (A) is a polymer comprising tertiary alkyl protective group units having a hydrophobic tetracyclo[4.4.0.12,5.17,10]-dodecane structure, hydroxyadamantane units, monocyclic lactone units, and carboxylic acid units. The acid generator (B) is a specific sulfonium salt compound.
摘要翻译： 正型抗蚀剂组合物包含（A）在酸作用下变得可溶于碱性显影剂的树脂组分和（B）酸产生剂。 树脂（A）是包含具有疏水性四环[4.4.0.1 2,5,7,10-] - 十二烷结构的叔烷基保护基单元的聚合物，羟基金刚烷 单体，单环内酯单元和羧酸单元。 酸产生剂（B）是特定的锍盐化合物。
-
公开(公告)号：US06784268B2
公开(公告)日：2004-08-31
申请号：US10611853
申请日：2003-07-03
IPC分类号： C08F11612
CPC分类号： C07C69/14 , C07C43/1781 , C07C69/007 , C07C2602/42 , C07C2603/86 , C08F232/08
摘要： An ether compound of formula (1) is provided wherein R1 is H or C1-6 alkyl, R2 is C1-6 alkyl, R3 is H, C1-15 acyl or C1-25 alkoxycarbonyl which may be substituted with halogen atoms, k is 0 or 1, m is from 0 to 3, and n is from 3 to 6. The ether compound is polymerized to form a polymer having improved reactivity, robustness and substrate adhesion. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
-
公开(公告)号：US07541133B2
公开(公告)日：2009-06-02
申请号：US11984614
申请日：2007-11-20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator. The resin (A) is a polymer comprising tertiary alkyl protective group units having a hydrophobic tetracyclo[4.4.0.12,5.17,10]-dodecane structure, hydroxyadamantane units, monocyclic lactone units, and carboxylic acid units. The acid generator (B) is a specific sulfonium salt compound.
摘要翻译： 正型抗蚀剂组合物包含（A）在酸作用下变得可溶于碱性显影剂的树脂组分和（B）酸产生剂。 树脂（A）是包含具有疏水性四环[4.4.0.12,5.17,10] - 十二烷结构的叔烷基保护基单元，羟基金刚烷单元，单环内酯单元和羧酸单元的聚合物。 酸产生剂（B）是特定的锍盐化合物。
-
公开(公告)号：US20080254386A1
公开(公告)日：2008-10-16
申请号：US12003834
申请日：2008-01-02
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator which is a specific sulfonium salt compound. The resin (A) is a polymer comprising tertiary alkyl protective group units having a hydrophobic tetracyclo[4.4.0.12,5.17,10]dodecane structure, di- or trihydroxyadamantyl units, and monocyclic lactone units.
摘要翻译： 正型抗蚀剂组合物包含（A）在酸的作用下变得可溶于碱性显影剂的树脂组分和（B）作为特定锍盐化合物的酸产生剂。 树脂（A）是包含具有疏水性四环[4.4.0.1 <2,5> 0,1,7,10-]十二烷结构的叔烷基保护基单元的聚合物， 或三羟基金刚烷基单元和单环内酯单元。
-
-
-
-
-
-
-
-
-
搜索结果
88 条记录 (耗时 0.032 秒)
