Abstract:
A rotating anode includes a focal track that has a microstructure on a surface of the focal track. The microstructure is produced using deep reactive ion etching.
Abstract:
In a method for applying an electron absorber layer to a substrate, an electron absorber layer is produced from a composite material, by coating the substrate with a metallic material, and material inclusions made from an additional material are embedded in the metallic material during coating. The metallic material contains aluminum, magnesium, cobalt, iron, chromium, titanium, nickel, copper, or an alloy or mixture thereof. The additional material contains one or more of the following substances: boron, carbon or silicon, a mixture of these elements, one or more chemical compounds made from or having at least two of these elements, or a mixture of such chemical compounds.
Abstract:
The present invention refers to hybrid anode disk structures for use in X-ray tubes of the rotary anode type and is concerned more particularly with a novel light weight anode disk structure (RA) which comprises an adhesion promoting protective silicon carbide (SiC) interlayer (SCI) deposited onto a rotary X-ray tube's anode target (AT), wherein the latter may e.g. be made of a carbon-carbon composite substrate (SUB′). Moreover, a manufacturing method for robustly attaching a coating layer (CL) consisting of a high-Z material (e.g. a layer made of a tungsten-rhenium alloy) on the surface of said anode target is provided, whereupon according to said method it may be foreseen to apply a refractory metal overcoating layer (RML), such as given e.g. by a tantalum (Ta), hafnium (Hf), vanadium (V) or rhenium (Re) layer, to the silicon carbide interlayer (SCI) prior to the deposition of the tungsten-rhenium alloy. The invention thus leverages the tendency for cracking of the silicon carbide coated carbon composite substrate (SUB′) during thermal cycling and enhances adhesion of the silicon carbide/refractory metal interlayers to the carbon-carbon composite substrate (SUB′) and focal track coating layer (CL) by an interlocking mechanism. Key aspects of the proposed invention are: a) controlled formation of coating cracks (SC) in the silicon carbide layer (SCI) and b) conformal filling of SiC crack openings with a refractory metal.
Abstract:
An x-ray tube includes a frame, an anode for generating x-rays disposed within the frame, a cathode disposed within the frame, where the cathode is configured to selectively emit an electron beam toward the anode, and at least one heating element disposed within the frame and configured to heat a portion of the anode.
Abstract:
In a method for applying an electron absorber layer to a substrate, an electron absorber layer is produced from a composite material, by coating the substrate with a metallic material, and material inclusions made from an additional material are embedded in the metallic material during coating. The metallic material contains aluminum, magnesium, cobalt, iron, chromium, titanium, nickel, copper, or an alloy or mixture thereof. The additional material contains one or more of the following substances: boron, carbon or silicon, a mixture of these elements, one or more chemical compounds made from or having at least two of these elements, or a mixture of such chemical compounds.
Abstract:
An x-ray target pedestal assembly and a method of protecting the x-ray target from breaking down as a result of the extreme heat that is produced when an electron beam is aimed at the target to produce x-rays. The target is submerged in cooling fluid and is rotated by a constant flow of the cooling fluid over and around the target in order to dissipate heat. The fluid is guided by integrated flow diverters in the target cover. The target may also be protectively coated either in its entirety or along the electron beam path in order to further protect it from the heat of the electron beam impact or from breakdown as a result of attack of free radicals or other chemically reactive components of the cooling fluid which are produced in the extreme target environment.
Abstract:
In some embodiments, an X-ray target includes a target cap formed of a substrate material and a focal track layer of emitting material, and at least one of the substrate material and the emitting material has a density greater than about 95.0% of theoretical density. In some embodiments, a method of manufacturing an X-ray target includes forming an intermediate target cap form of substrate material and a focal track layer of emitting material, and compacting the intermediate target cap form by application of gas pressure at elevated temperature to form a final target cap form, and at least the substrate material is dense substrate material having a final density greater than an intermediate density or the emitting material is dense emitting material having a final emitting material density greater than an intermediate emitting material density.
Abstract:
A focal track region of an x-ray anode in an example is electrochemically etched. In a further example, an x-ray anode comprises a thermally-compliant focal track region for impingement of electrons from an x-ray cathode to create an x-ray source. The thermally-compliant focal track region comprises a pattern of discrete relative expanses and gaps.